CONVEYOR APPARATUS
    2.
    发明申请
    CONVEYOR APPARATUS 有权
    输送装置

    公开(公告)号:US20160152413A1

    公开(公告)日:2016-06-02

    申请号:US14927673

    申请日:2015-10-30

    CPC classification number: B65G47/5122

    Abstract: A conveyor apparatus is provided. The conveyor apparatus includes a rail formed in a closed curve line, a chain conveyor that moves along the rail, a driver that drives the chain conveyor, and a first and a second variable conveyors that relatively vary lengths of at least two portions of the chain conveyor so that a section of the chain conveyor remains in position while other portions of the chain conveyor moving along the rail.

    Abstract translation: 提供输送装置。 传送装置包括形成在闭合曲线中的轨道,沿着轨道移动的链式输送机,驱动链式输送机的驱动器,以及相对变化链条的至少两部分长度的第一和第二可变输送机 输送机,使得链条输送机的一部分保持在适当位置,而链条输送机的其它部分沿着轨道移动。

    Reticle in an apparatus for extreme ultraviolet exposure

    公开(公告)号:US11409193B2

    公开(公告)日:2022-08-09

    申请号:US17028049

    申请日:2020-09-22

    Abstract: A reticle for an apparatus for EUV exposure and a method of manufacturing a reticle, the reticle including a substrate including an edge region and a main region; a multi-layer structure on the main region and the edge region, a sidewall of the multi-layer structure overlying the edge region; a capping layer covering an upper surface and the sidewall of the multi-layer structure and at least a portion of the edge region of the substrate; and an absorber layer on the capping layer, the absorber layer covering an entire upper surface of the capping layer on the edge region of the substrate, wherein a stacked structure of the capping layer and the absorber layer is on an upper surface of the edge region of the substrate, and a sidewall of the stacked structure of the capping layer and the absorber layer is perpendicular to an upper surface of the substrate.

    Pellicle
    7.
    发明授权
    Pellicle 有权
    薄膜

    公开(公告)号:US09395620B2

    公开(公告)日:2016-07-19

    申请号:US14338611

    申请日:2014-07-23

    Inventor: Hoon Kim

    CPC classification number: G03F1/64 G03F1/22 G03F1/62 G03F7/70983

    Abstract: A pellicle includes a first frame affixing a reticle, the first frame having a tapered locking groove, a second frame on the first frame, the second frame having a locking portion that is detachably combined with the tapered locking groove of the first frame, and a membrane affixed to the second frame.

    Abstract translation: 防护薄膜组件包括固定标线的第一框架,第一框架具有锥形锁定槽,第一框架上的第二框架,第二框架具有可拆卸地与第一框架的锥形锁定槽组合的锁定部分, 膜固定在第二框架上。

    PHASE SHIFT MASKS AND METHODS OF FORMING PHASE SHIFT MASKS
    8.
    发明申请
    PHASE SHIFT MASKS AND METHODS OF FORMING PHASE SHIFT MASKS 有权
    相移片掩模和形成相移片的方法

    公开(公告)号:US20140170534A1

    公开(公告)日:2014-06-19

    申请号:US13719910

    申请日:2012-12-19

    CPC classification number: G03F1/26

    Abstract: A phase shift mask having a first region and a second region in a transverse direction includes a transparent layer, a phase shift pattern disposed in the first region, a transmittance control layer pattern disposed in the second region, and a shading layer pattern disposed on the transmittance control layer pattern. The phase shift pattern has a first pattern including a transparent material and a second pattern including metal. The phase shift mask may prevent haze effects through a cleaning process using an alkaline cleaning solution.

    Abstract translation: 具有第一区域和第二区域的相移掩模包括透明层,设置在第一区域中的相移图案,设置在第二区域中的透射率控制层图案,以及设置在第二区域上的遮光层图案 透光控制层图案。 相移图案具有包括透明材料的第一图案和包括金属的第二图案。 相移掩模可以通过使用碱性清洁溶液的清洁过程来防止雾度效应。

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