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公开(公告)号：US12038718B2
公开(公告)日：2024-07-16
申请号：US17060526
申请日：2020-10-01
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Seungbeom Park , Sungmin Park , Jaehyeon Son , Heejun Ahn , Myungjun Lee
CPC classification number: G03H1/0005 , G01N21/9501 , G01N21/9503 , G02B21/0016 , G03H1/0443 , G03H1/16 , H01L22/12 , G03H2001/005 , G03H2001/045 , G03H2001/0452
Abstract: Provided is a holographic microscope including an input optical system configured to emit polarized input beam, a first beam splitter configured to emit an object beam by reflecting a portion of the polarized input beam, and emit a reference beam by transmitting a remaining portion of the polarized input beam, a reference optical system configured to separate the reference beam into a first reference beam and a second reference beam, a camera configured to receive the first reference beam and the second reference beam and the object beam that is reflected by an inspection object, the camera including a micro polarizer array, wherein a first polarization axis of the first reference beam is perpendicular to a second polarization axis of the second reference beam.
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公开(公告)号：US11275034B2
公开(公告)日：2022-03-15
申请号：US17022249
申请日：2020-09-16
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Kyungwon Yun , Taewan Kim , Seungbeom Park , Jaehyeon Son , Myungjun Lee , Jaehwang Jung
IPC: G01N21/956 , G01N21/45
Abstract: An inspection apparatus includes: a light source that generates and outputs light; a stage on which an inspection target is arranged; an irradiation optical system that irradiates light from the light source to the inspection target; a detector that receives the light diffracted from the inspection target and generates diffraction image; and a detector moving device configured to move the detector on a z-axis, which is an optical axis of the light, and an x-y plane perpendicular to the z-axis. Furthermore, while the detector moves on the x-y plane and the z-axis through the detector moving device, the detector generates a plurality of the diffraction images with different positions on the x-y plane and the z-axis with respect to the inspection target, and thus simultaneously implements phase retrieval and super resolution of diffraction images.
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公开(公告)号：US20240418645A1
公开(公告)日：2024-12-19
申请号：US18408247
申请日：2024-01-09
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Hojun Lee , Jangwoon Sung , Wookrae Kim , Hyungjin Kim , Seungbeom Park , Junho Shin , Myungjun Lee
Abstract: An example semiconductor measurement apparatus includes a light source, a pattern generator, a stage, an image sensor, and a controller. The light source is configured to output light in a predetermined wavelength band. The pattern generator is configured to generate light including a speckle pattern by scattering the light output from the light source. The stage is disposed on a movement path of the light including the speckle pattern, and a sample reflecting the light including the speckle pattern is seated on the stage. The image sensor is configured to receive light reflected from the sample and generate an original image representing a diffractive pattern of light reflected from the sample. The controller is configured to generate a prediction image for estimating diffractive characteristics of light incident on the image sensor.
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Patent Agency Ranking
公开(公告)号：US20210200148A1
公开(公告)日：2021-07-01
申请号：US17060526
申请日：2020-10-01
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Seungbeom Park , Sungmin Park , Jaehyeon Son , Heejun Ahn , Myungjun Lee
Abstract: Provided is a holographic microscope including an input optical system configured to emit polarized input beam, a first beam splitter configured to emit an object beam by reflecting a portion of the polarized input beam, and emit a reference beam by transmitting a remaining portion of the polarized input beam, a reference optical system configured to separate the reference beam into a first reference beam and a second reference beam, a camera configured to receive the first reference beam and the second reference beam and the object beam that is reflected by an inspection object, the camera including a micro polarizer array, wherein a first polarization axis of the first reference beam is perpendicular to a second polarization axis of the second reference beam.
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公开(公告)号：US20210164919A1
公开(公告)日：2021-06-03
申请号：US17022249
申请日：2020-09-16
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Kyungwon Yun , Taewan Kim , Seungbeom Park , Jaehyeon Son , Myungjun Lee , Jaehwang Jung
IPC: G01N21/956 , G01N21/45
Abstract: An inspection apparatus includes: a light source that generates and outputs light; a stage on which an inspection target is arranged; an irradiation optical system that irradiates light from the light source to the inspection target; a detector that receives the light diffracted from the inspection target and generates diffraction image; and a detector moving device configured to move the detector on a z-axis, which is an optical axis of the light, and an x-y plane perpendicular to the z-axis. Furthermore, while the detector moves on the x-y plane and the z-axis through the detector moving device, the detector generates a plurality of the diffraction images with different positions on the x-y plane and the z-axis with respect to the inspection target, and thus simultaneously implements phase retrieval and super resolution of diffraction images.
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公开(公告)号：US20240219315A1
公开(公告)日：2024-07-04
申请号：US18493226
申请日：2023-10-24
Applicant: Samsung Electronics Co., Ltd.
Inventor： Jangwoon Sung , Lei Tian , Hao Wang , Jiabei Zhu , Myungjun Lee , Wookrae Kim , Seungbeom Park , Junho Shin , Hojun Lee
IPC: G01N21/95 , G01N21/88 , G01N21/956
CPC classification number: G01N21/9501 , G01N21/8806 , G01N21/956
Abstract: A substrate inspection apparatus includes a light irradiator including an objective lens and a plurality of optical fibers. The objective lens is configured to irradiate light to an illumination area on a semiconductor substrate having a plurality of circuit pattern layers, the plurality of optical fibers are adjacent a periphery of the objective lens and are configured to irradiate the light to a peripheral area adjacent the illumination area. A light generator is configured to generate the light. The light generator is configured to change an irradiation angle of the light to selectively irradiate the light to one or more of the objective lens and the plurality of optical fibers. A light analyzer is configured to obtain images of the circuit pattern layers from the light reflected from the illumination area and the peripheral area. The light analyzer is configured to model each of the circuit pattern layers of the semiconductor substrate to obtain image models and to measure an overlay between the circuit pattern layers through the images and the image models.
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公开(公告)号：US11428947B2
公开(公告)日：2022-08-30
申请号：US16848169
申请日：2020-04-14
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Myungjun Lee , Seungbeom Park , Jaehyeon Son , Jaehwang Jung , Taewan Kim , Kyungwon Yun
Abstract: A super-resolution holographic microscope includes a light source configured to emit input light, a diffraction grating configured to split the input light into first diffracted light and second diffracted light, a mirror configured to reflect the first diffracted light, a wafer stage arranged on an optical path of the second diffracted light and on which a wafer is configured to be arranged, and a camera configured to receive the first diffracted light that is reflected by the mirror and the second diffracted light that is reflected by the wafer to generate a plurality of hologram images of the wafer.
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公开(公告)号：US20210080743A1
公开(公告)日：2021-03-18
申请号：US16848169
申请日：2020-04-14
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Myungjun LEE , Seungbeom Park , Jaehyeon Son , Jaehwang Jung , Taewan Kim , Kyungwon Yun
Abstract: Provided is a super-resolution holographic microscope including a light source configured to emit input light, a diffraction grating configured to split the input light into first diffracted light and second diffracted light, a mirror configured to reflect the first diffracted light, a wafer stage arranged on an optical path of the second diffracted light and on which a wafer is configured to be arranged, and a camera configured to receive the first diffracted light that is reflected by the mirror and the second diffracted light that is reflected by the wafer to generate a plurality of hologram images of the wafer.
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