公开(公告)号：US20170294294A1

公开(公告)日：2017-10-12

申请号：US15478283

申请日：2017-04-04

Applicant: SPTS TECHNOLOGIES LIMITED

Inventor： SCOTT HAYMORE ,  AMIT RASTOGI ,  RHONDA HYNDMAN ,  STEVE BURGESS ,  IAN MONCRIEFF ,  CHRIS KENDAL

IPC: H01J37/34 ,  C23C14/06 ,  C23C14/50 ,  C23C14/35 ,  H01J37/32 ,  C23C14/34

CPC classification number: H01J37/3405 ,  C23C14/0617 ,  C23C14/0641 ,  C23C14/3407 ,  C23C14/345 ,  C23C14/35 ,  C23C14/505 ,  H01J37/32706 ,  H01J37/32715 ,  H01J37/34 ,  H01J37/3426

Abstract: A DC magnetron sputtering apparatus is for depositing a film on a substrate. The apparatus includes a chamber, a substrate support positioned within the chamber, a DC magnetron, and an electrical signal supply device for supplying an electrical bias signal that, in use, causes ions to bombard a substrate positioned on the substrate support. The substrate support includes a central region surrounded by an edge region, the central region being raised with respect to the edge region.