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公开(公告)号:US20230215769A1
公开(公告)日:2023-07-06
申请号:US17874450
申请日:2022-07-27
Applicant: Samsung Electronics Co., Ltd.
Inventor: Doory KIM , Jae Hwang JUNG , Wook Rae KIM , Nam Yoon KIM , Myung Jun LEE , SeokRan GO , Dokyung JEONG , Uidon JEONG
IPC: H01L21/66 , G01N21/95 , G01N21/956 , G01N21/64
CPC classification number: H01L22/12 , G01N21/9501 , G01N21/956 , G01N21/643 , G01N2021/6439
Abstract: A method for fabricating a semiconductor device is provided. The method for fabricating the semiconductor device includes forming a semiconductor pattern including a first layer and a second layer on a substrate, forming a coating layer on a surface of the first layer, forming a dyeing substance in which one of an antibody or a protein is combined with a fluorophore, attaching the dyeing substance to a surface of the coating layer to form a dyeing layer, and photographing the fluorophore with an ultra-high resolution microscope to detect the semiconductor pattern.
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公开(公告)号:US20240212122A1
公开(公告)日:2024-06-27
申请号:US18528206
申请日:2023-12-04
Applicant: Samsung Electronics Co., Ltd.
Inventor: Namyoon KIM , Doory KIM , Wookrae KIM , Myungjun LEE , Jaehwang JUNG , Changhoon CHOI , Dokyung JEONG , Uidon JEONG
CPC classification number: G06T7/0004 , G02B21/008 , G06T5/30 , G06T7/13 , G06T2207/10056 , G06T2207/10064 , G06T2207/30148
Abstract: A fluorescence microscopy metrology system includes an optical system configured to generate first light and second light having different wavelengths, a microscope body configured to irradiate a sample, coated with a fluorescent material, with the first light and the second light received from the optical system, and to receive fluorescence reflected from the sample, an image detection device configured to detect a fluorescence image corresponding to the received fluorescence, and a nanostructure analysis device configured to measure line edge roughness (LER) from the detected fluorescence image, to analyze power spectral density (PSD), or to detect a nanoparticle defect.
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