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公开(公告)号:US12230735B2
公开(公告)日:2025-02-18
申请号:US17720063
申请日:2022-04-13
Applicant: Samsung Display Co., Ltd.
Inventor: Hyun Eok Shin , Ju Hyun Lee , Sung Joo Kwon , Hyun Ah Sung , Dong Min Lee
Abstract: Provided is a display device comprising a substrate; a plurality of transistors disposed on the substrate; a first pixel electrode, a second pixel electrode, and a third pixel electrode respectively connected to the transistors; a first emission layer disposed to overlap the first pixel electrode, a second emission layer disposed to overlap the second pixel electrode, and a third emission layer disposed to overlap the third pixel electrode; and a common electrode disposed on the first emission layer, the second emission layer, and the third emission layer, wherein the first pixel electrode includes a first layer, and a second layer disposed on the first layer and including a Ga-doped ITO.
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公开(公告)号:US12213348B2
公开(公告)日:2025-01-28
申请号:US18443131
申请日:2024-02-15
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Gyung Min Baek , Ju Hyun Lee , Tae Wook Kang , Hyun Eok Shin
IPC: H10K59/12 , H10K50/86 , H10K59/121 , H10K59/123 , H01L27/12
Abstract: A display device is provided. A display device includes a non-display area where no image is displayed, and a display area where images are displayed, and including a first area and a second area having different light transmittances, and a first pixel and a second pixel, wherein a transistor and an anode electrode of the first pixel are in the first area, wherein an anode electrode of the second pixel is in the second area, and a transistor of the second pixel is outside the second area, wherein the anode electrode and the transistor of the second pixel are electrically connected by a connection line, and wherein at least a part of the connection line is in at least one of the first area and the second area, and is covered by an anti-reflection layer.
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公开(公告)号:US11730033B2
公开(公告)日:2023-08-15
申请号:US17331527
申请日:2021-05-26
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Gyung Min Baek , Hyun Eok Shin , Ju Hyun Lee , Hong Sick Park
IPC: H10K59/131 , H10K59/126 , H10K59/38 , H10K71/00 , H10K59/12 , H10K59/123
CPC classification number: H10K59/1315 , H10K59/126 , H10K59/38 , H10K71/00 , H10K59/1201
Abstract: A display device includes: a substrate; a data line on the substrate; a first insulating layer on the data line; a first transistor on the first insulating layer; a second insulating layer on the first transistor; a pixel electrode on the second insulating layer, the pixel electrode being electrically connected to the first transistor; and an auxiliary data pattern on the second insulating layer as a same layer as the pixel electrode, the auxiliary data pattern being electrically connected to the data line.
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公开(公告)号:US11099441B2
公开(公告)日:2021-08-24
申请号:US16460829
申请日:2019-07-02
Applicant: Samsung Display Co., Ltd.
Inventor: Chan Woo Yang , Hong Sick Park , Hyun Eok Shin , Joon Yong Park , Gyung Min Baek , Sang Won Shin , Ju Hyun Lee
IPC: H01L29/49 , G02F1/1362 , H01L27/12 , G02F1/1335 , H01L21/285 , G02F1/1368 , H01L21/3213
Abstract: A wire substrate, a display device including a wire substrate, and a method of fabricating a wire substrate are disclosed. The display device comprises: a first base; and a first wiring layer disposed on the first base and comprising a conductive layer and a metal oxide layer stacked on the conductive layer, wherein the metal oxide layer comprises molybdenum (Mo), tantalum (Ta), and oxygen (O). The conductive layer includes a first metal layer on the first base, and a second metal layer between the first metal layer and the metal oxide layer. The second metal layer has a higher electrical conductivity than the first metal layer, and a thickness of the second metal layer is greater than a thickness of the first metal layer.
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公开(公告)号:US11495624B2
公开(公告)日:2022-11-08
申请号:US17144210
申请日:2021-01-08
Applicant: Samsung Display Co., LTD.
Inventor: Ju Hyun Lee , Gyung Min Baek , Do Keun Song , Hyun Eok Shin
Abstract: A display device includes: a substrate including a first display area and a second display area; an optical element which overlaps the second display area; a semiconductor layer disposed on the substrate; a first insulation layer disposed to cover the semiconductor layer; a gate conductor disposed on the first insulation layer; a second insulation layer disposed to cover the gate conductor; a data conductor disposed on the second insulation layer; a third insulation layer disposed to cover the data conductor; and a pixel electrode disposed on the data conductor. The data conductor disposed in the first display area includes an opaque conductor, and a part of the data conductor disposed in the second display area is a transparent conductor.
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6.
公开(公告)号:US10386687B2
公开(公告)日:2019-08-20
申请号:US15906991
申请日:2018-02-27
Applicant: Samsung Display Co., Ltd.
Inventor: Chan Woo Yang , Hong Sick Park , Hyun Eok Shin , Joon Yong Park , Gyung Min Baek , Sang Won Shin , Ju Hyun Lee
IPC: H01L27/12 , H01L29/49 , G02F1/1335 , G02F1/1362 , G02F1/1368 , H01L21/285 , H01L21/3213
Abstract: A wire substrate, a display device including a wire substrate, and a method of fabricating a wire substrate are disclosed. The display device comprises: a first base; and a first wiring layer disposed on the first base and comprising a conductive metal layer and a metal oxide layer stacked on one another, wherein the metal oxide layer comprises MoxTayOz, wherein a content of tantalum is equal to or less than 2.0 at % (atomic percent) based on a total number of metal atoms.
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7.
公开(公告)号:US12041818B2
公开(公告)日:2024-07-16
申请号:US17400158
申请日:2021-08-12
Applicant: Samsung Display Co., Ltd.
Inventor: Ju Hyun Lee , Gyung Min Baek , Hyun Eok Shin , Sung Joo Kwon
IPC: H10K50/86 , H10K59/122
CPC classification number: H10K50/865 , H10K59/122
Abstract: A display devise is provided. A display device includes a substrate, a lower metal pattern disposed on one surface of the substrate, a buffer layer disposed on the one surface of the substrate to cover the lower metal pattern, a semiconductor layer disposed on the buffer layer, a gate insulating film disposed on the semiconductor layer, and a gate electrode disposed on the gate insulating film, wherein the lower metal pattern includes an antireflection layer disposed on the one surface of the substrate and a conductive metal layer disposed on one surface of the antireflection layer, and the antireflection layer includes molybdenum oxide (MoOx) and at least one of zinc oxide (ZnOx) and indium oxide (InOx).
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公开(公告)号:US11837468B2
公开(公告)日:2023-12-05
申请号:US17469279
申请日:2021-09-08
Inventor: Mann Ho Cho , Kwang Sik Jeong , Hyeon Sik Kim , Hyun Eok Shin , Byung Soo So , Ju Hyun Lee
IPC: H01L21/02
CPC classification number: H01L21/02491 , H01L21/0254 , H01L21/02422 , H01L21/02502
Abstract: A method of manufacturing a stacked structure includes forming a first metal buffer layer including crystal grains on a base substrate, forming a second metal buffer material layer on the first metal buffer layer, and crystallizing the second metal buffer material layer to form a second metal buffer layer, wherein the second metal buffer material layer includes crystal grains, and a density of the crystal grains of the second metal buffer material layer is lower than a density of the crystal grains of the first metal buffer layer.
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公开(公告)号:US11424312B2
公开(公告)日:2022-08-23
申请号:US16872594
申请日:2020-05-12
Applicant: Samsung Display Co., Ltd.
Inventor: Gyung Min Baek , Ju Hyun Lee , Jae Uoon Kim , Hong Sick Park , Hyun Eok Shin
Abstract: A device includes a substrate including a display area and a pad area; a first conductive layer on the substrate; and a first insulating film on the first conductive layer, the first insulating film having a first contact hole in the display area to expose the first conductive layer and a pad opening exposing the first conductive layer in the pad area, the first conductive layer being arranged such that in a first region covered by the first insulating film, a second conductive capping layer of the first conductive layer is entirely on a first conductive capping layer of the first conductive layer; in a second region overlapping the contact hole, the second conductive capping layer is entirely on the first conductive capping layer; and in a third region exposed by the pad opening, the second conductive capping layer exposes at least a portion of the first conductive capping layer.
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公开(公告)号:US20220013615A1
公开(公告)日:2022-01-13
申请号:US17178288
申请日:2021-02-18
Applicant: Samsung Display Co., Ltd.
Inventor: Gyung Min Baek , Hyun Eok Shin , Ju Hyun Lee
Abstract: A display device and a method of fabricating a display device are provided. A display device includes a substrate. The wiring layer includes a conductive metal layer and a metal compound layer of the conductive metal layer, The metal compound layer surrounds the conductive metal layer.
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