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公开(公告)号:US11217612B2
公开(公告)日:2022-01-04
申请号:US16683379
申请日:2019-11-14
Applicant: SONY CORPORATION
Inventor: Hiroshi Tayanaka , Kentaro Akiyama , Yorito Sakano , Takashi Oinoue , Yoshiya Hagimoto , Yusuke Matsumura , Naoyuki Sato , Yuki Miyanami , Yoichi Ueda , Ryosuke Matsumoto
IPC: H01L27/146 , H01L27/14 , H04N5/355 , H04N5/3745 , H01L27/02 , H04N5/374 , H04N5/217 , H04N5/235 , H04N5/367 , H04N5/378
Abstract: The solid-state image sensing device includes a photoelectric conversion unit, a charge holding unit for holding charges transferred from the photoelectric conversion unit, a first transfer transistor for transferring charges from the photoelectric conversion unit to the charge holding unit, and a light blocking part including a first light blocking part and a second light blocking part, in which the first light blocking part is arranged between a second surface opposite to a first surface as a light receiving surface of the photoelectric conversion unit and the charge holding unit, and covers the second surface, and is formed with a first opening, and the second light blocking part surrounds the side surface of the photoelectric conversion unit.
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公开(公告)号:US11289525B2
公开(公告)日:2022-03-29
申请号:US15559345
申请日:2016-03-11
Applicant: SONY CORPORATION
Inventor: Hajime Yamagishi , Kiyotaka Tabuchi , Masaki Okamoto , Takashi Oinoue , Minoru Ishida , Shota Hida , Kazutaka Yamane
IPC: H01L27/146 , H01L27/14 , H01L23/522 , H01L23/528 , H01L23/552 , H01L23/48 , H04N5/357 , H04N5/365 , H04N5/376 , H04N5/378
Abstract: This technology relates to a solid-state imaging device and an electronic apparatus by which image quality can be enhanced. The solid-state imaging device includes a pixel region in which a plurality of pixels are arranged, a first wiring, a second wiring, and a shield layer. The second wiring is formed in a layer lower than that of the first wiring, and the shield layer is formed in a layer lower at least than that of the first wiring. This technology is applicable to a CMOS image sensor, for example.
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公开(公告)号:US10515988B2
公开(公告)日:2019-12-24
申请号:US15551129
申请日:2016-02-12
Applicant: SONY CORPORATION
Inventor: Hiroshi Tayanaka , Kentaro Akiyama , Yorito Sakano , Takashi Oinoue , Yoshiya Hagimoto , Yusuke Matsumura , Naoyuki Sato , Yuki Miyanami , Yoichi Ueda , Ryosuke Matsumoto
IPC: H01L27/146 , H01L27/14 , H04N5/374 , H04N5/217 , H04N5/235 , H04N5/355 , H04N5/367 , H04N5/378 , H04N5/3745 , H01L27/02
Abstract: The present technology relates to a solid-state image sensing device and an electronic device capable of reducing noises. The solid-state image sensing device includes a photoelectric conversion unit, a charge holding unit for holding charges transferred from the photoelectric conversion unit, a first transfer transistor for transferring charges from the photoelectric conversion unit to the charge holding unit, and a light blocking part including a first light blocking part and a second light blocking part. The first light blocking part is arranged between a second surface opposite to a first surface as a light receiving surface of the photoelectric conversion unit and the charge holding unit, and covers the second surface, and is formed with a first opening, and the second light blocking part surrounds the side surface of the photoelectric conversion unit. The present technology is applicable to solid-state image sensing devices of backside irradiation type.
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公开(公告)号:US10070086B2
公开(公告)日:2018-09-04
申请号:US15524185
申请日:2015-10-29
Applicant: SONY CORPORATION
Inventor: Takashi Oinoue
IPC: H01L27/00 , H01L31/00 , H04N5/374 , H04N5/345 , H01L27/148 , H01L27/146 , H04N5/372 , H04N3/14
Abstract: The present disclosure relates to a solid-state imaging device capable of receiving light entering a gap between pixel regions of imaging units by the pixel region when a plurality of imaging units is arranged, a method of manufacturing the same, and an electronic device. A CMOS image sensor includes a pixel region formed of a plurality of pixels. A convex lens is provided for each of a plurality of CMOS image sensors. A plurality of CMOS image sensors is arranged on a supporting substrate. The present disclosure is applicable to a solid-state imaging device and the like in which a plurality of CMOS image sensors is arranged on the supporting substrate, for example.
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