Solid state drive case and solid state drive device using the same

    公开(公告)号:US12069818B2

    公开(公告)日:2024-08-20

    申请号:US17715385

    申请日:2022-04-07

    CPC classification number: H05K5/0208

    Abstract: A solid state drive case includes a lower cover having a sidewall defining an internal space. The sidewall includes a protrusion disposed on an end portion of the sidewall. An upper cover has a first surface directly contacting the sidewall of the lower cover and a second surface opposite to the first surface. The upper cover has a hole overlapping the protrusion and configured to receive the protrusion. A sealing label is attached to the second surface of the upper cover. The sealing label has an area that is less than an area of an entirety of the second surface of the cover. At least a portion of the sealing label is attached to an end portion of the protrusion.

    Ring assembly, substrate support apparatus and plasma processing apparatus including the same

    公开(公告)号:US12068141B2

    公开(公告)日:2024-08-20

    申请号:US17969379

    申请日:2022-10-19

    CPC classification number: H01J37/32642 H01L21/68742

    Abstract: A ring assembly includes: an outer insulating ring on an upper outer periphery of a substrate stage; an edge ring on the outer insulating ring around a wafer seated on the substrate stage; and a shadow ring on the outer insulating ring and the edge ring to be movable up and down within a predetermined stroke range and to cover an edge region of the wafer. An upper surface of the edge ring is located higher than an upper surface of the wafer by a predetermined height. The shadow ring includes an annular body portion, and a recess in a bottom surface of the body portion to receive at least a portion of a protruding upper portion of the edge ring. The shadow ring is spaced apart from the outer insulating ring and the edge ring by a predetermined distance to form a flow path for gas flow therebetween.

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