Solid-state imaging device, method of manufacturing the same, and electronic device

    公开(公告)号:US10070086B2

    公开(公告)日:2018-09-04

    申请号:US15524185

    申请日:2015-10-29

    Inventor: Takashi Oinoue

    Abstract: The present disclosure relates to a solid-state imaging device capable of receiving light entering a gap between pixel regions of imaging units by the pixel region when a plurality of imaging units is arranged, a method of manufacturing the same, and an electronic device. A CMOS image sensor includes a pixel region formed of a plurality of pixels. A convex lens is provided for each of a plurality of CMOS image sensors. A plurality of CMOS image sensors is arranged on a supporting substrate. The present disclosure is applicable to a solid-state imaging device and the like in which a plurality of CMOS image sensors is arranged on the supporting substrate, for example.

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