Thin film transistor substrate and display apparatus

    公开(公告)号:US10234739B2

    公开(公告)日:2019-03-19

    申请号:US15344224

    申请日:2016-11-04

    Abstract: A thin film transistor substrate includes a substrate and thin film transistors arranged in first and second directions above the substrate. Each thin film transistor includes a gate electrode, a drain electrode, a source electrode and a semiconductor layer. The drain electrode is above the gate electrode and includes a first drain oblique portion and a second drain oblique portion extending from an end portion of the first drain oblique portion. The source electrode is spaced apart from the drain electrode above the gate electrode and includes a first source oblique portion and a second source oblique portion extending from an end portion of the first source oblique portion. The semiconductor layer at least partially overlaps the gate electrode and includes a drain region to which the drain electrode is connected, a source region to which the source electrode is connected, and a channel region therebetween.

    DISPLAY DEVICE AND ELECTRONIC APPARATUS

    公开(公告)号:US20210225958A1

    公开(公告)日:2021-07-22

    申请号:US16941438

    申请日:2020-07-28

    Abstract: A display device including a display area and a non-display area surrounding the display area, the display area including a first display area and a second display area. The display device also includes a substrate; and a plurality of pixels arranged in the substrate and including first pixels and second pixels, the first pixels included in the first display area, and the second pixels included in the second display area, wherein the first pixels include a repeating arrangement structure of first pixel units including a plurality of pixels having different colors, and the second pixels each include a repeating arrangement structure of second pixel units including a greater number of pixels than the number of pixels included in each of the first pixel units.

    Mask assembly for deposition, deposition apparatus, and method employing the same
    6.
    发明授权
    Mask assembly for deposition, deposition apparatus, and method employing the same 有权
    用于沉积的掩模组件,沉积装置和使用其的方法

    公开(公告)号:US09530961B2

    公开(公告)日:2016-12-27

    申请号:US14697925

    申请日:2015-04-28

    CPC classification number: H01L51/0002 C23C14/042 H01L51/0011 H01L51/56

    Abstract: Disclosed is a mask assembly for deposition including: a frame having an opening; a mask having at least one pattern part formed in a second direction that is different from a first direction, wherein at least a portion of the mask is supported by the frame and the at least one pattern part has one or more slits continuously formed in the first direction; and at least one support stick extending in the second direction across the opening so as to support at least a portion of the mask.

    Abstract translation: 公开了一种用于沉积的掩模组件,包括:具有开口的框架; 具有沿与第一方向不同的第二方向形成的至少一个图案部的掩模,其中,所述掩模的至少一部分由所述框架支撑,所述至少一个图案部具有连续形成在所述第一方向上的一个或多个狭缝 第一方向 以及至少一个支撑杆,沿着所述第二方向延伸穿过所述开口以便支撑所述掩模的至少一部分。

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