公开(公告)号：US20190219816A1

公开(公告)日：2019-07-18

申请号：US16248379

申请日：2019-01-15

Applicant: STMicroelectronics S.r.l.

Inventor： Lucas LAMAGNA ,  Stefano LOSA ,  Silvia ROSSINI ,  Federico VERCESI ,  Elena CIANCI ,  Graziella TALLARIDA ,  Claudia WIEMER

IPC: G02B26/08 ,  G02B1/18

CPC classification number: G02B26/0841 ,  G02B1/14 ,  G02B1/18 ,  G02B5/0858 ,  G02B26/0833

Abstract: A micromechanical mirror structure includes a mirror element designed to reflect an incident light radiation and a protective structure arranged over the mirror element to provide mechanical protection for the mirror element and to increase the reflectivity of the mirror element with respect to the incident light radiation. The protective structure has a first protective layer and a second protective layer which are stacked on the mirror element. The second protective layer is arranged on the first protective layer and the first protective layer is arranged on the mirror element. The layers include a respective dielectric material and having respective refractive indexes that jointly increase the reflectivity of the mirror element in a range of wavelengths of interest.

公开(公告)号：US20160130140A1

公开(公告)日：2016-05-12

申请号：US14982380

申请日：2015-12-29

Applicant: STMICROELECTRONICS S.R.L.

Inventor： Stefano LOSA ,  Raffaella PEZZUTO ,  Roberto CAMPEDELLI ,  Matteo PERLETTI ,  Luigi ESPOSITO ,  Mikel Azpeitia URQUIA

IPC: B81C1/00

CPC classification number: H01L21/02178 ,  B81B7/0032 ,  B81B2201/0235 ,  B81B2201/0242 ,  B81C1/00595 ,  B81C1/00801 ,  B81C2201/014 ,  B81C2201/053 ,  H01L21/0228

Abstract: A method for manufacturing a protective layer for protecting an intermediate structural layer against etching with hydrofluoric acid, the intermediate structural layer being made of a material that can be etched or damaged by hydrofluoric acid, the method comprising the steps of: forming a first layer of aluminium oxide, by atomic layer deposition, on the intermediate structural layer; performing a thermal crystallization process on the first layer of aluminium oxide, forming a first intermediate protective layer; forming a second layer of aluminium oxide, by atomic layer deposition, above the first intermediate protective layer; and performing a thermal crystallization process on the second layer of aluminium oxide, forming a second intermediate protective layer and thereby completing the formation of the protective layer. The method for forming the protective layer can be used, for example, during the manufacturing steps of an inertial sensor such as a gyroscope or an accelerometer.

Abstract translation: 一种用于制造用于保护中间结构层以防止用氢氟酸蚀刻的保护层的方法，所述中间结构层由可被氢氟酸蚀刻或损坏的材料制成，所述方法包括以下步骤：形成第一层 氧化铝，通过原子层沉积在中间结构层上; 在第一氧化铝层上进行热结晶处理，形成第一中间保护层; 通过原子层沉积在第一中间保护层之上形成第二层氧化铝; 并在第二氧化铝层上进行热结晶处理，形成第二中间保护层，从而完成保护层的形成。 形成保护层的方法可以用于例如陀螺仪或加速度计等惯性传感器的制造步骤。