ADAPTIVE BEAM MEASUREMENT PERIODICITY

    公开(公告)号:US20250023623A1

    公开(公告)日:2025-01-16

    申请号:US18596568

    申请日:2024-03-05

    Abstract: A method includes determining a beam measurement periodicity for beam reporting by a user equipment (UE) for use in beam tracking. The method also includes performing beam tracking according to the beam measurement periodicity. The method also includes adaptively increasing or decreasing the beam measurement periodicity based on information related to at least one of a UE measurement report, a current network state, a UE state, or a previously observed network behavior. The method also includes performing additional beam tracking according to the adaptively increased or decreased beam measurement periodicity.

    Insulation structures and printed circuit board including the same

    公开(公告)号:US12167532B2

    公开(公告)日:2024-12-10

    申请号:US17223430

    申请日:2021-04-06

    Inventor: Hyejin Kim

    Abstract: An insulation structure includes: a first resin layer including first fillers; a second resin layer on the first resin layer and including second fillers; and a third resin layer on the second resin layer and including third fillers. A diameter of each of the first fillers may be more than about 200 nm and equal to or less than about 500 nm. A diameter of each of the second fillers may be more than about 10 nm and equal to or less than about 200 nm. A diameter of each of the third fillers may be equal to or less than about 10 nm. An arithmetic average roughness (Ra) and a ten point average roughness (Rz) of a surface of the insulation structure may be equal to or less than about 30 nm and equal to or less than about 100 nm, respectively.

    Server for generating user-customized community list for user device, and operating method of the server

    公开(公告)号:US12063404B2

    公开(公告)日:2024-08-13

    申请号:US18120853

    申请日:2023-03-13

    CPC classification number: H04N21/2668 H04N21/252 H04N21/25891 H04N21/4788

    Abstract: Provided is a method of generating a user-customized community list that includes obtaining, from a user device, a usage history of the user device, identifying a device group corresponding to the user device from a plurality of device groups, based on the usage history of the user device, obtaining a community list comprising at least one community corresponding to the device group, each community in the community list providing a communication service between members of the respective community, identifying a content information corresponding to a first content being used in the user device, generating the user-customized community list based on the content information and the community list, the user-customized community list comprising at least one first community corresponding to the first content, and at least one second community associated with the first content, and transmitting the user-customized community list to the user device.

    VOLTAGE WAVEFORM GENERATOR, WAFER PROCESSING APPARATUS AND PLASMA PROCESSING APPARATUS

    公开(公告)号:US20210407769A1

    公开(公告)日:2021-12-30

    申请号:US17158231

    申请日:2021-01-26

    Abstract: A wafer processing apparatus includes a chamber, and a voltage waveform generator configured to accelerate plasma ions of the chamber, the voltage waveform generator includes: a pulse circuit configured to apply a chamber voltage, which is a pulse voltage, to the chamber by adjusting a chamber current applied to the chamber; and a slope circuit configured to generate a slope in an on-duty of the chamber voltage, which is the pulse voltage, and the pulse circuit includes a first inductive element configured to store a first internal current.

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