公开(公告)号：US20170059998A1

公开(公告)日：2017-03-02

申请号：US15182926

申请日：2016-06-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hoyeon KIM ,  Jinseok HEO ,  Insung KIM

IPC: G03F7/20 ,  G02B19/00 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G02B19/0095 ,  G03F7/70916 ,  H05G2/001

Abstract: An extreme ultraviolet generation device, including a chamber with an internal space; a plasma generator to generate plasma in the internal space; a condenser in the internal space to gather light generated from the plasma; and a monitor to monitor the internal space in an omnidirectional manner.

Abstract translation: 一种极紫外线发生装置，包括具有内部空间的腔室; 等离子体发生器，用于在内部空间中产生等离子体; 内部空间的冷凝器收集从等离子体产生的光; 以及监视器以全向方式监视内部空间。

公开(公告)号：US20170131638A1

公开(公告)日：2017-05-11

申请号：US15262447

申请日：2016-09-12

Applicant: Samsung Electronics Co., Ltd.

Inventor： Insung KIM ,  SeongSue KIM

IPC: G03F7/20 ,  G03F1/20

CPC classification number: G03F1/62 ,  G03F7/70708 ,  G03F7/70916 ,  G03F7/70933

Abstract: A reticle including a mask and an edge cover may be provided. The mask may include a mask substrate and mask patterns on the mask substrate. The edge cover may be coupled to an edge of the mask substrate and may include a floating cover part. The floating cover part may be spaced apart from the mask patterns while extending from a sidewall of the mask substrate over the mask patterns.

公开(公告)号：US20210219408A1

公开(公告)日：2021-07-15

申请号：US16927050

申请日：2020-07-13

Applicant: Samsung Electronics Co., Ltd.

Inventor： Dohyung KIM ,  Seongchul HONG ,  Kyungsik KANG ,  Insung KIM ,  Motoshi SAKAI ,  Seulgi LEE ,  Jungchul LEE

IPC: H05G2/00 ,  H01S3/23 ,  G02B19/00 ,  H01S3/00 ,  G02B26/08

Abstract: A laser beam delivery apparatus of an extreme ultra violet light source may include a high power seed module configured to generate a laser beam, a power amplifier configured to amplify the laser beam generated by the high power seed module, a beam transfer module configured to collect and move the laser beam amplified by the power amplifier, a final focusing assembly optical platform configured to adjust focus of the laser beam collected and moved by the beam transfer module, and a focusing unit configured to focus the laser beam with the focus adjusted by the final focusing assembly optical platform to a target droplet. The power amplifier may include a position adjuster configured to adjust a position of the laser beam. The position adjuster may include a refraction plate having a flat surface. The power amplifier may include a pointing adjuster, which may include a mirror.