公开(公告)号：US20170069471A1

公开(公告)日：2017-03-09

申请号：US15255626

申请日：2016-09-02

Applicant: Samsung Electronics Co., Ltd.

Inventor： Chulkyun SEOK ,  Taekyun KANG ,  JungHwan UM ,  Changwon CHOI

IPC: H01J37/32 ,  H01L21/683 ,  H01L21/67

CPC classification number: H01J37/32642 ,  H01J37/32082 ,  H01J37/3244 ,  H01J37/32477 ,  H01J37/32697 ,  H01J37/32715

Abstract: A substrate processing system includes a wall liner, an electrostatic chuck in the wall liner to hold a substrate, and a ring member including a focus ring and a side ring. The focus ring is on an edge region of the electrostatic chuck and the side ring encloses an outer side surface of the focus ring and a side surface of the electrostatic chuck. The side ring includes air holes extending from a bottom surface of the ring member towards a top portion of the ring member and extending from the top portion of the ring member towards an outer side surface of the ring member.

Abstract translation: 衬底处理系统包括壁衬，壁衬中的用于保持衬底的静电吸盘，以及包括聚焦环和侧环的环构件。 聚焦环位于静电卡盘的边缘区域上，侧环包围聚焦环的外侧表面和静电卡盘的侧表面。 侧环包括从环形构件的底表面朝向环形构件的顶部延伸并从环形构件的顶部朝向环形构件的外侧表面延伸的气孔。