Patent search ap:("SEOUL VIOSYS CO. Page LTD.") AND inv:"Young Deuk Park"

1.

发明授权
Systems and methods for thermal hydro-synthesis of semiconductor materials by holding a substrate wafer within a chamber in a vertical direction 有权

公开(公告)号：US11220758B2

公开(公告)日：2022-01-11

申请号：US15623345

申请日：2017-06-14

Applicant: SEOUL VIOSYS CO., LTD.

Inventor： Yi Jung Kim , Seom Geun Lee , Young Deuk Park , Ki Suk Kim

IPC: H01L21/02 , C30B7/10 , C30B29/16 , H01L33/42

Abstract: Devices, systems and methods for fabricating semiconductor material devices by placing a batch of wafers in a chemical solution within a growth chamber. The wafers are held in a vertical direction and are actuated to move within the chemical solution while growing a layer over exposed surfaces of the wafers.

2.

发明申请
SYSTEMS AND METHODS FOR THERMAL HYDRO-SYNTHESIS OF SEMICONDUCTOR MATERIALS BY HOLDING A SUBSTRATE WAFER WITHIN A CHAMBER IN A VERTICAL DIRECTION 审中-公开

公开(公告)号：US20170365758A1

公开(公告)日：2017-12-21

申请号：US15623345

申请日：2017-06-14

Applicant: SEOUL VIOSYS CO., LTD.

Inventor： Yi Jung Kim , Seom Geun Lee , Young Deuk Park , Ki Suk Kim

IPC: H01L33/58 , H01L33/44 , C30B7/10 , H01L21/02 , C30B29/16 , H01L33/32

CPC classification number: C30B7/10 , C30B29/16 , H01L21/02458 , H01L21/02554 , H01L21/02628 , H01L33/42 , H01L2933/0016

Abstract: Devices, systems and methods for fabricating semiconductor material devices by placing a batch of wafers in a chemical solution within a growth chamber. The wafers are held in a vertical direction and are actuated to move within the chemical solution while growing a layer over exposed surfaces of the wafers.

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