Method of preparing norbornene sulfonamide polymers
    2.
    发明授权
    Method of preparing norbornene sulfonamide polymers 有权
    制备降冰片烯磺酰胺聚合物的方法

    公开(公告)号:US06235849B1

    公开(公告)日:2001-05-22

    申请号:US09497356

    申请日:2000-02-03

    IPC分类号: C08F804

    CPC分类号: C08G61/02 C08G61/00 C08G61/08

    摘要: The invention is directed to polymers containing a repeating unit derived from a norbornene sulfonamide. These may be addition polymers which include copolymers with one or more comonomers such as norbornene, ethylene, an acrylate or sulfur dioxide or carbon monoxide. Said monomers may be polymerized using single or multicomponent Group VIII catalysts. The norbornene sulfonamides can also form ROMP polymers using known metathesis catalysts. Preferably the ROMP polymers may be hydrogenated to give more stable polymers.

    摘要翻译: 本发明涉及含有衍生自降冰片烯磺酰胺的重复单元的聚合物。 这些可以是加成聚合物,其包括与一种或多种共聚单体如降冰片烯,乙烯,丙烯酸酯或二氧化硫或一氧化碳的共聚物。 所述单体可以使用单组分或多组分VIII族催化剂进行聚合。 降冰片烯磺酰胺也可以使用已知的复分解催化剂形成ROMP聚合物。 优选地,ROMP聚合物可以被氢化以得到更稳定的聚合物。

    Photosensitive compositions based on polycyclic polymers
    8.
    发明授权
    Photosensitive compositions based on polycyclic polymers 有权
    基于多环聚合物的光敏组合物

    公开(公告)号:US07022790B2

    公开(公告)日:2006-04-04

    申请号:US10465511

    申请日:2003-06-19

    IPC分类号: C08F10/00

    摘要: A copolymer composition including a copolymer having repeat units of structural formula I: where X is selected from —CH2—, —CH2—CH2— and O; m is an integer from 0 to 5; and each occurrence of R1–R4 are independently selected from H; C1 to C25 linear, branched, and cyclic alkyl, aryl, aralkyl, alkaryl, alkenyl and alkynyl that can include one or more hetero atoms selected from O, N, and Si; a group that contains an epoxy functionality; —(CH2)nC(O)OR5; —(CH2)nC(O)OR6; —(CH2)nOR6; —(CH2)nOC(O)R6; —(CH2)nC(O)R6; —(CH2)nOC(O)OR6; and any combination of two of R1, R2, R3, and R4 linked together by a linking group. A portion of the repeat units having structural formula I contain at least one epoxy functional pendant group. The copolymer composition can be included with a material that photonically forms a catalyst in a photodefinable dielectric composition, which can be used to form a photodefinable layer on a substrate.

    摘要翻译: 一种共聚物组合物,其包含具有结构式I的重复单元的共聚物:其中X选自-CH 2 - , - CH 2 -CH 2 > - 和O; m是0至5的整数; 并且每次出现的R 1 -R 4独立地选自H; C 1至C 25直链,支链和环状的烷基,芳基,芳烷基,烷芳基,烯基和炔基,其可以包括一个或多个选自O,N, 和Si; 含有环氧官能团的基团; - (CH 2)2 C(O)OR 5; - (CH 2)2 C(O)OR 6; - (CH 2 2)n - 或 - 6 - - (CH 2)n OC(O)R 6; - (CH 2 CH 2)n C(O)R 6; - (CH 2)n OC(O)OR 6; 并且R 1,R 2,R 3,R 4和R 4中的两个的任何组合通过 连接组。 具有结构式I的重复单元的一部分含有至少一个环氧官能侧基。 该共聚物组合物可以包含在可光致定影的电介质组合物中光子形成催化剂的材料,该组合物可用于在基底上形成光可定义层。