Imaging unit
    2.
    发明授权

    公开(公告)号:US11329084B2

    公开(公告)日:2022-05-10

    申请号:US16960801

    申请日:2018-12-12

    IPC分类号: H01L27/146 H01L23/00

    摘要: An imaging unit includes a photoelectric conversion layer including a compound semiconductor and having a light incident surface, and a light shielding portion provided in an optical path of light incident on the light incident surface and shielding light having a wavelength of less than 450 nm.

    Image pick-up apparatus
    3.
    发明授权

    公开(公告)号:US11271026B2

    公开(公告)日:2022-03-08

    申请号:US16924010

    申请日:2020-07-08

    摘要: Imaging devices and electronic apparatuses incorporating imaging devices or image pick-up elements are provided. An imaging device as disclosed can include a substrate, a first opto-electronic converter having a first area formed in the substrate, and a second opto-electronic converter having a second area formed in the substrate. The first area is larger than the second area. In addition, a light blocking wall can extend from a first surface of the substrate such that at least a portion of the light blocking wall is between the first opto-electronic converter and the second opto-electronic converter.

    Imaging apparatus and manufacturing method

    公开(公告)号:US10811456B2

    公开(公告)日:2020-10-20

    申请号:US16298395

    申请日:2019-03-11

    摘要: An imaging apparatus and a manufacturing method which enables sensitivity of the imaging apparatus using infrared rays to be improved. The imaging apparatus includes a light-receiving element array in which a plurality of light-receiving elements including a compound semiconductor having light-receiving sensitivity in an infrared range are arrayed, a signal processing circuit that processes a signal from the light-receiving element, an upper electrode formed on a light-receiving surface side of the light-receiving element, and a lower electrode that is paired with the upper electrode, in which the light-receiving element array and the signal processing circuit are joined to each other with a film of a predetermined material, the upper electrode and the signal processing circuit are connected to each other through a through-via-hole penetrating a part of the light-receiving element, and the lower electrode is made as an electrode common to the light-receiving elements arrayed in the light-receiving element array.

    Imaging apparatus
    5.
    发明授权

    公开(公告)号:US10522582B2

    公开(公告)日:2019-12-31

    申请号:US15761475

    申请日:2016-09-21

    摘要: The present technology relates to an imaging apparatus and a manufacturing method which enables sensitivity of an imaging apparatus using infrared rays to be improved. The imaging apparatus includes: a light-receiving element array in which a plurality of light-receiving elements including a compound semiconductor having light-receiving sensitivity in an infrared range are arrayed; a signal processing circuit that processes a signal from the light-receiving element; an upper electrode formed on a light-receiving surface side of the light-receiving element; and a lower electrode that is paired with the upper electrode, in which the light-receiving element array and the signal processing circuit are joined to each other with a film of a predetermined material, the upper electrode and the signal processing circuit are connected to each other through a through-via-hole penetrating a part of the light-receiving element, and the lower electrode is made as an electrode common to the light-receiving elements arrayed in the light-receiving element array. The present technology can be applied to an infrared sensor.

    Solid-state image sensor, method of producing the same, and electronic apparatus

    公开(公告)号:US11239280B2

    公开(公告)日:2022-02-01

    申请号:US16749863

    申请日:2020-01-22

    发明人: Shunsuke Maruyama

    IPC分类号: H01L27/146 H01L27/30

    摘要: A solid-state image sensor includes a pixel formed, upon forming a structure where a photoelectric conversion layer is laminated on a wiring layer constituting a pixel circuit, by forming at least the photoelectric conversion layer and a wiring layer bonding layer on a different substrate from a semiconductor substrate in which the wiring layer is formed, and by bonding the wiring layer bonding film of the different substrate and the wiring layer of the semiconductor substrate together.

    SOLID-STATE IMAGE SENSOR, METHOD OF PRODUCING THE SAME, AND ELECTRONIC APPARATUS

    公开(公告)号:US20200161375A1

    公开(公告)日:2020-05-21

    申请号:US16749863

    申请日:2020-01-22

    发明人: Shunsuke Maruyama

    IPC分类号: H01L27/30 H01L27/146

    摘要: A solid-state image sensor includes a pixel formed, upon forming a structure where a photoelectric conversion layer is laminated on a wiring layer constituting a pixel circuit, by forming at least the photoelectric conversion layer and a wiring layer bonding layer on a different substrate from a semiconductor substrate in which the wiring layer is formed, and by bonding the wiring layer bonding film of the different substrate and the wiring layer of the semiconductor substrate together.

    Solid-state image sensor, method of producing the same, and electronic apparatus

    公开(公告)号:US10559628B2

    公开(公告)日:2020-02-11

    申请号:US15990192

    申请日:2018-05-25

    发明人: Shunsuke Maruyama

    IPC分类号: H01L27/146 H01L27/30

    摘要: A solid-state image sensor includes a pixel formed, upon forming a structure where a photoelectric conversion layer is laminated on a wiring layer constituting a pixel circuit, by forming at least the photoelectric conversion layer and a wiring layer bonding layer on a different substrate from a semiconductor substrate in which the wiring layer is formed, and by bonding the wiring layer bonding film of the different substrate and the wiring layer of the semiconductor substrate together.