公开(公告)号：US20170277813A1

公开(公告)日：2017-09-28

申请号：US15418879

申请日：2017-01-30

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sibo CAI ,  Moon-Gyu JEONG

IPC: G06F17/50 ,  G03F1/36

CPC classification number: G06F17/504 ,  G03F1/36 ,  G06F17/5072 ,  G06F17/5081 ,  G06F2217/12

Abstract: A method for rasterizing a mask layout includes driving an image converter to obtain a raster image of the mask layout. The raster image is obtained by providing a pattern from the mask layout on a grid, obtaining grid points surrounding an edge of the pattern, constructing a path on the pattern which extends from the edge toward adjacent edges of the pattern, and allocating a raster value to each of the grid points. The raster value corresponds to an overlap area between a pixel, having a center located on one of the grid points, and the pattern having a boundary limited by the path.

公开(公告)号：US20150110383A1

公开(公告)日：2015-04-23

申请号：US14340910

申请日：2014-07-25

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kiho YANG ,  Seunghune YANG ,  Sibo CAI

IPC: G06T7/00 ,  G06T11/60 ,  G06K9/46

CPC classification number: G01N21/956 ,  G01N21/88 ,  G01N21/8851 ,  G03F7/70616 ,  G06K9/4604 ,  G06T7/0006 ,  G06T7/001 ,  G06T11/60 ,  G06T2207/20221 ,  G06T2207/30148

Abstract: Inventive concepts provide a method of inspecting a semiconductor device including obtaining inspection image data of an inspection pattern of an inspection layer on a substrate. The method may include extracting inspection contour data including an inspection pattern contour from the inspection image data, and merging the inspection contour data with comparison contour data of a comparison layer to obtain merged data. The comparison layer may overlap the inspection layer. The method may also include determining a horizontal distance between the inspection pattern contour and a comparison pattern contour of the comparison contour data based on the merged data.

Abstract translation: 本发明的概念提供了一种检查半导体器件的方法，包括获得在衬底上检查层的检查图案的检查图像数据。 该方法可以包括从检查图像数据提取包括检查图案轮廓的检查轮廓数据，并且将检查轮廓数据与比较层的比较轮廓数据合并以获得合并的数据。 比较层可以与检查层重叠。 该方法还可以包括基于合并的数据确定检查图案轮廓和比较轮廓数据的比较花样轮廓之间的水平距离。