公开(公告)号：US09583402B2

公开(公告)日：2017-02-28

申请号：US14794813

申请日：2015-07-09

申请人： Samsung Electronics Co., Ltd.

发明人： Sung Yoon Ryu ,  Wooseok Ko ,  Souk Kim ,  Yusin Yang ,  Sangkil Lee ,  Chungsam Jun ,  Kwanwoo Ryu

IPC分类号： H01L21/66 ,  H01L21/67

CPC分类号： H01L22/12 ,  H01L21/67173 ,  H01L22/20

摘要： A method includes loading a substrate into a sensing chamber; while the substrate is in the sensing chamber, performing a spectral analysis of the substrate; transferring the substrate between the sensing chamber and a processing chamber coupled to the sensing chamber; processing the substrate in the processing chamber to form at least a first layer and/or pattern on the substrate; and based on at least the spectral analysis, determining whether a parameter resulting from the formation of first layer and/or pattern is satisfied.

摘要翻译： 一种方法包括将衬底加载到感测室中; 同时衬底在感测室中，对衬底进行光谱分析; 在所述感测室和耦合到所述感测室的处理室之间传送所述衬底; 在所述处理室中处理所述衬底以在所述衬底上形成至少第一层和/或图案; 并且至少基于光谱分析，确定是否满足形成第一层和/或图案所引起的参数。