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    SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
    5.
    发明申请
    SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME 有权

    公开(公告)号：US20250006792A1

    公开(公告)日：2025-01-02

    申请号：US18411313

    申请日：2024-01-12

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Tae Hyun Ryu ,  Dong Hoon Hwang ,  Myung Il Kang ,  Hyo Jin Kim ,  Byung Ho Moon ,  Nam Hyun Lee

    IPC: H01L29/10 ,  H01L29/417

    Abstract: A semiconductor device includes a first and second channel separation structures extending in a first direction and spaced apart from each other in a second direction, first gate structures spaced apart from each other in the first direction between the first and second channel separation structures and in contact with the first and second channel separation structures, first and second channel patterns including first and second sheet patterns, respectively, spaced apart from each other in a third direction and in contact with the corresponding first and second channel separation structures, first and second source/drain patterns between the first and second channel separation structures, the first source/drain patterns in contact with the first channel patterns and the first channel separation structure, the second source/drain patterns in contact with the second channel patterns and the second channel separation structure, and first gate separation structures between the first and second source/drain patterns.

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