公开(公告)号：US09890454B2

公开(公告)日：2018-02-13

申请号：US14531170

申请日：2014-11-03

Applicant: Samsung Display Co., Ltd.

Inventor： Choel Min Jang ,  Suk Won Jung ,  Myung Soo Huh

IPC: C23C16/455 ,  C23C16/44 ,  C23C16/458

CPC classification number: C23C16/45544 ,  C23C16/4409 ,  C23C16/45525 ,  C23C16/45563 ,  C23C16/45565 ,  C23C16/45574 ,  C23C16/458 ,  C23C16/4585

Abstract: An atomic layer deposition apparatus includes: a substrate support supporting a substrate; a first divider including a plurality of first division modules provided on the substrate support and selectively spraying a source gas, a reaction gas, and a purge gas to each of predetermined areas; and a second divider including a plurality of second division modules provided on the first divider and supplying the gases to the respective first division modules, wherein each of the plurality of second division modules is formed of a first through-hole and a second through-hole, and the gas passed through the first and second through-holes moves to the first division modules.

公开(公告)号：US09809880B2

公开(公告)日：2017-11-07

申请号：US14444231

申请日：2014-07-28

Applicant: Samsung Display Co. Ltd.

Inventor： Choel Min Jang ,  In Kyo Kim ,  Suk Won Jung ,  Myung Soo Huh

IPC: C23C16/00 ,  C23C16/44 ,  C23C16/455 ,  C23C16/54

CPC classification number: C23C16/45546 ,  C23C16/45502 ,  C23C16/45527 ,  C23C16/45548 ,  C23C16/45578 ,  C23C16/545

Abstract: An atomic layer deposition apparatus includes a first base plate on which a seat portion is defined to allow a substrate to be seated thereon, a second base plate disposed opposite to the first base plate, a first gas nozzle portion arranged on the second base plate, a second gas nozzle portion arranged on the second base plate to be spaced apart from the first gas nozzle portion and substantially parallel to the first gas nozzle portion, and a gas storage portion connected to the first gas nozzle portion and the second gas nozzle portion.