公开(公告)号：US11521840B2

公开(公告)日：2022-12-06

申请号：US15899634

申请日：2018-02-20

Applicant: SPTS Technologies Limited

Inventor： Anthony Wilby ,  Steve Burgess ,  Ian Moncrieff ,  Clive Widdicks ,  Scott Haymore ,  Rhonda Hyndman

IPC: C23C14/35 ,  H01J37/34 ,  B81B3/00 ,  C23C14/50 ,  H01J37/32 ,  H01L21/02 ,  C23C14/34 ,  H01L21/285 ,  H01L21/768

Abstract: A method and apparatus are for controlling stress variation in a material layer formed via pulsed DC physical vapour deposition. The method includes the steps of providing a chamber having a target from which the material layer is formed and a substrate upon which the material layer is formable, and subsequently introducing a gas within the chamber. The method further includes generating a plasma within the chamber and applying a first magnetic field proximate the target to substantially localise the plasma adjacent the target. An RF bias is applied to the substrate to attract gas ions from the plasma toward the substrate and a second magnetic field is applied proximate the substrate to steer gas ions from the plasma to selective regions upon the material layer formed on the substrate.

公开(公告)号：US11913109B2

公开(公告)日：2024-02-27

申请号：US16541635

申请日：2019-08-15

Applicant: SPTS Technologies Limited

Inventor： Tony Wilby ,  Steve Burgess ,  Adrian Thomas ,  Rhonda Hyndman ,  Scott Haymore ,  Clive Widdicks ,  Ian Moncrieff

IPC: C23C14/50 ,  C23C14/34 ,  C23C14/35 ,  C23C14/54 ,  H01J37/32 ,  H01J37/34

CPC classification number: C23C14/50 ,  C23C14/345 ,  C23C14/3485 ,  C23C14/35 ,  C23C14/351 ,  C23C14/505 ,  H01J37/32715 ,  H01J37/3405 ,  H01J37/3452 ,  H01J37/3455 ,  H01J37/3467 ,  C23C14/542

Abstract: A magnet assembly is disclosed for steering ions used in the formation of a material layer upon a substrate during a pulsed DC physical vapour deposition process. Apparatus and methods are also disclosed incorporating the assembly for controlling thickness variation in a material layer formed via pulsed DC physical vapour deposition. The magnet assembly comprises a magnetic field generating arrangement for generating a magnetic field proximate the substrate and means for rotating the ion steering magnetic field generating arrangement about an axis of rotation, relative to the substrate. The magnetic field generating arrangement comprises a plurality of magnets configured to an array which extends around the axis of rotation, wherein the array of magnets are configured to generate a varying magnetic field strength along a radial direction relative to the axis of rotation.