公开(公告)号：US20240320814A1

公开(公告)日：2024-09-26

申请号：US18432450

申请日：2024-02-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： Bongju LEE ,  Sangmin JUNG ,  Seunghwan YOO ,  Raehong YOUN ,  Namhoon LEE

IPC: G06T7/00 ,  G06T3/403 ,  G06T5/40 ,  G06T5/92 ,  G06T7/13 ,  G06T7/136 ,  G06T7/60 ,  H01L21/67

CPC classification number: G06T7/0004 ,  G06T3/403 ,  G06T5/40 ,  G06T5/92 ,  G06T7/13 ,  G06T7/136 ,  G06T7/60 ,  H01L21/67288 ,  G06T2207/20036 ,  G06T2207/20132 ,  G06T2207/30148

Abstract: A defect inspection or reduction apparatus includes a chamber moving a substrate and having an inner space therein, a laser oscillation structure irradiating a laser beam to a processing area of the substrate, a mask positioned in the laser oscillation structure and processing the laser beam, a beam profiler obtaining a beam image for the laser beam passing through the mask, and a damage detector detecting a defect area of the mask and the laser beam from the beam image. The damage detector includes an image pre-processing department performing a pre-processing on the beam image that is obtained from the beam profiler, an image extraction department extracting a defect area of the beam image on which the pre-processing is performed, and an image detector detecting a defect of the beam image based on the defect area.