公开(公告)号：US09673195B2

公开(公告)日：2017-06-06

申请号：US14264694

申请日：2014-04-29

Applicant: Samsung Electronics Co., LTD.

Inventor： Man-Hyoung Ryoo ,  Gi-Sung Yeo ,  Si-Hyeung Lee ,  Gyu-Chul Kim ,  Sung-Gon Jung ,  Chang-Min Park ,  Hoo-Sung Cho

IPC: H01L27/11 ,  H01L27/088 ,  G11C11/412 ,  H01L27/02

CPC classification number: H01L27/088 ,  G11C11/412 ,  H01L27/0203 ,  H01L27/1104 ,  Y10S257/903

Abstract: According to some embodiments of the invention, a substrate doped with a P type impurity is provided. An N type impurity is doped into the substrate to divide the substrate into a P type impurity region and an N type impurity region. Active patterns having a first pitch are formed in the P type and N type impurity regions. Gate patterns having a second pitch are formed on the active patterns in a direction substantially perpendicular to the active patterns. Other embodiments are described and claimed.

公开(公告)号：US08930859B2

公开(公告)日：2015-01-06

申请号：US13944194

申请日：2013-07-17

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sung-Gon Jung

IPC: G06F17/50 ,  G06F19/00 ,  G21K5/00 ,  G03F1/00

CPC classification number: G06F17/5081 ,  G03F1/00 ,  G06F17/5072 ,  G06F19/00 ,  G06F2217/12 ,  G21K5/00

Abstract: Embodiments relate to a method of decomposing a layout of a semiconductor device. The method may include generating a pattern layout including first patterns and second patterns, generating an interference map for the pattern layout, the interference map including optical interference information regarding the first and second patterns, and decomposing the pattern layout into a first decomposition pattern layout including the first patterns, and a second decomposition pattern layout including the second patterns, based on the interference map. In the interference map, an influence of constructive interference on the first patterns may be greater than an influence of constructive interference on the second patterns.

Abstract translation: 实施例涉及分解半导体器件的布局的方法。 该方法可以包括生成包括第一图案和第二图案的图案布局，产生用于图案布局的干涉图，干涉图包括关于第一和第二图案的光学干涉信息，以及将图案布局分解为第一分解图案布局，包括 第一图案，以及包括第二图案的第二分解图案布局。 在干涉图中，建构性干扰对第一种模式的影响可能大于建构性干扰对第二种模式的影响。