公开(公告)号：US20200209749A1

公开(公告)日：2020-07-02

申请号：US16724455

申请日：2019-12-23

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Masako SUGIHARA ,  Mutsuko HIGO

IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/004 ,  G03F7/32 ,  C07C49/175 ,  C08L25/18 ,  C08L61/14

摘要： Disclosed is a resist composition including a novolak resin in which a hydroxy group is substituted with a group represented by formula (3), an acid generator, a quencher, and a solvent: wherein, in formula (3), Ra10 represents a hydrocarbon group having 1 to 20 carbon atoms (e.g., a chain hydrocarbon group such as an alkyl group, an alkenyl group and an alkynyl group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, groups formed by combining these groups, etc.) and * represents a bond.

公开(公告)号：US20200233301A1

公开(公告)日：2020-07-23

申请号：US16741815

申请日：2020-01-14

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Mutsuko HIGO ,  Shingo FUJITA ,  Koji ICHIKAWA

IPC分类号： G03F7/039 ,  C08F212/14 ,  G03F7/038 ,  G03F7/004 ,  C08F220/18 ,  C08F220/38

摘要： Disclosed is a resin including a structural unit represented by formula (a1-5) and a structural unit represented by formula (I), and a resist composition: wherein Ra8 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; Za1 represents a single bond or *—(CH2)n3—CO-L54-; h3 represents an integer of 1 to 4; L51, L52, L53 and L54 each independently represent —O— or —S—; s1 represents an integer of 1 to 3; s1′ represents an integer of 0 to 3; R1 represents a hydrogen atom or a methyl group; A1 represents a single bond or *—CO—O—; R2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; mi represents an integer of 1 to 3; and ni represents an integer of 0 to 4, in which mi+ni≤5.

公开(公告)号：US20200064735A1

公开(公告)日：2020-02-27

申请号：US16549206

申请日：2019-08-23

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Mutsuko HIGO ,  Shingo FUJITA ,  Koji ICHIKAWA

IPC分类号： G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  C08F212/14 ,  C08F220/16

摘要： Disclosed are a resin containing a structural unit represented by formula (I), a structural unit represented by formula (a1-1), a structural unit represented by formula (a1-2) and a structural unit represented by formula (a2-A), and a resist composition including the same:

公开(公告)号：US20200233300A1

公开(公告)日：2020-07-23

申请号：US16741901

申请日：2020-01-14

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Mutsuko HIGO ,  Shingo FUJITA ,  Koji ICHIKAWA

IPC分类号： G03F7/038 ,  G03F7/039 ,  G03F7/004 ,  C08F212/14 ,  C08F220/38 ,  C08F220/18 ,  C08F220/28

摘要： Disclosed is a resin including a structural unit represented by formula (I) and a structural unit represented by formula (a2-A), and a resist composition: wherein R1 represents a hydrogen atom or a methyl group; L1 and L2 each represent —O— or —S—; s1 represents an integer of 1 to 3; s2 represents an integer of 0 to 3; Ra50 represents a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom; Ra51 represents a halogen atom, a hydroxy group, an alkyl group, an alkoxy group, an alkylcarbonyl group or the like; Aa50 represents a single bond or *—Xa51-(Aa52-Xa52)nb—; Aa52 represents an alkanediyl group; Xa51 and Xa52 each represent —O—, —CO—O— or —O—CO—; nb represents 0 or 1; and mb represents an integer of 0 to 4.

公开(公告)号：US20180065925A1

公开(公告)日：2018-03-08

申请号：US15694090

申请日：2017-09-01

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Hiromu SAKAMOTO ,  Mutsuko HIGO ,  Koji ICHIKAWA

IPC分类号： C07C309/17 ,  G03F7/004 ,  G03F7/038

CPC分类号： C07C309/17 ,  C07C309/10 ,  C07C381/12 ,  C07C2603/74 ,  C07D307/77 ,  C07D317/72 ,  C07D319/08 ,  C07D321/10 ,  C07D327/04 ,  C07D327/06 ,  C07D327/08 ,  C07D333/46 ,  C07D335/02 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0384 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/20 ,  G03F7/325 ,  G03F7/38

摘要： A salt represented by formula (I): wherein R1 and R2 independently each represent a C6-C18 unsubstituted or substituted aromatic hydrocarbon group, X1 represents a C1-C12 divalent aliphatic saturated hydrocarbon group in which a methylene group can be replaced by an oxygen atom or a carbonyl group, and A− represents an organic anion.