公开(公告)号：US20170125270A1

公开(公告)日：2017-05-04

申请号：US15260874

申请日：2016-09-09

Applicant: Samsung Electronics Co., Ltd.

Inventor： HYUN SUN CHOI ,  Yun-Kwang JEON ,  Taekyun KANG

IPC: H01L21/67 ,  H01L21/677 ,  B01D46/44 ,  B01D46/00 ,  B01D46/42

CPC classification number: H01L21/67196 ,  B01D46/0045 ,  B01D46/4263 ,  B01D46/448 ,  B01D2279/45 ,  H01L21/67017 ,  H01L21/67167 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67201 ,  H01L21/67248 ,  H01L21/67389 ,  H01L21/67742 ,  H01L21/67778

Abstract: The inventive concepts provide apparatuses for transferring a substrate and/or apparatuses for processing a substrate including the same. The substrate transferring apparatus including a chamber, a filter assembly disposed in a chamber to provide external air into the chamber, and an additional assembly including a moisture removing part and a purge gas providing part sequentially stacked on the filter assembly may be provided. The filter assembly may be coupled to the additional assembly.

公开(公告)号：US20170069471A1

公开(公告)日：2017-03-09

申请号：US15255626

申请日：2016-09-02

Applicant: Samsung Electronics Co., Ltd.

Inventor： Chulkyun SEOK ,  Taekyun KANG ,  JungHwan UM ,  Changwon CHOI

IPC: H01J37/32 ,  H01L21/683 ,  H01L21/67

CPC classification number: H01J37/32642 ,  H01J37/32082 ,  H01J37/3244 ,  H01J37/32477 ,  H01J37/32697 ,  H01J37/32715

Abstract: A substrate processing system includes a wall liner, an electrostatic chuck in the wall liner to hold a substrate, and a ring member including a focus ring and a side ring. The focus ring is on an edge region of the electrostatic chuck and the side ring encloses an outer side surface of the focus ring and a side surface of the electrostatic chuck. The side ring includes air holes extending from a bottom surface of the ring member towards a top portion of the ring member and extending from the top portion of the ring member towards an outer side surface of the ring member.

Abstract translation: 衬底处理系统包括壁衬，壁衬中的用于保持衬底的静电吸盘，以及包括聚焦环和侧环的环构件。 聚焦环位于静电卡盘的边缘区域上，侧环包围聚焦环的外侧表面和静电卡盘的侧表面。 侧环包括从环形构件的底表面朝向环形构件的顶部延伸并从环形构件的顶部朝向环形构件的外侧表面延伸的气孔。

公开(公告)号：US20150179238A1

公开(公告)日：2015-06-25

申请号：US14468936

申请日：2014-08-26

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sang-Soo PARK ,  Moosung KIM ,  Taekyun KANG

IPC: G11C7/10 ,  G11C5/14

CPC classification number: G11C7/20 ,  G11C5/148 ,  G11C16/30 ,  G11C2207/2227

Abstract: A latch management method of a storage device includes permitting the storage device to enter a reduced power mode in which the storage device operates with a reduced power. The method includes reading initial latch data stored in the at least one nonvolatile memory device in response to the entering operation. The method includes setting latches associated with the at least one nonvolatile memory device based on the read initial latch data.

Abstract translation: 存储装置的锁存管理方法包括允许存储装置进入存储装置以降低的功率运行的降低功率模式。 该方法包括响应于输入操作读取存储在至少一个非易失性存储器件中的初始锁存数据。 该方法包括基于读取的初始锁存数据来设置与至少一个非易失性存储器件相关联的锁存器。