Abstract:
A layout design method may include receiving predetermined values related to first to third normal fin designs extending in a first direction and arranged in parallel in a second direction perpendicular to the first direction, generating dummy fin designs based on the predetermined values, generating mandrel candidate designs based on the first to third normal fin designs and the dummy fin designs, decomposing the mandrel candidate designs to first and second mandrel mask designs, and generating a final mandrel mask design using one of the first and second mandrel mask designs that satisfies a predetermined condition. A first interval distance in the second direction between the first normal fin design and the second normal fin design may be different from a second interval distance in the second direction between the second normal fin design and the third normal fin design.
Abstract:
According to example embodiments, a method of manufacturing an organic thin film transistor includes sequentially forming a gate electrode, a gate insulator, a source electrode, and a drain electrode on a substrate, forming a first self-assembled monolayer on the source electrode and the drain electrode from a first self-assembled monolayer precursor, forming a second self-assembled monolayer on the gate insulator from a second self-assembled monolayer precursor that is different from the first self-assembled monolayer precursor, and forming an organic semiconductor on the first self-assembled monolayer and the second self-assembled monolayer. The first self-assembled monolayer and the second self-assembled monolayer may be formed simultaneously or sequentially in a single container. An organic thin film transistor may be manufactured according to the method. A display device may include the organic thin film transistor.