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公开(公告)号：US12049437B2
公开(公告)日：2024-07-30
申请号：US17111688
申请日：2020-12-04
发明人： Jaeyoung Pai , Jeongmoo Kim , Hyuk Hee Han , Jung Hwan Myung , Myung-Ok Kyun , Jooyoung Jung
IPC分类号： C07C265/08 , C07C263/20 , G02B1/04
CPC分类号： C07C265/08 , C07C263/20 , G02B1/041
摘要： The diisocyanate composition according to an embodiment of the present invention comprises, in the composition, a benzyl isocyanate having a methyl group in an amount of 5 ppm to 200 ppm, an aromatic compound having a halogen group in an amount of 5 ppm to 1,000 ppm, a benzyl isocyanate having an ethyl group in an amount of 1 ppm to 1,000 ppm, or a combination thereof. It is possible to improve the optical characteristics by preventing the occurrence of yellowing, striae, and cloudiness and to enhance the mechanical properties such as impact resistance at the same time. Thus, it can be advantageously used to prepare an optical material of high quality.
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公开(公告)号：US11731936B2
公开(公告)日：2023-08-22
申请号：US17111857
申请日：2020-12-04
发明人： Jaeyoung Pai , Jeongmoo Kim , Jung Hwan Myung , Hyuk Hee Han , Jooyoung Jung , Myung-Ok Kyun
IPC分类号： C07C263/20 , G02B1/04 , C08G18/38 , C08G18/75 , C07C265/14
CPC分类号： C07C263/20 , C08G18/3868 , C08G18/757 , G02B1/041 , C07C265/14
摘要： In the embodiments, an aqueous hydrochloric acid solution instead of hydrogen chloride gas and solid triphosgene instead of phosgene gas may be used in the process of preparing a diisocyanate from a diamine through a diamine hydrochloride. In addition, the embodiments provide processes for preparing a diisocyanate composition and an optical lens of high quality in which the content of water, the content of cations, or the content of an aromatic compound containing 3 or more of chlorine (Cl) in the organic solvent used in the reaction of a diamine hydrochloride composition and triphosgene is adjusted to a specific range.
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公开(公告)号：US11932591B2
公开(公告)日：2024-03-19
申请号：US17586151
申请日：2022-01-27
发明人： Jaeyoung Pai , Jeongmoo Kim , Hyuk Hee Han , Jung Hwan Myung , Jooyoung Jung , Myung-Ok Kyun
CPC分类号： C07C263/10 , B29D11/00009 , C08G18/3876 , C08G18/73 , C08G18/755 , C08G18/7642 , G02B1/041
摘要： In the embodiments, an aqueous hydrochloric acid solution instead of hydrogen chloride gas and solid triphosgene instead of phosgene gas may be used in the process of preparing a diisocyanate from a diamine through a diamine hydrochloride. In addition, the embodiments provide processes for preparing a diisocyanate composition and an optical lens of higher quality by controlling the water content in the diamine hydrochloride composition for preparing a diisocyanate within a specific range.
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公开(公告)号：US11760719B2
公开(公告)日：2023-09-19
申请号：US17111779
申请日：2020-12-04
发明人： Jaeyoung Pai , Jeongmoo Kim , Hyuk Hee Han , Jung Hwan Myung , Jooyoung Jung , Myung-Ok Kyun
IPC分类号： C07C263/20 , C07C263/10 , C07C211/27 , C07C265/14
CPC分类号： C07C263/20 , C07C211/27 , C07C263/10 , C07C265/14 , C07C263/10 , C07C265/08 , C07C263/10 , C07C265/14
摘要： A diamine composition comprising a benzylmonoamine having a methyl group in an amount of 10 ppm to 2,000 ppm in the composition and use thereof for the preparation of a diisocyanate composition and an optical material. A process for preparing a diisocyanate composition wherein the b* value according to the CIE color coordinate of the diamine composition is adjusted to a specific range, whereby the yield and purity of the diisocyanate composition and the optical characteristics of the final optical lens are enhanced. Use of the process for the diisocyanate composition for preparing a plastic optical lens of high quality.
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公开(公告)号：US11518737B2
公开(公告)日：2022-12-06
申请号：US17109893
申请日：2020-12-02
发明人： Jaeyoung Pai , Jeongmoo Kim , Hyuk Hee Han , Jung Hwan Myung , Jooyoung Jung , Myung-Ok Kyun
IPC分类号： C07C263/20 , G02B1/04 , C07C265/14
摘要： In the embodiments, an aqueous hydrochloric acid solution and an organic solvent instead of hydrogen chloride gas and solid triphosgene instead of phosgene gas may be used in the process of preparing a diisocyanate from a diamine through a diamine hydrochloride. In addition, the embodiments provide processes for preparing a diisocyanate composition and an optical lens, which are excellent in yield and quality with mitigated environmental problems by controlling the total content of metals, cations, or anions in a diamine hydrochloride composition.
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6.发明授权公开(公告)号：US10513007B2
公开(公告)日：2019-12-24
申请号：US15989396
申请日：2018-05-25
申请人： SKC CO., LTD.
发明人： Jaein Ahn , Jang Won Seo , Sunghoon Yun , Su Young Moon , Myung-Ok Kyun
IPC分类号： B24B37/24 , H01L21/3105 , H01L21/306 , B24B37/20 , H01L21/321 , B24D3/32 , C08G18/10 , B24B37/22
摘要： The embodiments relate to a porous polyurethane polishing pad and a process for preparing a semiconductor device by using the same. The porous polyurethane polishing pad comprises a urethane-based prepolymer and a curing agent, and has a thickness of 1.5 to 2.5 mm, a number of pores whose average diameter is 10 to 60 μm, a specific gravity of 0.7 to 0.9 g/cm3, a surface hardness at 25° C. of 45 to 65 Shore D, a tensile strength of 15 to 25 N/mm2, an elongation of 80 to 250%, an AFM (atomic force microscope) elastic modulus of 30 to 100 MPa measured from a polishing surface in direct contact with an object to be polished to a predetermined depth wherein the predetermined depth is 1 to 10 μm.
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公开(公告)号：US20200223700A1
公开(公告)日：2020-07-16
申请号：US16828677
申请日：2020-03-24
申请人： SKC CO., LTD.
发明人： Ki Ryun PARK , Myung-Ok Kyun , Jung-Gyu Kim , Jung Doo Seo , Jonggab Baek , Jong Hwi Park , Jun Rok Oh
IPC分类号： C01B32/20 , B32B9/00 , H01L23/373 , C01B32/205 , D01F9/14 , C08J5/18
摘要： A graphite sheet having a ratio of thermal diffusivity in horizontal and vertical directions of 300 or more is disclosed. Also, a graphite sheet having a ratio of thermal diffusivity in a vertical direction of 2.0 mm2/s or less is disclosed. The graphite sheet has excellent thermal conductivity in horizontal and vertical directions and excellent flexibility at the same time and can be produced at low manufacturing cost, thereby holding an economic advantage.
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公开(公告)号：US11541634B2
公开(公告)日：2023-01-03
申请号：US16828677
申请日：2020-03-24
申请人： SKC CO., LTD.
发明人： Ki Ryun Park , Myung-Ok Kyun , Jung-Gyu Kim , Jung Doo Seo , Jonggab Baek , Jong Hwi Park , Jun Rok Oh
IPC分类号： B32B9/00 , H01L23/373 , C01B32/205 , D01F9/14 , C08J5/18 , C01B32/20
摘要： A graphite sheet having a ratio of thermal diffusivity in horizontal and vertical directions of 300 or more is disclosed. Also, a graphite sheet having a ratio of thermal diffusivity in a vertical direction of 2.0 mm2/s or less is disclosed. The graphite sheet has excellent thermal conductivity in horizontal and vertical directions and excellent flexibility at the same time and can be produced at low manufacturing cost, thereby holding an economic advantage.
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公开(公告)号：US11040516B2
公开(公告)日：2021-06-22
申请号：US15532544
申请日：2016-03-22
申请人： SKC CO., LTD.
发明人： Ki Ryun Park , Myung-Ok Kyun , Jung-Gyu Kim , Jung Doo Seo , Jonggab Baek , Jong Hwi Park , Jun Rok Oh
IPC分类号： B32B9/00 , H01L23/373 , C01B32/205 , D01F9/14 , C08J5/18 , C01B32/20
摘要： The present invention provides a graphite sheet having a ratio of thermal diffusivity in horizontal and vertical directions of 300 or more. Also, the present invention provides a graphite sheet having a ratio of thermal diffusivity in a vertical direction of 2.0 mm2/s or less. The graphite sheet has excellent thermal conductivity in horizontal and vertical directions and excellent flexibility at the same time and can be produced at low manufacturing cost, thereby holding an economic advantage.
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10.发明授权公开(公告)号：US10518383B2
公开(公告)日：2019-12-31
申请号：US15989403
申请日：2018-05-25
申请人： SKC CO., LTD.
发明人： Jaein Ahn , Jang Won Seo , Sunghoon Yun , Su Young Moon , Myung-Ok Kyun
IPC分类号： B24B37/24 , C08G18/10 , C08J9/32 , B24D3/32 , H01L21/306 , B24B37/20 , H01L21/321 , H01L23/532
摘要： The embodiments relate to a porous polyurethane polishing pad and a process for preparing a semiconductor device by using the same. The porous polyurethane polishing pad comprises a urethane-based prepolymer and a curing agent, and has a thickness of 1.5 to 2.5 mm, a number of pores whose average diameter is 10 to 60 μm, a specific gravity of 0.7 to 0.9 g/cm3, a surface hardness at 25° C. of 45 to 65 Shore D, a tensile strength of 15 to 25 N/mm2, an elongation of 80 to 250%, an AFM (atomic force microscope) elastic modulus of 101 to 250 MPa measured from a polishing surface in direct contact with an object to be polished to a predetermined depth wherein the predetermined depth is 1 to 10 μm.
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