公开(公告)号：US20150118776A1

公开(公告)日：2015-04-30

申请号：US14267167

申请日：2014-05-01

Applicant: Samsung Display Co., Ltd.

Inventor： Hongsick Park ,  Seon-il Kim

IPC: H01L27/12 ,  H01L21/48 ,  H01L21/67 ,  H01L29/40

CPC classification number: H01L27/1259 ,  H01L29/40 ,  H01L2933/0016

Abstract: A manufacturing method of a display device includes: forming a thin film transistor on a substrate, forming a pixel electrode connected to the thin film transistor, and forming a common electrode insulated from the pixel electrode. At least one of forming the pixel electrode and forming the common electrode includes: forming an electrode layer on the substrate, coating a photoresist on the electrode layer to form a first electrode sub-layer on which the photoresist is coated and a second electrode sub-layer on which the photoresist is not coated, generating etching vapor by heating an etching solution in a double boiler, and etching the second electrode sub-layer by using the etching vapor.

Abstract translation: 显示装置的制造方法包括：在基板上形成薄膜晶体管，形成与薄膜晶体管连接的像素电极，形成与像素电极绝缘的公共电极。 形成像素电极和形成公共电极中的至少一个包括：在衬底上形成电极层，在电极层上涂覆光致抗蚀剂以形成其上涂覆有光致抗蚀剂的第一电极子层和第二电极子层， 其上没有涂覆光致抗蚀剂的层，通过加热双锅炉中的蚀刻溶液产生蚀刻蒸气，并且通过使用蚀刻蒸气蚀刻第二电极子层。

公开(公告)号：US09127368B2

公开(公告)日：2015-09-08

申请号：US14318815

申请日：2014-06-30

Applicant: SAMSUNG DISPLAY CO., LTD. ,  DONGWOO FINE-CHEM CO., LTD.

Inventor： Seon-il Kim ,  In-Bae Kim ,  Hongsick Park ,  Jong-Hyun Choung ,  Inseol Kuk ,  Suckjun Lee ,  Giyong Nam ,  Youngchul Park ,  Inho Yu ,  Youngjin Yoon

IPC: H01L21/3213 ,  C09K13/06 ,  C09K13/08 ,  C23F1/18

CPC classification number: C23F1/18 ,  C09K13/06 ,  C09K13/08 ,  C23F1/26 ,  H01L21/32134 ,  H01L27/124 ,  H01L27/1262

Abstract: An etchant includes, based on a total amount of the etchant, from about 0.5 to about 20 wt % of a persulfate, from about 0.01 to about 2 wt % of a fluorine compound, from about 1 to about 10 wt % of an inorganic acid, from about 0.5 to about 5 wt % of an azole compound, from about 0.1 to about 5 wt % of an electron-donating compound, from about 0.1 to about 5 wt % of a chlorine compound, from about 0.05 to about 3 wt % of a copper salt, from about 0.1 to about 10 wt % of an organic acid or an organic acid salt, and a remaining amount of water.

Abstract translation: 蚀刻剂包括基于蚀刻剂的总量约0.5至约20重量％的过硫酸盐，约0.01至约2重量％的氟化合物，约1至约10重量％的无机酸 ，约0.5至约5重量％的唑化合物，约0.1至约5重量％的给电子化合物，约0.1至约5重量％的氯化合物，约0.05至约3重量％ 的铜盐，约0.1至约10重量％的有机酸或有机酸盐，以及剩余量的水。

公开(公告)号：US09053987B2

公开(公告)日：2015-06-09

申请号：US14267167

申请日：2014-05-01

Applicant: Samsung Display Co., Ltd.

Inventor： Hongsick Park ,  Seon-il Kim

IPC: H01L21/302 ,  H01L27/12 ,  H01L29/40 ,  H01L21/48 ,  H01L21/67

CPC classification number: H01L27/1259 ,  H01L29/40 ,  H01L2933/0016

Abstract: A manufacturing method of a display device includes: forming a thin film transistor on a substrate, forming a pixel electrode connected to the thin film transistor, and forming a common electrode insulated from the pixel electrode. At least one of forming the pixel electrode and forming the common electrode includes: forming an electrode layer on the substrate, coating a photoresist on the electrode layer to form a first electrode sub-layer on which the photoresist is coated and a second electrode sub-layer on which the photoresist is not coated, generating etching vapor by heating an etching solution in a double boiler, and etching the second electrode sub-layer by using the etching vapor.

Abstract translation: 显示装置的制造方法包括：在基板上形成薄膜晶体管，形成与薄膜晶体管连接的像素电极，形成与像素电极绝缘的公共电极。 形成像素电极和形成公共电极中的至少一个包括：在衬底上形成电极层，在电极层上涂覆光致抗蚀剂以形成其上涂覆有光致抗蚀剂的第一电极子层和第二电极子层， 其上没有涂覆光致抗蚀剂的层，通过加热双锅炉中的蚀刻溶液产生蚀刻蒸气，并且通过使用蚀刻蒸气蚀刻第二电极子层。