Display device
    3.
    发明授权

    公开(公告)号:US11871636B2

    公开(公告)日:2024-01-09

    申请号:US17009331

    申请日:2020-09-01

    IPC分类号: H10K59/35 H10K59/123

    摘要: A display device includes a substrate, and an array of pixels on the substrate, the array of the pixels including a first column in which first pixels emitting first color light and second pixels emitting second color light are alternately disposed in a first direction, and a second column adjacent to the first column. The second column includes third pixels that emit third color light and are disposed in the first direction. The second column includes groups each including two or more third pixels, and a first distance between adjacent third pixels included in a same group is less than a second distance between adjacent third pixels included in different groups.

    Mask assembly for thin film deposition and method of manufacturing the same

    公开(公告)号:US10266935B2

    公开(公告)日:2019-04-23

    申请号:US15630206

    申请日:2017-06-22

    发明人: Sangmin Yi

    IPC分类号: C23C14/04 C23C14/18 C23F1/00

    摘要: A mask assembly for thin film deposition and a method of manufacturing the same. The mask assembly includes a glass mask having a first surface and a second surface opposite the first surface, a first metal layer patterned above the first surface of the glass mask, and a second metal layer patterned below the second surface of the glass mask. A plurality of deposition areas are arranged on the glass mask, and a plurality of deposition pattern portions each having a plurality of slits are patterned in the plurality of deposition areas.

    Mask assembly for deposition, deposition apparatus, and method employing the same
    6.
    发明授权
    Mask assembly for deposition, deposition apparatus, and method employing the same 有权
    用于沉积的掩模组件,沉积装置和使用其的方法

    公开(公告)号:US09530961B2

    公开(公告)日:2016-12-27

    申请号:US14697925

    申请日:2015-04-28

    IPC分类号: H01L51/00 H01L51/56

    摘要: Disclosed is a mask assembly for deposition including: a frame having an opening; a mask having at least one pattern part formed in a second direction that is different from a first direction, wherein at least a portion of the mask is supported by the frame and the at least one pattern part has one or more slits continuously formed in the first direction; and at least one support stick extending in the second direction across the opening so as to support at least a portion of the mask.

    摘要翻译: 公开了一种用于沉积的掩模组件,包括:具有开口的框架; 具有沿与第一方向不同的第二方向形成的至少一个图案部的掩模,其中,所述掩模的至少一部分由所述框架支撑,所述至少一个图案部具有连续形成在所述第一方向上的一个或多个狭缝 第一方向 以及至少一个支撑杆,沿着所述第二方向延伸穿过所述开口以便支撑所述掩模的至少一部分。