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    MICROPROCESSING TREATMENT AGENT AND MICROPROCESSING TREATMENT METHOD
    2.
    发明公开
    MICROPROCESSING TREATMENT AGENT AND MICROPROCESSING TREATMENT METHOD 审中-公开

    公开(公告)号：US20240240084A1

    公开(公告)日：2024-07-18

    申请号：US18559459

    申请日：2021-06-11

    Applicant: STELLA CHEMIFA CORPORATION

    Inventor： Yosuke YAMAZAKI ,  Kenta HORIGAMI ,  Kazuya DATE ,  Rui HASEBE ,  Keiichi NII ,  Tetsuo NISHIDA

    IPC: C09K13/08 ,  H01L21/311

    CPC classification number: C09K13/08 ,  H01L21/31111

    Abstract: Provided are a micromachining processing agent and a micromachining processing method that enable favorable micromachining while suppressing remaining of fine particles on an object to be processed having at least a silicon-containing insulating film. The micromachining processing agent according to the present invention is a micromachining processing agent for micromachining an object to be processed having at least a silicon-containing insulating film, the micromachining processing agent containing: a compound represented by a chemical formula (1) below; hydrogen fluoride; ammonium fluoride; and water,




    wherein Rf represents perfluoroalkyl group having 1 to 4 carbon atoms, and M+ represents a hydrogen ion or an ammonium ion, wherein a content of the compound is 0.001 mass % or more and 0.5 mass % or less with respect to a total mass of the micromachining processing agent, a content of the hydrogen fluoride is 0.05 mass % or more and 25 mass % or less with respect to a total mass of the micromachining processing agent, a content of the ammonium fluoride is 0.5 mass % or more and 40 mass % or less with respect to a total mass of the micromachining processing agent, and the content of the hydrogen fluoride and the content of the ammonium fluoride satisfy a relational expression (1) below:







    Y
    ≦



    -

    0
    .
    8


    ⁢
    X

    +

    4
    ⁢
    0






    (
    1
    )







    wherein X represents a concentration (mass %) of hydrogen fluoride and Y represents a concentration (mass %) of ammonium fluoride.

    MICROMACHINING PROCESSING AGENT AND MICROMACHINING PROCESSING METHOD
    3.
    发明公开
    MICROMACHINING PROCESSING AGENT AND MICROMACHINING PROCESSING METHOD 审中-公开

    公开(公告)号：US20230407178A1

    公开(公告)日：2023-12-21

    申请号：US18251334

    申请日：2021-10-27

    Applicant: STELLA CHEMIFA CORPORATION

    Inventor： Kazuya DATE ,  Nodoka NAKATA ,  Rui HASEBE ,  Keiichi NII

    IPC: C09K13/08 ,  H01L21/311

    CPC classification number: C09K13/08 ,  H01L21/31111

    Abstract: A micromachining processing agent and a micromachining processing method capable of selectively micromachining a silicon oxide film when a laminated film including at least a silicon nitride film, a silicon oxide film, and a silicon alloy film is micromachined. The micromachining processing agent is used for micromachining of a laminated film including at least a silicon oxide film, a silicon nitride film, and a silicon alloy film. The micromachining processing agent contains: (a) 0.01 to 50 mass % of hydrogen fluoride; (b) 0.1 to 40 mass % of ammonium fluoride; (c) 0.001 to 10 mass % of a water-soluble polymer; (d) 0.001 to 1 mass % of an organic compound having a carboxyl group; and (e) water as an optional component, in which the water-soluble polymer is at least one selected from a group consisting of acrylic acid, ammonium acrylate, acrylamide, styrenesulfonic acid, ammonium styrenesulfonate, and styrenesulfonic acid ester.

    LIQUID DISPERSION OF FLUORIDE PARTICLES AND METHOD FOR PRODUCING SAME, AND OPTICAL FILM
    4.
    发明申请
    LIQUID DISPERSION OF FLUORIDE PARTICLES AND METHOD FOR PRODUCING SAME, AND OPTICAL FILM 有权

    公开(公告)号：US20230038554A1

    公开(公告)日：2023-02-09

    申请号：US17788140

    申请日：2020-11-11

    Applicant: STELLA CHEMIFA CORPORATION

    Inventor： Masanori URAYA ,  Hiroya YAMAMOTO ,  Rui HASEBE ,  Megumi TOMISAKI ,  Tetsuo NISHIDA

    IPC: C01B33/10 ,  G02B1/111

    Abstract: Provided are a liquid dispersion of fluoride particles, which has low viscosity and excellent dispersibility, and is suitable for producing an optical film such as an antireflection film; a method for producing the same; and an optical film using the same. The liquid dispersion of fluoride particles according to the present invention is that in which particles of a fluoride represented by the chemical formula AxCFy (wherein A represents sodium or potassium, C represents silicon or boron, x is 1 or 2, and y is 4 or 6) are dispersed in an aprotic organic solvent having a relative permittivity of 5 to 40, and the optical film according to the present invention is produced by using the liquid dispersion of fluoride particles.

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