公开(公告)号：US11693315B2

公开(公告)日：2023-07-04

申请号：US17238355

申请日：2021-04-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eunkyung Lee ,  Sumin Kim ,  Hyunwoo Kim ,  Juhyeon Park ,  Giyoung Song ,  Sukkoo Hong ,  Yoonhyun Kwak ,  Youngmin Nam ,  Byunghee Sohn ,  Sunyoung Lee ,  Aram Jeon ,  Sungwon Choi

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C309/12 ,  C07D333/76 ,  C07C381/12

CPC classification number: G03F7/0045 ,  C07C309/12 ,  C07C381/12 ,  C07D333/76 ,  G03F7/038 ,  G03F7/039 ,  C07C2603/74

Abstract: Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:




wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.

公开(公告)号：US10508175B2

公开(公告)日：2019-12-17

申请号：US15720992

申请日：2017-09-29

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Sungwon Choi ,  Chanjae Ahn ,  Hyunjeong Jeon ,  Sang Soo Jee ,  Byunghee Sohn ,  Won Suk Chang

IPC: C08G77/445 ,  C08G77/455 ,  C08G77/04 ,  C08L83/12 ,  C08G73/14 ,  C08G73/10 ,  C08L79/08 ,  C09D179/08 ,  C08G77/00 ,  C08G77/16 ,  C08G77/18

Abstract: A composition including a polyamideimide precursor modified with an alkoxysilane group and an oligosilica compound, wherein the oligosilica compound is a condensation reaction product of an organosilane diol and an alkoxysilane compound.

公开(公告)号：US10240002B2

公开(公告)日：2019-03-26

申请号：US15346876

申请日：2016-11-09

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  Samsung SDI Co., Ltd.

Inventor： Hongkyoon Choi ,  Chanjae Ahn ,  Hyunjeong Jeon ,  Sang Soo Jee ,  Sungwon Choi ,  Sung Woo Hong ,  Byunghee Sohn

IPC: C08G73/14 ,  B32B27/00 ,  C09D179/08 ,  C09J179/08 ,  C08G73/10

Abstract: A poly(imide-amide) copolymer including a structural unit represented by Chemical Formula 1; a structural unit represented by Chemical Formula 2; and any one of a structural unit represented by Chemical Formula 3, an amic acid precursor of the structural unit represented by Chemical Formula 3, and a combination thereof; wherein a cured material of the poly(imide-amide) copolymer may have a tensile modulus of greater than or equal to about 5.5 GPa, and a yellowness index of less than or equal to about 5: wherein, groups and variables in Chemical Formulae 1 and 3 are the same as described in the specification.

公开(公告)号：US09988493B2

公开(公告)日：2018-06-05

申请号：US14741959

申请日：2015-06-17

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Chanjae Ahn ,  Sungwon Choi ,  Sungwoo Hong ,  Byunghee Sohn ,  Sun Jin Song ,  Kyeong-sik Ju

IPC: C08G73/00 ,  C08G73/14 ,  C08G73/10

CPC classification number: C08G73/14 ,  C08G73/1039

Abstract: A poly(amide-imide) copolymer including a structural unit represented by Chemical Formula 1; a structural unit represented by Chemical Formula 2, and/or an amic acid precursor structural unit which forms the structural unit represented by Chemical Formula 2 through imidization; and a structural unit represented by Chemical Formula 3, and/or an amic acid precursor structural unit which forms the structural unit represented by Chemical Formula 3 through imidization, wherein the poly(amide-imide) copolymer has a modulus of greater than or equal to about 5.5 giga Pascals after being cured, a yellowness index YI of less than or equal to about 3.5, and an increase in yellowness index ΔYI of less than or equal to about 0.7 after being exposed to ultraviolet light for 72 hours: wherein in Chemical Formulae 1 to 3, groups and variables are the same as described in the specification.

公开(公告)号：US10927218B2

公开(公告)日：2021-02-23

申请号：US16126270

申请日：2018-09-10

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Boreum Jeong ,  Sang Soo Jee ,  Won Suk Chang ,  Kyeong-sik Ju ,  Chanjae Ahn ,  A Ra Jo ,  Sungwon Choi

IPC: C08G73/14 ,  G02B1/14 ,  C08J5/18 ,  C08G73/10

Abstract: A poly(amide-imide) copolymer that is a reaction product of a substituted or unsubstituted aromatic diamine having a maximum absorption wavelength in a range from 500 nanometers (nm) to 650 nm in a visible light region, a diamine represented by Chemical Formula 1, a dicarbonyl compound represented by Chemical Formula 2, and a tetracarboxylic acid dianhydride represented by Chemical Formula 3: wherein, in Chemical Formulae 1 to 3, A, R3, R10, R12, R13, X, n7 and n8 are the same as defined in the specification.

公开(公告)号：US10858482B2

公开(公告)日：2020-12-08

申请号：US14879287

申请日：2015-10-09

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Sung Woo Hong ,  Byung-hee Sohn ,  Sun Jin Song ,  Chanjae Ahn ,  Kyeong-sik Ju ,  Sungwon Choi

IPC: C08G73/22 ,  C08G73/10 ,  C08G73/14 ,  C08J5/18 ,  C09D179/08 ,  C09D179/04

Abstract: A composition for preparing poly(imide-benzoxazole) copolymer is described, where the copolymer include: a tetracarboxylic acid dianhydride represented by Chemical Formula 1, a diamine represented by Chemical Formula 2, and a diamine represented by Chemical Formula 3: wherein definitions of groups and variables in Chemical Formulae 1 to 3 are the same as described in the specification.

公开(公告)号：US10815343B2

公开(公告)日：2020-10-27

申请号：US16016734

申请日：2018-06-25

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Byunghee Sohn ,  Sungwon Choi

IPC: C08J3/24 ,  C08G73/10 ,  C08J5/18 ,  C08G73/14 ,  C09D179/08

Abstract: A composition for preparing at least one of a polyimide and a poly(imide -amide) copolymer, the composition including at least one of a polyamic acid and a poly(amic acid-amide) copolymer, and at least one of a carbodiimide derivative and a carbodiimidazole derivative.

公开(公告)号：US10591761B2

公开(公告)日：2020-03-17

申请号：US15789695

申请日：2017-10-20

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Sang Soo Jee ,  Sun Jin Song ,  Chanjae Ahn ,  Sungwon Choi

IPC: C08G73/14 ,  G02F1/1333 ,  C09D183/06 ,  C08J7/04 ,  C08K5/5419 ,  C08L79/08

Abstract: A flexible plastic substrate includes a film including a poly(amide-imide) copolymer; and a hard coating layer disposed on a first surface of the film, wherein the hard coating layer includes a crosslinked siloxane copolymer, and wherein the flexible plastic substrate has pencil hardness of greater than or equal to 2H under a vertical load of 1 kilogram according to ASTM D3363, a total light transmittance of greater than or equal to about 89% in a wavelength region of 350 nanometers to 750 nanometers.

公开(公告)号：US11982940B2

公开(公告)日：2024-05-14

申请号：US18313555

申请日：2023-05-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eunkyung Lee ,  Sumin Kim ,  Hyunwoo Kim ,  Juhyeon Park ,  Giyoung Song ,  Sukkoo Hong ,  Yoonhyun Kwak ,  Youngmin Nam ,  Byunghee Sohn ,  Sunyoung Lee ,  Aram Jeon ,  Sungwon Choi

IPC: G03F7/004 ,  C07C309/12 ,  C07C381/12 ,  C07D333/76 ,  G03F7/038 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C07C309/12 ,  C07C381/12 ,  C07D333/76 ,  G03F7/038 ,  G03F7/039 ,  C07C2603/74

Abstract: Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:




wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.

公开(公告)号：US10072180B2

公开(公告)日：2018-09-11

申请号：US14744621

申请日：2015-06-19

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Sungwon Choi ,  Chanjae Ahn ,  Sungwoo Hong ,  Byunghee Sohn ,  Hyunjeong Jeon ,  Kyeong-sik Ju

IPC: C08G73/10 ,  C09D179/08 ,  B32B27/08 ,  C08G73/14

CPC classification number: C09D179/08 ,  C08G73/1028 ,  C08G73/1039 ,  C08G73/1042 ,  C08G73/1067 ,  C08G73/14

Abstract: A composition for preparing an article including a poly(imide-amide) copolymer, the composition including (i) a copolymer obtained by reacting a tetracarboxylic acid dianhydride represented by Chemical Formula 1, a diamine represented by Chemical Formula 2, and a carboxylic acid dichloride to form a reaction product, followed by removing hydrochloric acid from the reaction product, (ii) an acid anhydride, and (iii) a solvent: Wherein group R1 in Chemical Formula 1 and group R2 in Chemical Formula 2 are the same as described in the specification.