VAPOR DEPOSITION APPARATUS
    1.
    发明申请

    公开(公告)号:US20200173015A1

    公开(公告)日:2020-06-04

    申请号:US16774409

    申请日:2020-01-28

    Abstract: Provided is a vapor deposition apparatus including a first injection unit injecting a first raw gas in a first direction and a first filter unit mounted on the first injection unit. The first filter unit includes a plurality of plates separated from one another in the first direction and disposed in parallel to one another, each of the plurality of plates having holes therein, being detachably coupled with the first filter unit, and having the holes with sizes of horizontal cross-sections gradually increasing in a direction in which the first raw gas moves. Accordingly, a process efficiency of the vapor deposition apparatus may be enhanced.

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