RESISTIVE MEMORY APPARATUS AND MANUFACTURING METHOD THEREOF
    3.
    发明申请
    RESISTIVE MEMORY APPARATUS AND MANUFACTURING METHOD THEREOF 审中-公开
    电阻记忆装置及其制造方法

    公开(公告)号:US20150090948A1

    公开(公告)日:2015-04-02

    申请号:US14150558

    申请日:2014-01-08

    Applicant: SK hynix Inc.

    Inventor: Min Seok SON

    Abstract: A resistive memory apparatus includes a first electrode formed on a semiconductor substrate, an insulating layer formed on the first electrode and including a hole exposing an upper surface of the first electrode, a data storage unit in which a first resistance-variable material and a second resistance-variable material are alternately formed in the hole at least once, and a second electrode formed on the data storage unit.

    Abstract translation: 一种电阻式存储装置,包括形成在半导体衬底上的第一电极,形成在第一电极上并包括暴露第一电极的上表面的孔的绝缘层,数据存储单元,其中第一电阻变化材料和第二电极 电阻变化材料在孔中交替形成至少一次,第二电极形成在数据存储单元上。

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