LOADING APPARATUS FOR DEPOSITION MASK
    1.
    发明公开

    公开(公告)号:US20230147723A1

    公开(公告)日:2023-05-11

    申请号:US17894625

    申请日:2022-08-24

    CPC classification number: C23C14/042

    Abstract: A loading apparatus for a deposition mask includes a clamper that clamps the mask extending in a direction, a first adsorption part, a second adsorption part, and a connection part connected to the first adsorption part and the second adsorption part, and includes a picker that transfers the mask. In case that the picker transfers the mask, the first adsorption part adsorbs ends of the mask, the second adsorption unit adsorbs a portion between the ends of the mask, and the clamper clamps the mask between the first adsorption part and the second adsorption part.

    MASK TENSION WELDING DEVICE FOR THIN FILM DEPOSITION
    2.
    发明申请
    MASK TENSION WELDING DEVICE FOR THIN FILM DEPOSITION 审中-公开
    用于薄膜沉积的掩模拉伸焊接装置

    公开(公告)号:US20170001259A1

    公开(公告)日:2017-01-05

    申请号:US14994941

    申请日:2016-01-13

    Abstract: A mask tension welding device for welding a mask for thin film deposition on a mask frame, the mask tension welding device including a tension unit to pull the mask in one direction; a pressurizing unit to press the mask to the mask frame, the pressuring unit including an upper housing, a lower housing coupled to the upper housing, a window between the upper housing and the lower housing, a space in the lower housing into which a fluid is injectable, and an inlet and an outlet to provide a passage through which the fluid is injected and discharged; and a laser welding unit to weld the mask and the mask frame to each other.

    Abstract translation: 一种用于在掩模框架上焊接用于薄膜沉积的掩模的掩模张力焊接装置,所述掩模张力焊接装置包括在一个方向上拉动所述掩模的张力单元; 加压单元,用于将掩模按压到掩模框架,加压单元包括上壳体,联接到上壳体的下壳体,上壳体和下壳体之间的窗口,下壳体中的空间,流体 是可注射的;以及入口和出口,用于提供流体注入和排出的通道; 以及将掩模和掩模框架彼此焊接的激光焊接单元。

    APPARATUS FOR CLEANING DEPOSITION MASK AND METHOD OF CLEANING DEPOSITION MASK

    公开(公告)号:US20180345331A1

    公开(公告)日:2018-12-06

    申请号:US15990866

    申请日:2018-05-29

    Inventor: Myungkyu KIM

    Abstract: An apparatus for cleaning a mask includes a chamber in which material deposition is performable on a substrate using the mask, the chamber including a transmission window through which light used in cleaning the mask within the chamber is irradiated into the chamber from outside thereof; within the chamber: a stage on which the substrate is disposed, the stage disposed in a plane defined by first and second directions crossing each other; and a material deposition unit from which a deposition material is provided to the substrate; and a light irradiation unit from which is provided the light used in cleaning the mask within the chamber. The light irradiation unit is disposed outside the chamber and irradiates the light into the chamber through the transmission window. The material deposition unit disposed within the chamber and the light irradiation unit disposed outside the chamber are reciprocally movable in the first direction.

    MASK ASSEMBLY AND DEPOSITION APPARATUS FOR DISPLAY DEVICE INCLUDING THE SAME

    公开(公告)号:US20230161242A1

    公开(公告)日:2023-05-25

    申请号:US17865027

    申请日:2022-07-14

    CPC classification number: G03F1/64 H01L51/56

    Abstract: A mask assembly according to an embodiment includes a support frame including at least four sides, a first frame disposed on the support frame and extending in a first direction, a second frame disposed on the support frame and extending in a second direction intersecting the first direction, and a mask sheet disposed on the support frame and including at least one opening. At least a side of the support frame includes a first protruding portion disposed at a first edge of the side, a second protruding portion disposed at a second edge of the side, and a recess portion disposed between the first protruding portion and the second protruding portion.

    APPARATUS FOR CLEANING DEPOSITION MASK AND METHOD OF CLEANING DEPOSITION MASK

    公开(公告)号:US20220305531A1

    公开(公告)日:2022-09-29

    申请号:US17839766

    申请日:2022-06-14

    Inventor: Myungkyu KIM

    Abstract: An apparatus for cleaning a mask includes a chamber in which material deposition is performable on a substrate using the mask, the chamber including a transmission window through which light used in cleaning the mask within the chamber is irradiated into the chamber from outside thereof; within the chamber: a stage on which the substrate is disposed, the stage disposed in a plane defined by first and second directions crossing each other; and a material deposition unit from which a deposition material is provided to the substrate; and a light irradiation unit from which is provided the light used in cleaning the mask within the chamber. The light irradiation unit is disposed outside the chamber and irradiates the light into the chamber through the transmission window. The material deposition unit disposed within the chamber and the light irradiation unit disposed outside the chamber are reciprocally movable in the first direction.

    MANUFACTURING APPARATUS FOR MASK FRAME ASSEMBLY, AND METHOD USING THE SAME
    7.
    发明申请
    MANUFACTURING APPARATUS FOR MASK FRAME ASSEMBLY, AND METHOD USING THE SAME 有权
    用于掩模框架组件的制造装置及使用其的方法

    公开(公告)号:US20160322609A1

    公开(公告)日:2016-11-03

    申请号:US15043866

    申请日:2016-02-15

    CPC classification number: B23K37/0435 B23K31/02 B23K37/0408 H01L51/0011

    Abstract: Exemplary embodiments provide an apparatus to manufacture a mask frame assembly, including: extending unit configured to extend both ends of a mask in a first direction and arrange the mask on a frame, the mask including a deposition pattern and the frame including an opening; a pressurizing unit including a plurality of pressing portions the plurality of pressing portions configured to independently press the mask toward the frame; and a welding unit configured to weld the mask to affix the mask onto the frame.

    Abstract translation: 示例性实施例提供了一种制造掩模框架组件的装置,包括:延伸单元,其构造成沿着第一方向延伸掩模的两端并将掩模布置在框架上,所述掩模包括沉积图案,并且所述框架包括开口; 加压单元,其包括多个按压部,所述多个按压部构造成将所述掩模独立地朝向所述框架按压; 以及焊接单元,其被配置为焊接所述掩模以将所述掩模固定在所述框架上。

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