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公开(公告)号：US20210135172A1
公开(公告)日：2021-05-06
申请号：US17149964
申请日：2021-01-15
Applicant: Samsung Display Co. Ltd.
Inventor： Hee Kyun SHIN , Seung Jun MOON , Byung Hoon KANG , Min Woo LEE , Woo Jin CHO
Abstract: A display device includes a base, a light emitting device on a first surface of the base, and a plate-like inorganic layer on a second surface of the base, the plate-like inorganic layer including a first plate-like inorganic particle with a first size and a second plate-like inorganic particle with a second size different from the first size.
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公开(公告)号：US20210114163A1
公开(公告)日：2021-04-22
申请号：US17036062
申请日：2020-09-29
Applicant: Samsung Display Co., LTD. , KCTECH CO.,LTD.
Inventor： Seung Bae KANG , Sung Hyeon PARK , Jung Gun NAM , Joon-Hwa BAE , Kyung Bo LEE , Keun Woo LEE , Woo Jin CHO , Byoung Kwon CHOO
Abstract: A substrate processing apparatus includes: a conveyor belt configured to have an outer surface on which a bottom surface of a substrate is seated; and a polishing head unit configured to face an upper surface of the substrate, wherein the polishing head unit includes: a polishing head connected to a driver; a polishing pad configured to face the polishing head; a polishing pad fixing ring disposed between the polishing head and the polishing pad; and a temperature sensor configured to overlap the polishing pad fixing ring and to be spaced apart from the polishing pad fixing ring.
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公开(公告)号：US20210104672A1
公开(公告)日：2021-04-08
申请号：US17029855
申请日：2020-09-23
Applicant: Samsung Display Co., LTD. , DONGJIN SEMICHEM CO., LTD.
Inventor： Hee Kyun SHIN , Dong Kyun SEO , Jun Ho SIM , Woo Jin CHO , Byung Hoon KANG , Seung Jun MOON , Sun Chan PARK , Hee Won SEO , Ji Eun CHO , Kyu Soon SHIN
Abstract: A coating composition includes a graphene oxide and a solvent. At least one of a carboxyl group and an epoxide group of the graphene oxide is functionalized by an amine. The amine has an activation energy to an epoxide group of the graphene oxide of about −3 kcal/mol to about 8 kcal/mol. A method of forming a stacked structure using the coating composition is provided. A method of manufacturing a display device using the coating composition is provided.
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公开(公告)号：US20230295503A1
公开(公告)日：2023-09-21
申请号：US18122337
申请日：2023-03-16
Applicant: Samsung Display Co., LTD.
Inventor： YOUNGROK KIM , KYU-SOON PARK , Jong-Hyun CHOUNG , Woo Jin CHO , Gyu Po KIM , SUNG MIN KIM , Jae Myeong KIM , Hyun Cheol SHIN , JUN DONG KIM , JUN YOUNG HAWNG
IPC: C09K13/08 , H10K71/20 , H10K59/126 , H10K59/12
CPC classification number: C09K13/08 , H10K71/231 , H10K59/126 , H10K59/1201
Abstract: Embodiments provide an etchant composition that includes about 5.0 to about 20.0 wt % of a persulfate, about 0.01 to about 15.0 wt % of a sulfonic acid, about 0.01 to about 2.0 wt % of a fluorine compound, about 0.01 to about 5.0 wt % of a 4-nitrogen cyclic compound, about 0.01 to about 1.0 wt % of an amino acid including a hydrophobic group having at least two carbon atoms, and water A weight ratio of the amino acid to the 4-nitrogen cyclic compound is in a range of about 1:16 to about 1:60.
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公开(公告)号：US20220199694A1
公开(公告)日：2022-06-23
申请号：US17552198
申请日：2021-12-15
Applicant: Samsung Display Co., LTD.
Inventor： Joon Hwa BAE , Bong Gu KANG , Woo Jin CHO , Seung Bae KANG , Hee Sung YANG , Byoung Kwon CHOO
Abstract: A method of fabricating a display device includes: preparing a substrate including emission areas and a non-emission area between the emission areas; forming a bank on the non-emission area to a first height; forming light conversion patterns on the emission areas to a height equal to or less than the first height; polishing a surface of a light conversion layer including the bank and the light conversion patterns so that the surface of the light conversion layer is flat; and forming a filler layer on a surface of the substrate on which the light conversion layer is provided. The polishing of the light conversion layer includes planarizing the surface of the light conversion layer so that the bank and the light conversion patterns have a second height through chemical mechanical polishing utilizing a metallic slurry.
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Patent Agency Ranking
公开(公告)号：US20220077260A1
公开(公告)日：2022-03-10
申请号：US17332933
申请日：2021-05-27
Applicant: Samsung Display Co., Ltd.
Inventor： Byoung Kwon CHOO , Seung Bae KANG , Bong Gu KANG , Tae Joon KIM , Jeong Min PARK , Joon-Hwa BAE , Hee Sung YANG , Woo Jin CHO
Abstract: A display device according to an embodiment includes: a substrate; a transistor that is disposed on the substrate; a light emitting diode that is disposed on the substrate, and connected to the transistor; and a passivation layer that is disposed between the transistor and the light emitting diode, wherein a surface step of the passivation layer is within a range of and including 1 nm to 30 nm.
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公开(公告)号：US20190157627A1
公开(公告)日：2019-05-23
申请号：US16007788
申请日：2018-06-13
Applicant: Samsung Display Co., Ltd.
Inventor： Joon Hwa BAE , Hyun Jin CHO , Byoung Kwon CHOO , Woo Jin CHO
Abstract: In a method of manufacturing a display device, the method includes: forming a conductive layer on a base; forming an organic layer, with a hole partially exposing the conductive layer, on the conductive layer; polishing an upper surface of the organic layer; and forming a light emitting element on the polished organic layer.
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公开(公告)号：US20180114819A1
公开(公告)日：2018-04-26
申请号：US15605431
申请日：2017-05-25
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Byung Hoon KANG , Kwang Suk KIM , Joon-Hwa BAE , Woo Jin CHO , Hyun Jin CHO , Jun Hyuk CHEON , Byoung Kwon CHOO
IPC: H01L27/32
CPC classification number: H01L27/3248 , H01L27/3276 , H01L2227/323
Abstract: A method of manufacturing a display device includes: forming an active layer on a substrate; forming a first insulation layer covering the active layer; forming a gate metal line on the first insulation layer; forming a third insulation layer covering the gate metal line and including a silicon oxide; forming a fourth insulation layer including a silicon nitride on the third insulation layer; forming a fifth insulation layer including a silicon oxide on the fourth insulation layer; arranging a blocking member over a region in which the active layer and the gate metal line overlap; forming a fifth auxiliary insulation layer by doping nitrogen ions in the fifth insulation layer; and exposing a part of an upper surface of the fourth insulation layer by removing a portion of a fifth main insulation layer of the fifth insulation layer which does not overlap the fifth auxiliary insulation layer.
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公开(公告)号：US20180099904A1
公开(公告)日：2018-04-12
申请号：US15592259
申请日：2017-05-11
Applicant: Samsung Display Co. Ltd.
Inventor： Jeong Woo PARK , Hyun Joon OH , Woo Jin CHO , Seung Ho KIM , Hee Kyun SHIN , Jong Hoon YEUM , Hoi Kwan LEE
CPC classification number: C03C21/002 , C03C15/00 , C03C2218/34
Abstract: A method of manufacturing strengthened glass includes: preparing glass including blocking patterns on a surface thereof, portions of the surface exposed between the blocking patterns; forming a metal particle layer on the portions of the surface of the glass exposed between the blocking patterns; removing the blocking patterns from the surface of the glass, to maintain the metal particle layer on the surface of the glass; with the metal particle layer maintained on the surface of the glass, etching the surface of the glass using the metal particle layer as an etching mask to form an etched surface of the glass, such etched surface including protruding patterns spaced apart from each other by portions of a common reference surface; and chemically strengthening the etched surface of the glass at the protruding patterns and at the reference surface.
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公开(公告)号：US20180043501A1
公开(公告)日：2018-02-15
申请号：US15664166
申请日：2017-07-31
Applicant: Samsung Display Co., Ltd.
Inventor： Hyun Jin CHO , Joon-Hwa BAE , Byoung Kwon CHOO , Byung Hoon KANG , Jun Hyuk CHEON , Jeong-Hye CHOI , Young Ho JEONG , Woo Jin CHO
IPC: B24B37/34 , B24B53/017 , B24B37/10
CPC classification number: B24B37/345 , B24B37/10 , B24B53/017
Abstract: A substrate polishing system includes: a polishing machine and a substrate transporter. The polishing machine includes: a lower surface plate to which a substrate is mounted, and an upper surface plate which faces the lower surface plate and polishes the substrate in cooperation with the lower surface plate, the upper surface plate having a larger area than the substrate mounted on the lower surface plate. The substrate transporter is adjacent to the polishing machine and commonly transports the substrate to and from the polishing machine in a first direction, attaches the substrate to the lower surface plate before polishing thereof, and separates from the lower surface plate the substrate after polishing thereof.
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