Solid-state imaging device, method of manufacturing a solid-state imaging device, and electronic apparatus

    公开(公告)号:US10818722B2

    公开(公告)日:2020-10-27

    申请号:US16510445

    申请日:2019-07-12

    Abstract: Disclosed is a solid-state imaging device including a plurality of pixels and a plurality of on-chip lenses. The plurality of pixels are arranged in a matrix pattern. Each of the pixels has a photoelectric conversion portion configured to photoelectrically convert light incident from a rear surface side of a semiconductor substrate. The plurality of on-chip lenses are arranged for every other pixel. The on-chip lenses are larger in size than the pixels. Each of color filters at the pixels where the on-chip lenses are present has a cross-sectional shape whose upper side close to the on-chip lens is the same in width as the on-chip lens and whose lower side close to the photoelectric conversion portion is shorter than the upper side.

    Solid-state imaging device, method of manufacturing a solid-state imaging device, and electronic apparatus
    2.
    发明授权
    Solid-state imaging device, method of manufacturing a solid-state imaging device, and electronic apparatus 有权
    固态成像装置,固态成像装置的制造方法以及电子装置

    公开(公告)号:US09548326B2

    公开(公告)日:2017-01-17

    申请号:US14993847

    申请日:2016-01-12

    Abstract: Disclosed is a solid-state imaging device including a plurality of pixels and a plurality of on-chip lenses. The plurality of pixels are arranged in a matrix pattern. Each of the pixels has a photoelectric conversion portion configured to photoelectrically convert light incident from a rear surface side of a semiconductor substrate. The plurality of on-chip lenses are arranged for every other pixel. The on-chip lenses are larger in size than the pixels. Each of color filters at the pixels where the on-chip lenses are present has a cross-sectional shape whose upper side close to the on-chip lens is the same in width as the on-chip lens and whose lower side close to the photoelectric conversion portion is shorter than the upper side.

    Abstract translation: 公开了一种包括多个像素和多个片上透镜的固态成像装置。 多个像素以矩阵图案排列。 每个像素具有被配置为光电转换从半导体衬底的背面侧入射的光的光电转换部。 多个片上透镜被布置用于每隔一个像素。 片上镜头的尺寸比像素大。 存在片上透镜的像素处的每个滤色器具有截面形状,其上侧靠近片上透镜的宽度与片上透镜相同,并且其下侧靠近光电 转换部分比上侧短。

    Solid-state imaging device, method of manufacturing a solid-state imaging device, and electronic apparatus
    3.
    发明授权
    Solid-state imaging device, method of manufacturing a solid-state imaging device, and electronic apparatus 有权
    固态成像装置,固态成像装置的制造方法以及电子装置

    公开(公告)号:US09276032B2

    公开(公告)日:2016-03-01

    申请号:US14490350

    申请日:2014-09-18

    Abstract: Disclosed is a solid-state imaging device including a plurality of pixels and a plurality of on-chip lenses. The plurality of pixels are arranged in a matrix pattern. Each of the pixels has a photoelectric conversion portion configured to photoelectrically convert light incident from a rear surface side of a semiconductor substrate. The plurality of on-chip lenses are arranged for every other pixel. The on-chip lenses are larger in size than the pixels. Each of color filters at the pixels where the on-chip lenses are present has a cross-sectional shape whose upper side close to the on-chip lens is the same in width as the on-chip lens and whose lower side close to the photoelectric conversion portion is shorter than the upper side.

    Abstract translation: 公开了一种包括多个像素和多个片上透镜的固态成像装置。 多个像素以矩阵图案排列。 每个像素具有被配置为光电转换从半导体衬底的背面侧入射的光的光电转换部。 多个片上透镜被布置用于每隔一个像素。 片上镜头的尺寸比像素大。 存在片上透镜的像素处的每个滤色器具有截面形状,其上侧靠近片上透镜的宽度与片上透镜相同,并且其下侧靠近光电 转换部分比上侧短。

    Solid-state imaging device, method of manufacturing a solid-state imaging device, and electronic apparatus

    公开(公告)号:US11329078B2

    公开(公告)日:2022-05-10

    申请号:US17010445

    申请日:2020-09-02

    Abstract: Disclosed is a solid-state imaging device including a plurality of pixels and a plurality of on-chip lenses. The plurality of pixels are arranged in a matrix pattern. Each of the pixels has a photoelectric conversion portion configured to photoelectrically convert light incident from a rear surface side of a semiconductor substrate. The plurality of on-chip lenses are arranged for every other pixel. The on-chip lenses are larger in size than the pixels. Each of color filters at the pixels where the on-chip lenses are present has a cross-sectional shape whose upper side close to the on-chip lens is the same in width as the on-chip lens and whose lower side close to the photoelectric conversion portion is shorter than the upper side.

    Solid-state imaging device, method of manufacturing a solid-state imaging device, and electronic apparatus

    公开(公告)号:US10367027B2

    公开(公告)日:2019-07-30

    申请号:US15725957

    申请日:2017-10-05

    Abstract: Disclosed is a solid-state imaging device including a plurality of pixels and a plurality of on-chip lenses. The plurality of pixels are arranged in a matrix pattern. Each of the pixels has a photoelectric conversion portion configured to photoelectrically convert light incident from a rear surface side of a semiconductor substrate. The plurality of on-chip lenses are arranged for every other pixel. The on-chip lenses are larger in size than the pixels. Each of color filters at the pixels where the on-chip lenses are present has a cross-sectional shape whose upper side close to the on-chip lens is the same in width as the on-chip lens and whose lower side close to the photoelectric conversion portion is shorter than the upper side.

    SOLID-STATE IMAGING DEVICE, METHOD OF MANUFACTURING A SOLID-STATE IMAGING DEVICE, AND ELECTRONIC APPARATUS
    8.
    发明申请
    SOLID-STATE IMAGING DEVICE, METHOD OF MANUFACTURING A SOLID-STATE IMAGING DEVICE, AND ELECTRONIC APPARATUS 有权
    固态成像装置,制造固态成像装置的方法和电子装置

    公开(公告)号:US20150084144A1

    公开(公告)日:2015-03-26

    申请号:US14490350

    申请日:2014-09-18

    Abstract: Disclosed is a solid-state imaging device including a plurality of pixels and a plurality of on-chip lenses. The plurality of pixels are arranged in a matrix pattern. Each of the pixels has a photoelectric conversion portion configured to photoelectrically convert light incident from a rear surface side of a semiconductor substrate. The plurality of on-chip lenses are arranged for every other pixel. The on-chip lenses are larger in size than the pixels. Each of color filters at the pixels where the on-chip lenses are present has a cross-sectional shape whose upper side close to the on-chip lens is the same in width as the on-chip lens and whose lower side close to the photoelectric conversion portion is shorter than the upper side.

    Abstract translation: 公开了一种包括多个像素和多个片上透镜的固态成像装置。 多个像素以矩阵图案排列。 每个像素具有被配置为光电转换从半导体衬底的背面侧入射的光的光电转换部。 多个片上透镜被布置用于每隔一个像素。 片上镜头的尺寸比像素大。 存在片上透镜的像素处的每个滤色器具有截面形状,其上侧靠近片上透镜的宽度与片上透镜相同,并且其下侧靠近光电 转换部分比上侧短。

Patent Agency Ranking