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公开(公告)号：US10185424B2
公开(公告)日：2019-01-22
申请号：US15429736
申请日：2017-02-10
发明人： Jungha Son , Jaeneung Kim , Yong-hwan Ryu , Sangkyu Choi , Jihun Kim , Hanyung Jung
摘要： Provided is a touch member includes a folding region folded around a folding axis and a non-folding region adjacent to the folding region. The touch member includes a first conductive pattern disposed in the folding region and a second conductive pattern disposed in the non-folding region. The touch member also includes an air gap defined inside the first conductive pattern. The touch member is configured to detect an external signal.
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公开(公告)号：US20160216100A1
公开(公告)日：2016-07-28
申请号：US14799810
申请日：2015-07-15
发明人： Jihun Kim , Dongil Kim
CPC分类号： G01B7/085 , C23C14/545 , C23C16/50 , C23C16/52 , H01J37/32477 , H01J37/32853 , H01J37/32871 , H01J37/32917 , H01J37/32935
摘要： An apparatus for measuring contamination of a plasma generating includes: a chamber; a susceptor provided in the chamber and on which a substrate is mounted; a plasma generator configured to generate plasma in the chamber; an inner jacket provided in the chamber and surrounding a space where the plasma is generated; a V-I probe electrically connected to the inner jacket and configured to detect a phase difference between a voltage and a current; a power supply unit configured to supply the voltage to the inner jacket through a blocking capacitor; and a monitor connected to the V-I probe and configured to store and display measurement data. A thickness of a contamination layer on a surface of the inner jacket is determined by analyzing a signal obtained by supplying the voltage to the inner jacket.
摘要翻译： 用于测量等离子体产生污染的装置包括：腔室; 设置在所述室中并且其上安装有基板的感受体; 等离子体发生器，其被配置为在所述室中产生等离子体; 设置在腔室中并围绕产生等离子体的空间的内护套; 电连接到所述内护套并被配置为检测电压和电流之间的相位差的V-I探头; 电源单元，被配置为通过隔离电容器将电压提供给所述内护套; 以及连接到V-I探头并被配置为存储和显示测量数据的监视器。 通过分析通过向内套提供电压获得的信号来确定内套表面上的污染层的厚度。
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3.发明授权公开(公告)号：US10773427B2
公开(公告)日：2020-09-15
申请号：US15652184
申请日：2017-07-17
发明人： Daehwan Jang , Seung-Won Park , Baehyoun Jung , Eunjung Kim , Jihun Kim , Yunjong Yeo , Hyungbin Cho , Sang-Hoon Lee , Yong-Hwan Ryu , Sung-Young Choi , Hyunju Kang
摘要： A method of manufacturing a roll type imprint master mold including disposing a base layer on a substrate including a first area and a second area adjacent to the first area, disposing an inorganic insulation layer on the base layer, forming a first mask pattern and a first resin pattern in the first area, forming a pattern layer by etching the inorganic insulation layer using the first resin and the first mask patterns as a mask, removing the first resin and the first mask patterns, forming a second mask pattern and a second resin pattern in the second area, forming a pattern layer by etching the inorganic insulation layer using the second resin and the second mask patterns as a mask, removing the second resin and the second mask patterns, separating the base layer from the substrate, and attaching the base layer onto a roll body.
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