Abstract:
A display device includes a substrate, a transistor on the substrate, a pixel electrode connected to the transistor, a bank layer disposed on the pixel electrode and defining a pixel opening overlapping the pixel electrode, an emission layer in the pixel opening, a common electrode on the emission layer and the bank layer, an encapsulation layer on the common electrode, a sensing electrode on the encapsulation layer, a first insulating layer disposed on the encapsulation layer and overlapping the pixel opening, a second insulating layer on the first insulating layer, and a third insulating layer surrounding the first insulating layer. A refractive index of the first insulating layer, a refractive index of the second insulating layer, and a refractive index of the third insulating layer are different from one another, and the refractive index of the first insulating layer is greater than the refractive index of the third insulating layer.
Abstract:
A display device includes a base substrate, a pixel defining layer disposed on the base substrate and including a first opening, a light emitting structure disposed in the first opening of the pixel defining layer, a thin film encapsulation layer disposed on the light emitting structure, a touch electrode disposed on the thin film encapsulation layer, an insulating pattern disposed on the touch electrode and including a second opening which overlaps the first opening, and a high refractive layer disposed on the insulating pattern, the high refractive layer including a plurality of grid patterns disposed on a top surface of the high refractive layer, and a refractive index higher than a refractive index of the insulating pattern.
Abstract:
An exposure mask for forming a pattern in a photosensitive material includes a mask substrate which is disposed facing the photosensitive material; a body portion on the mask substrate and corresponding to a shape of the pattern at a distance furthest from the exposure mask; and a plurality of branch portions on the mask substrate and each extending outward from an outer edge of the body portion, in a plan view. The pattern comprises a contact hole of a display device.
Abstract:
A display device includes, a light emitting diode disposed on a substrate, and including an emission layer, an encapsulation layer disposed on the light emitting diode, a first layer disposed on the encapsulation layer and including an opening, a light blocking pattern disposed in the opening and extending in a first direction, and a second layer disposed on the first layer and the light blocking pattern. A refractive index of the first layer and a refractive index of the second layer are different from each other.
Abstract:
A display device comprises a transistor layer that includes a display area and a pad area disposed adjacent to the display area, an emission layer disposed in the display area on the transistor layer, a first display insulating layer disposed on the emission layer, and an insulating layer disposed in the pad area on the transistor layer, the insulating layer and the first display insulating layer including a same material, and the insulating layer having a step.
Abstract:
A display device includes a pixel defining layer on a first electrode and including a pixel opening overlapping the first electrode, an encapsulation layer on the pixel defining layer and the first electrode, a sensing electrode on the encapsulation layer, a second sensing insulating layer on the sensing electrode and overlapping the pixel opening, and a third sensing insulating layer on the second sensing insulating layer and the sensing electrode. The second sensing insulating layer includes a first sub-sensing insulating layer including an inorganic material and having a first refractive index, and a second sub-sensing insulating layer including an organic material and having a second refractive index, the first refractive index being greater than the second refractive index.
Abstract:
A method of manufacturing a display device, including forming a first sensing insulating layer on a display panel comprising an active area and a peripheral area; forming a first conductive layer on the first sensing insulating layer; forming a second sensing insulating layer to cover the first conductive layer; forming a second conductive layer comprising a conductive material on the second sensing insulating layer; forming a passivation layer on the second conductive layer; substantially simultaneously etching the second conductive layer and the passivation layer through a photolithography process; and forming a third sensing insulating layer to cover the passivation layer. The passivation layer includes an inorganic material.
Abstract:
A display device includes a display area, anon-display area, and a pad part in the non-display area and exposed to outside the display device. The pad part includes a conductive part, and an insulating part defining an opening exposing the conductive part to outside the pad part. The insulating part includes in order from the conductive part a first insulating layer defining a first opening, and a second insulating layer facing the first insulating layer and defining a second opening which is wider than the first opening.
Abstract:
A display device includes: a substrate on which is disposed: an organic light emitting element which generates and emits light with which an image is displayed; a thin film transistor connected to the organic light emitting element and with which the organic light emitting element is controlled to emit the light; an interlayer insulating layer disposed between the thin film transistor and the organic light emitting element, the interlayer insulating layer including an organic material; and a capping layer disposed between the interlayer insulating layer and the organic light emitting element, the capping layer including an inorganic material. The interlayer insulating layer disposed between the thin film transistor and the organic light emitting element does not have photosensitivity and does not include sulfur.
Abstract:
The present invention relates to a thin film transistor array panel and a manufacturing method thereof that prevent disconnection of wiring due to misalignment of a mask, and simplify a process and reduce cost by reducing the number of masks. The thin film transistor array panel according to the disclosure includes a source electrode enclosing an outer part of the first contact hole and formed on the second insulating layer; a drain electrode enclosing an outer part of the second contact hole and formed on the second insulating layer; a first connection electrode connecting the source region of the semiconductor layer and the source electrode through the first contact hole; and a second connection electrode connecting the drain region of the semiconductor layer and the drain electrode through the second contact hole.