公开(公告)号：US20110221886A1

公开(公告)日：2011-09-15

申请号：US13059908

申请日：2009-07-08

申请人： Hidetoshi Nishiyama ,  Masaaki Ito ,  Sachio Uto ,  Kei Shimura

发明人： Hidetoshi Nishiyama ,  Masaaki Ito ,  Sachio Uto ,  Kei Shimura

IPC分类号： H04N7/18

CPC分类号： G01N21/956 ,  G01N21/94 ,  H01L22/12

摘要： In recent years, a wafer inspection time in semiconductor manufacturing processes is being required to be reduced for reduction in manufacturing time and for early detection of yield reduction factors. To meet this requirement, there is a need to reduce the time required for inspection parameter setup, as well as the time actually required for inspection. Based on the speed or position change information relating to a transport system 2, inspection is also conducted during acceleration/deceleration of the transport system 2 by controlling an accumulation time and/or operational speed of a detector or by correcting acquired images. Alternate display of review images of a detection region at fixed time intervals improves visibility of the detection region and makes it possible to confirm within a short time whether a defect is present.

摘要翻译： 近年来，为了减少制造时间和减少因素的早期检测，需要减少半导体制造工序中的晶片检查时间。 为了满足这一要求，需要减少检查参数设置所需的时间以及检查所需的时间。 基于与运输系统2有关的速度或位置变化信息，通过控制检测器的累积时间和/或操作速度或通过校正所获取的图像，也可以在运输系统2的加速/减速期间进行检查。 以固定的时间间隔交替显示检测区域的检查图像提高了检测区域的可视性，并且使得可以在短时间内确认是否存在缺陷。

公开(公告)号：US20110141272A1

公开(公告)日：2011-06-16

申请号：US13059523

申请日：2009-07-10

申请人： Sachio Uto ,  Hidetoshi Nishiyama ,  Kei Shimura ,  Masaaki Ito

发明人： Sachio Uto ,  Hidetoshi Nishiyama ,  Kei Shimura ,  Masaaki Ito

IPC分类号： H04N7/18 ,  G01N21/956

CPC分类号： G01N21/95607 ,  G01N21/94 ,  G01N21/9501

摘要： Disclosed is an apparatus having a light source of a deep ultraviolet ray for detecting a small foreign matter or pattern defect, which may arise during a process for manufacturing a semiconductor device or the like, in high resolution. The apparatus comprises a means for detecting a damage on an optical system due to a wavelength reduction thereby to save a damaged portion, and a means for comparing an optical system arrangement with that at the manufacturing time and detecting the abnormality thereof, to thereby make a correction, so that the apparatus can inspect the defect on an object substrate stably at a high speed and in high sensitivity. Also disclosed is a method for the stable inspection. The apparatus is provided, in the optical path of the optical system, with a means for detecting the intensity and the convergent state of an illumination light, and a means for detecting the abnormality of the optics system and for saving an abnormal portion from alignment with an optical axis. The apparatus is constituted such that the optical system is adjusted to make corrections for the optical conditions at the manufacturing time, thereby to elongate the lifetime of the optical system in the inspecting apparatus and to detect the small defect stably.

摘要翻译： 公开了一种具有用于检测在高分辨率的半导体器件等的制造工艺期间可能出现的小异物或图案缺陷的深紫外线光源的装置。 该装置包括用于检测由于波长减小而导致的光学系统的损坏从而节省损坏部分的装置，以及用于将光学系统布置与制造时间布置进行比较并检测其异常的装置，从而使 校正，使得设备可以高速和高灵敏度稳定地检查对象基板上的缺陷。 还公开了用于稳定检查的方法。 该装置在光学系统的光路中设置有用于检测照明光的强度和收敛状态的装置，以及用于检测光学系统的异常并且用于保存异常部分与对准的装置 光轴。 该装置被构造成使得光学系统被调整以对制造时的光学条件进行校正，从而延长了检查装置中的光学系统的寿命并且稳定地检测小缺陷。

公开(公告)号：US20090161943A1

公开(公告)日：2009-06-25

申请号：US12338528

申请日：2008-12-18

申请人： Hiroyuki Yamashita ,  Norio Sakaiya ,  Kei Shimura ,  Masaaki Ito

发明人： Hiroyuki Yamashita ,  Norio Sakaiya ,  Kei Shimura ,  Masaaki Ito

IPC分类号： G01N21/88 ,  G06T11/20 ,  G06K9/00

CPC分类号： G01N21/88 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/8848 ,  G01N2021/8861 ,  G06K9/2036 ,  G06K2209/19 ,  G06T7/00

摘要： The invention is directed to find a false defect from defect candidates and obtain a threshold with which the false defect can be eliminated by the smallest number of review times. Defect candidates are reviewed and selected as a defect or a false defect. By deleting a defect candidate having a characteristic quantity equal to or less than that of the false defect from a map or displaying it in another sign, the false defect can be determined visually. Since the defect candidate having the characteristic quantity equal to or less than that of the selected false defect is deleted from the map or displayed in another sign, the defect candidates unnecessary to set a threshold are not reviewed. The number of defect candidates to be reviewed can be largely reduced as compared with that in the conventional technique. Further, by repeating the above work, the threshold is automatically calculated, and an inspection result map with the threshold is displayed, so that a re-inspection is unnecessary.

摘要翻译： 本发明旨在从缺陷候选中找到虚假缺陷，并获得最小次数的审查时间可以消除错误缺陷的阈值。 缺陷候选者被审查和选择为缺陷或假缺陷。 通过从地图中删除具有等于或小于虚假缺陷的特征量的缺陷候选物，或者以另一个符号显示，可以视觉地确定假缺陷。 由于具有等于或小于所选择的错误缺陷的特征量的缺陷候选者从地图中删除或以另一个符号显示，所以不会检查不必设置阈值的缺陷候选。 与常规技术相比，可以大大减少待审查的缺陷候选物的数量。 此外，通过重复上述工作，自动计算阈值，并且显示具有阈值的检查结果图，使得不需要重新检查。

公开(公告)号：US07953567B2

公开(公告)日：2011-05-31

申请号：US12683455

申请日：2010-01-07

申请人： Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

发明人： Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

IPC分类号： G06F19/00 ,  G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N21/95607 ,  G01N21/95623 ,  G06K9/2036 ,  G06K2209/19 ,  G06T7/0006 ,  G06T2207/30148

摘要： A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.

摘要翻译： 缺陷检查装置包括：各自安装检查对象的阶段，在其上形成具有一组平行线的电路图案，并且每个行与该组线垂直或平行; 照明光学系统，其利用狭缝光照射被检查物体的表面，使得狭缝光束的纵向方向基本上垂直于台阶的行进方向，并且具有由方向形成的第一倾斜角 并且将所述狭缝光束的光轴的投影线和所述检查对象的投影线， 空间滤波器，根据取向分布的差异来屏蔽或发射检测对象的反射和散射光; 以及检测光学系统，其通过图像传感器检测透过空间滤波器的反射和散射光。 此外，照明光学系统在与平面上的狭缝光束的入射方向相反的方向上用另一个狭缝光照射检查对象。

公开(公告)号：US08351683B2

公开(公告)日：2013-01-08

申请号：US12338528

申请日：2008-12-18

申请人： Hiroyuki Yamashita ,  Norio Sakaiya ,  Kei Shimura ,  Masaaki Ito

发明人： Hiroyuki Yamashita ,  Norio Sakaiya ,  Kei Shimura ,  Masaaki Ito

IPC分类号： G01N21/88 ,  G06T11/20

CPC分类号： G01N21/88 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/8848 ,  G01N2021/8861 ,  G06K9/2036 ,  G06K2209/19 ,  G06T7/00

摘要： The invention is directed to find a false defect from defect candidates and obtain a threshold with which the false defect can be eliminated by the smallest number of review times. Defect candidates are reviewed and selected as a defect or a false defect. By deleting a defect candidate having a characteristic quantity equal to or less than that of the false defect from a map or displaying it in another sign, the false defect can be determined visually. Since the defect candidate having the characteristic quantity equal to or less than that of the selected false defect is deleted from the map or displayed in another sign, the defect candidates unnecessary to set a threshold are not reviewed. The number of defect candidates to be reviewed can be largely reduced as compared with that in the conventional technique. Further, by repeating the above work, the threshold is automatically calculated, and an inspection result map with the threshold is displayed, so that a re-inspection is unnecessary.

摘要翻译： 本发明旨在从缺陷候选中找到虚假缺陷，并获得最小次数的审查时间可以消除错误缺陷的阈值。 缺陷候选者被审查和选择为缺陷或假缺陷。 通过从地图中删除具有等于或小于虚假缺陷的特征量的缺陷候选物，或者以另一个符号显示，可以视觉地确定假缺陷。 由于具有等于或小于所选择的错误缺陷的特征量的缺陷候选者从地图中删除或以另一个符号显示，所以不会检查不必设置阈值的缺陷候选。 与常规技术相比，可以大大减少待审查的缺陷候选物的数量。 此外，通过重复上述工作，自动计算阈值，并且显示具有阈值的检查结果图，使得不需要重新检查。

公开(公告)号：US20100106443A1

公开(公告)日：2010-04-29

申请号：US12683455

申请日：2010-01-07

申请人： Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

发明人： Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

IPC分类号： G06F19/00 ,  G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N21/95607 ,  G01N21/95623 ,  G06K9/2036 ,  G06K2209/19 ,  G06T7/0006 ,  G06T2207/30148

摘要： A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.

摘要翻译： 缺陷检查装置包括：各自安装检查对象的阶段，在其上形成具有一组平行线的电路图案，并且每个行与该组线垂直或平行; 照明光学系统，其利用狭缝光照射被检查物体的表面，使得狭缝光束的纵向方向基本上垂直于台阶的行进方向，并且具有由方向形成的第一倾斜角 并且将所述狭缝光束的光轴的投影线和所述检查对象的投影线， 空间滤波器，根据取向分布的差异来屏蔽或发射检测对象的反射和散射光; 以及检测光学系统，其通过图像传感器检测透过空间滤波器的反射和散射光。 此外，照明光学系统在与平面上的狭缝光束的入射方向相反的方向上用另一个狭缝光照射检查对象。

公开(公告)号：US20080059094A1

公开(公告)日：2008-03-06

申请号：US11846829

申请日：2007-08-29

申请人： Kei SHIMURA ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

发明人： Kei SHIMURA ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

IPC分类号： G06F19/00

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N21/95607 ,  G01N21/95623 ,  G06K9/2036 ,  G06K2209/19 ,  G06T7/0006 ,  G06T2207/30148

摘要： A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.

摘要翻译： 缺陷检查装置包括：各自安装检查对象的阶段，在其上形成具有一组平行线的电路图案，并且每个行与该组线垂直或平行; 照明光学系统，其利用狭缝光照射被检查物体的表面，使得狭缝光束的纵向方向基本上垂直于台阶的行进方向，并且具有由方向形成的第一倾斜角 并且将所述狭缝光束的光轴的投影线和所述检查对象的投影线， 空间滤波器，根据取向分布的差异来屏蔽或发射检测对象的反射和散射光; 以及检测光学系统，其通过图像传感器检测透过空间滤波器的反射和散射光。 此外，照明光学系统在与平面上的狭缝光束的入射方向相反的方向上用另一个狭缝光照射检查对象。

公开(公告)号：US07672799B2

公开(公告)日：2010-03-02

申请号：US11846829

申请日：2007-08-29

申请人： Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

发明人： Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

IPC分类号： G06F19/00 ,  G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N21/95607 ,  G01N21/95623 ,  G06K9/2036 ,  G06K2209/19 ,  G06T7/0006 ,  G06T2207/30148

摘要： A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.

摘要翻译： 缺陷检查装置包括：各自安装检查对象的阶段，在其上形成具有一组平行线的电路图案，并且每个行与该组线垂直或平行; 照明光学系统，其利用狭缝光照射被检查物体的表面，使得狭缝光束的纵向方向基本上垂直于台阶的行进方向，并且具有由方向形成的第一倾斜角 并且将所述狭缝光束的光轴的投影线和所述检查对象的投影线， 空间滤波器，根据取向分布的差异来屏蔽或发射检测对象的反射和散射光; 以及检测光学系统，其通过图像传感器检测透过空间滤波器的反射和散射光。 此外，照明光学系统在与平面上的狭缝光束的入射方向相反的方向上用另一个狭缝光照射检查对象。

公开(公告)号：US09602780B2

公开(公告)日：2017-03-21

申请号：US13997496

申请日：2011-11-02

申请人： Masaaki Ito ,  Hidetoshi Nishiyama ,  Takahiro Jingu

发明人： Masaaki Ito ,  Hidetoshi Nishiyama ,  Takahiro Jingu

IPC分类号： H04N7/18 ,  G01N21/47 ,  G01N21/956 ,  H01L21/66 ,  G01N21/95

CPC分类号： H04N7/18 ,  G01N21/47 ,  G01N21/9501 ,  G01N21/956 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： In a defect inspecting apparatus, the strength of a fatal defect signal decreases due to miniaturization. Thus, in order to assure a high SN ratio, it is necessary to reduce noises caused by scattered light from a wafer. Roughness of a pattern edge and surface roughness which serve as a scattered-light source are spread over the entire wafer. The present invention has discovered the fact that reduction of an illuminated area is a technique effective for decreasing noises. That is to say, the present invention has discovered the fact that creation of an illuminated area having a spot shape and reduction of the dimension of a spot beam are effective. A plurality of temporally and spatially divided spot beams are radiated to the wafer serving as a sample.

公开(公告)号：US20140198321A1

公开(公告)日：2014-07-17

申请号：US14240669

申请日：2012-07-27

申请人： Masaaki Ito ,  Takahiro Jingu ,  Hisashi Hatano

发明人： Masaaki Ito ,  Takahiro Jingu ,  Hisashi Hatano

IPC分类号： G01B11/24 ,  G01N21/55

CPC分类号： G01B11/303 ,  G01B11/24 ,  G01B2210/56 ,  G01N21/4738 ,  G01N21/55 ,  G01N21/9501 ,  G01N2201/12

摘要： In related art, consideration is not given to that a spatial distribution of scattered light changes in various direction such as forward/backward/sideways according to a difference in micro roughness. Particularly, although a step-terrace structure appearing on an epitaxial growth wafer produces anisotropy in the scattered light distribution, consideration is not given to this point in the related art. The invention includes a process in which light is illuminated to a sample surface, plural detection optical systems mutually different in directions of optical axes detect a spatial distribution of scattered light, and a spatial frequency spectrum of the sample surface is calculated.

摘要翻译： 在现有技术中，不考虑散射光的空间分布根据微粗糙度的差异而在各种方向如前后/侧面变化。 特别地，虽然出现在外延生长晶片上的台阶平台结构在散射光分布中产生各向异性，但是在现有技术中没有考虑到这一点。 本发明包括将光照射到样品表面的方法，在光轴方向上彼此不同的多个检测光学系统检测散射光的空间分布，并且计算样品表面的空间频谱。