MEASURING APPARATUS FOR SEMICONDUCTOR DEVICE AND MEASURING METHOD USING THE SAME

    公开(公告)号:US20240353484A1

    公开(公告)日:2024-10-24

    申请号:US18591091

    申请日:2024-02-29

    CPC classification number: G01R31/2891 G01R31/2893

    Abstract: A measuring apparatus for a semiconductor device includes a lower frame that provides a lower measurement space configured for performing a first measurement process, a lower measuring portion in the lower frame and configured to measure the first semiconductor substrate on a lower substrate stage, a lower vibration damping portion configured to offset a first vibration of the lower measuring portion with respect to a ground, an upper frame that provides an upper measurement space configured for performing a second measurement process, an upper measuring portion in the upper frame to measure a second semiconductor substrate=on an upper substrate stage, an upper vibration damping portion configured to offset a second vibration of the upper measuring portion with respect to the ground, and a plurality of support structures that support the upper frame such that the upper frame is spaced apart from the lower frame.

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