公开(公告)号：US20230000343A1

公开(公告)日：2023-01-05

申请号：US17586189

申请日：2022-01-27

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jin Yong KIM ,  Dae Hoon HAN ,  Wook Rae KIM ,  Myung Jun LEE ,  Gwang Sik PARK ,  Sung Ho JANG

IPC: A61B3/11 ,  G01B11/30 ,  G01B11/06

Abstract: An optical measurement apparatus includes a light source unit generating and outputting light, a polarized light generating unit generating polarized light from the light, an optical system generating a pupil image of a measurement target, using the polarized light, a self-interference generating unit generating multiple beams that are split from the pupil image, and a detecting unit detecting a self-interference image generated by interference of the multiple beams with each other.

公开(公告)号：US20230215769A1

公开(公告)日：2023-07-06

申请号：US17874450

申请日：2022-07-27

Applicant: Samsung Electronics Co., Ltd.

Inventor： Doory KIM ,  Jae Hwang JUNG ,  Wook Rae KIM ,  Nam Yoon KIM ,  Myung Jun LEE ,  SeokRan GO ,  Dokyung JEONG ,  Uidon JEONG

IPC: H01L21/66 ,  G01N21/95 ,  G01N21/956 ,  G01N21/64

CPC classification number: H01L22/12 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/643 ,  G01N2021/6439

Abstract: A method for fabricating a semiconductor device is provided. The method for fabricating the semiconductor device includes forming a semiconductor pattern including a first layer and a second layer on a substrate, forming a coating layer on a surface of the first layer, forming a dyeing substance in which one of an antibody or a protein is combined with a fluorophore, attaching the dyeing substance to a surface of the coating layer to form a dyeing layer, and photographing the fluorophore with an ultra-high resolution microscope to detect the semiconductor pattern.

公开(公告)号：US20230028347A1

公开(公告)日：2023-01-26

申请号：US17684052

申请日：2022-03-01

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jang Ryul PARK ,  Soon Yang KWON ,  Kwang Rak KIM ,  Myung Jun LEE ,  Sung Ho JANG

IPC: G01N21/95 ,  G02B7/00

Abstract: A method for fabricating a semiconductor device is provided. The method includes: loading a substrate on a stage of an apparatus for inspecting the substrate; extracting a first light having a first wavelength from a light by using a light source; acquiring first position information on at least one focal point, formed on the substrate, based on the first wavelength by using a controller, the at least one focal point being a pre-calculated at least one focal point; adjusting a position of at least one from among an objective lens and at least one microsphere in a vertical direction by using the first position information in the controller; condensing the first light, which has passed through the at least one microsphere, on the at least one focal point formed on the substrate; and inspecting the substrate by using the first light condensed on the at least one focal point.

公开(公告)号：US20240280435A1

公开(公告)日：2024-08-22

申请号：US18402505

申请日：2024-01-02

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seung Ryeol LEE ,  Ye Eun PARK ,  Jin Woo AHN ,  Seung Woo LEE ,  Tae Joong KIM ,  Myung Jun LEE

IPC: G01M11/02

CPC classification number: G01M11/0257

Abstract: Provided is an optical measurement apparatus. The optical measurement apparatus includes a light source; an objective lens; a reflector configured to change an optical path of light emitted from the light source such that the light is directed toward the objective lens; a detector configured to detect a pupil image; a first adjuster configured to rotate the light source around the reflector; and a second adjuster configured to rotate the reflector.

公开(公告)号：US20230184535A1

公开(公告)日：2023-06-15

申请号：US17969200

申请日：2022-10-19

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seung Woo LEE ,  Wook Rae KIM ,  Kwang Soo KIM ,  Myung Jun LEE ,  Seo Yeon JEONG ,  Sung Ho JANG

IPC: G01B9/02055 ,  G01B9/02015 ,  G01B9/02 ,  G01B9/02001

CPC classification number: G01B9/02063 ,  G01B9/0203 ,  G01B9/02083 ,  G01B9/02011 ,  H01L22/12

Abstract: A optical measurement apparatus includes: an optical system which generates a pupil image of a measurement target, using light; a polarization generator which generates a polarized light from the light; a self-interference generator which generates a plurality of beams divided from the pupil image, using the polarized light, and causes the plurality of beams to interfere with each other to generate a self-interference image; and an image analysis unit configured to extract phase data from the self-interference image, and to move the measurement target to a focus position on the basis of the phase data.