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1.发明申请CORYNEBACTERIUM COMPRISING NAD+ DEPENDENT FORMATE DEHYDROGENASE GENE AND METHOD FOR PRODUCING C4 DICARBOXYLIC ACID USING THE SAME 审中-公开包含NAD +依赖性脱氢酶基因的真丝酵母和使用其生产C4二羧酸的方法公开(公告)号：US20150064753A1
公开(公告)日：2015-03-05
申请号：US14478628
申请日：2014-09-05
Applicant: Samsung Electronics Co., Ltd.
Inventor： Soonchun CHUNG , Joonsong PARK , Jinhwan PARK , Jiae YUN , Jaechan PARK , Kwangmyung CHO
CPC classification number: C12P7/46 , C12N9/0008 , C12Y102/01002
Abstract: A Corynebacterium including an NAD+ dependent formate dehydrogenase gene, and a method of producing C4 dicarboxylic acid using the Corynebacterium.
Abstract translation: 包括NAD +依赖性甲酸脱氢酶基因的棒状杆菌以及使用棒状杆菌生产C4二羧酸的方法。
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Patent Agency Ranking
公开(公告)号：US20250155807A1
公开(公告)日：2025-05-15
申请号：US18936350
申请日：2024-11-04
Applicant: Samsung Electronics Co., Ltd.
Inventor： Jinha KIM , Soonchun CHUNG , Jieun KIM , Joonsong PARK
Abstract: A polypeptide, a photoresist composition including the polypeptide, and a method of forming patterns by using the photoresist composition.
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3.发明申请公开(公告)号：US20220372078A1
公开(公告)日：2022-11-24
申请号：US17578720
申请日：2022-01-19
Applicant: Samsung Electronics Co., Ltd.
Inventor： Soonchun CHUNG , Ginam KIM , Jieun KIM , Jinha KIM , Joonsong PARK
Abstract: A polypeptide, a photoresist composition including the polypeptide, a photoresist including the polypeptide, and a method of forming patterns using the photoresist composition.
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4.发明公开公开(公告)号：US20230183294A1
公开(公告)日：2023-06-15
申请号：US17741590
申请日：2022-05-11
Applicant: Samsung Electronics Co., Ltd.
Inventor： Jieun KIM , Soonchun CHUNG , Jinha KIM , Joonsong PARK
CPC classification number: C07K14/001 , G03F7/0392
Abstract: A polypeptide including a region A, a region B, and a region C, a photoresist composition including the polypeptide, and a method of forming patterns by using the photoresist composition.
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5.发明公开公开(公告)号：US20230176480A1
公开(公告)日：2023-06-08
申请号：US17741692
申请日：2022-05-11
Applicant: Samsung Electronics Co., Ltd.
Inventor： Jinha KIM , Soonchun CHUNG , Jieun KIM , Joonsong PARK
CPC classification number: G03F7/0387 , C07K14/001 , G03F7/32 , G03F7/2006
Abstract: A polypeptide, a photoresist composition including the polypeptide, and a method of forming patterns by using the photoresist composition.
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6.发明申请RECOMBINANT CORYNEBACTERIUM AND A METHOD OF PRODUCING C4 DICARBOXYLIC ACID USING THE SAME 审中-公开重组CORYNEBACTERIUM和使用该方法生产C4二羧酸的方法公开(公告)号：US20150044745A1
公开(公告)日：2015-02-12
申请号：US14456754
申请日：2014-08-11
Applicant: Samsung Electronics Co., Ltd.
Inventor： Soonchun CHUNG , Joonsong Park , Jinhwan Park , Jiae Yun , Jaechan Park , Kwangmyung Cho
CPC classification number: C12P7/46 , C12N9/88 , C12Y402/01002
Abstract: A recombinant Corynebacterium genus microorganism, and a method of producing C4 dicarboxylic acid under anaerobic conditions using the Corynebacterium genus microorganism.
Abstract translation: 重组棒状杆菌属微生物，以及使用棒状杆菌属微生物在厌氧条件下生产C4二羧酸的方法。
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