公开(公告)号：US10815343B2

公开(公告)日：2020-10-27

申请号：US16016734

申请日：2018-06-25

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Byunghee Sohn ,  Sungwon Choi

IPC: C08J3/24 ,  C08G73/10 ,  C08J5/18 ,  C08G73/14 ,  C09D179/08

Abstract: A composition for preparing at least one of a polyimide and a poly(imide -amide) copolymer, the composition including at least one of a polyamic acid and a poly(amic acid-amide) copolymer, and at least one of a carbodiimide derivative and a carbodiimidazole derivative.

公开(公告)号：US11982940B2

公开(公告)日：2024-05-14

申请号：US18313555

申请日：2023-05-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eunkyung Lee ,  Sumin Kim ,  Hyunwoo Kim ,  Juhyeon Park ,  Giyoung Song ,  Sukkoo Hong ,  Yoonhyun Kwak ,  Youngmin Nam ,  Byunghee Sohn ,  Sunyoung Lee ,  Aram Jeon ,  Sungwon Choi

IPC: G03F7/004 ,  C07C309/12 ,  C07C381/12 ,  C07D333/76 ,  G03F7/038 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C07C309/12 ,  C07C381/12 ,  C07D333/76 ,  G03F7/038 ,  G03F7/039 ,  C07C2603/74

Abstract: Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:




wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.

公开(公告)号：US10072180B2

公开(公告)日：2018-09-11

申请号：US14744621

申请日：2015-06-19

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Sungwon Choi ,  Chanjae Ahn ,  Sungwoo Hong ,  Byunghee Sohn ,  Hyunjeong Jeon ,  Kyeong-sik Ju

IPC: C08G73/10 ,  C09D179/08 ,  B32B27/08 ,  C08G73/14

CPC classification number: C09D179/08 ,  C08G73/1028 ,  C08G73/1039 ,  C08G73/1042 ,  C08G73/1067 ,  C08G73/14

Abstract: A composition for preparing an article including a poly(imide-amide) copolymer, the composition including (i) a copolymer obtained by reacting a tetracarboxylic acid dianhydride represented by Chemical Formula 1, a diamine represented by Chemical Formula 2, and a carboxylic acid dichloride to form a reaction product, followed by removing hydrochloric acid from the reaction product, (ii) an acid anhydride, and (iii) a solvent: Wherein group R1 in Chemical Formula 1 and group R2 in Chemical Formula 2 are the same as described in the specification.

公开(公告)号：US09902814B2

公开(公告)日：2018-02-27

申请号：US15356952

申请日：2016-11-21

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  Samsung SDI Co., Ltd.

Inventor： Hyunjeong Jeon ,  Sang Soo Jee ,  Hongkyoon Choi ,  Byunghee Sohn ,  Kyeong-Sik Ju

IPC: C08G83/00

CPC classification number: C08G83/001 ,  C08K5/549 ,  C08L79/08 ,  C09D179/08 ,  H01L51/5253 ,  C08L83/04

Abstract: A composition for preparing an organic/inorganic hybrid poly(amide-imide) copolymer including a poly(amide-imide) copolymer, a poly(amide-amic acid) copolymer, or a poly(amide-imide/amic acid) copolymer including a structural unit represented by Chemical Formula 1; and a structural unit represented by Chemical Formula 2, a structural unit represented by Chemical Formula 3, or a combination thereof, and a polyhedral oligomeric silsesquioxane including a functional group capable of forming a hydrogen bond: wherein in Chemical Formulae 1 to 3, A, B, D, and E are the same as defined in the detailed description.

公开(公告)号：US11535711B2

公开(公告)日：2022-12-27

申请号：US16891328

申请日：2020-06-03

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Byunghee Sohn ,  Sungwon Choi ,  Sun Jin Song ,  Chanjae Ahn

IPC: C08G73/14 ,  C08L79/08 ,  C09D179/08

Abstract: A poly(amide-imide) copolymer that is a reaction product of a diamine represented by Chemical Formula 1, a tetracarboxylic acid dianhydride including a compound represented by Chemical Formula 2, and a compound represented by Chemical Formula 3: wherein, in Chemical Formulae 1 to 4, R1 to R4, A, and X are the same as defined in the specification.

公开(公告)号：US10689513B2

公开(公告)日：2020-06-23

申请号：US15419019

申请日：2017-01-30

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  Samsung SDI Co., Ltd.

Inventor： Chanjae Ahn ,  Sungwon Choi ,  Byunghee Sohn ,  A Ra Jo ,  Kyeong-sik Ju ,  Sang Soo Jee ,  Hongkyoon Choi

IPC: C08L79/08 ,  C08G73/10 ,  C08K3/105 ,  C08G69/32 ,  C09D179/08 ,  C08G73/06 ,  C08K5/00 ,  C08K3/16 ,  C08K3/28 ,  C08G73/14

Abstract: A composition for preparing an article including a polyimide or poly(imide-amide) copolymer, the composition including (1) a solution including at least one of (i) a polymer including at least one selected from a structural unit represented by Chemical Formula 1 and a structural unit represented by Chemical Formula 2; and (ii) a copolymer including at least one selected from a structural unit represented by Chemical Formula 1 and a structural unit represented by Chemical Formula 2, and a structural unit represented by Chemical Formula 3, and (2) a metallic salt soluble in the solution of the polymer and/or the copolymer, wherein the metallic salt is a salt of a metal selected from a Group 1 element, a Group 11 element, a Group 13 element, and a Group 14 element: wherein in Chemical Formulae 1 to 3, A, B, D, and E are the same as defined in the detailed description.

公开(公告)号：US10100153B2

公开(公告)日：2018-10-16

申请号：US15291603

申请日：2016-10-12

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  Samsung SDI Co., Ltd.

Inventor： Sang Soo Jee ,  Hyunjeong Jeon ,  Sungwon Choi ,  Byunghee Sohn ,  Kyeong-sik Ju

IPC: C08G73/00 ,  C08G73/14 ,  C08G73/10 ,  C08J5/18

Abstract: A poly(imide-amide) copolymer includes: an imide structural unit which is a reaction product of a first diamine and a dianhydride, and an amide structural unit which is a reaction product of a second diamine and a diacyl halide, wherein each of the first diamine and the second diamine includes 2,2′-bis-trifluoromethyl-4,4′-biphenyldiamine, and at least one of the first diamine and the second diamine further includes a compound represented by Chemical Formula 1, wherein the dianhydride includes 3,3′,4,4′-biphenyltetracarboxylic dianhydride and 4,4′-hexafluoroisopropylidene diphthalic anhydride, wherein the diacyl halide includes terephthaloyl chloride (TPCl), and wherein an amount of the compound represented by Chemical Formula 1 is less than or equal to about 10 mole percent based on the total amount of the first diamine and the second diamine: NH2-A-NH2  Chemical Formula 1 wherein in Chemical Formula 1, A is the same as described in the detailed description.

公开(公告)号：US11693315B2

公开(公告)日：2023-07-04

申请号：US17238355

申请日：2021-04-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eunkyung Lee ,  Sumin Kim ,  Hyunwoo Kim ,  Juhyeon Park ,  Giyoung Song ,  Sukkoo Hong ,  Yoonhyun Kwak ,  Youngmin Nam ,  Byunghee Sohn ,  Sunyoung Lee ,  Aram Jeon ,  Sungwon Choi

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C309/12 ,  C07D333/76 ,  C07C381/12

CPC classification number: G03F7/0045 ,  C07C309/12 ,  C07C381/12 ,  C07D333/76 ,  G03F7/038 ,  G03F7/039 ,  C07C2603/74

Abstract: Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:




wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.

公开(公告)号：US11059954B2

公开(公告)日：2021-07-13

申请号：US15397180

申请日：2017-01-03

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  Samsung SDI Co., Ltd.

Inventor： A Ra Jo ,  Chanjae Ahn ,  Byunghee Sohn ,  Kyeong-sik Ju

IPC: C08K5/56 ,  C08G73/14 ,  C08K5/00 ,  C08G73/10 ,  C09B69/10 ,  C08K5/357 ,  C08G69/32

Abstract: A composition for preparing an article including a polyimide or poly(imide-amide) copolymer, the composition including (1) at least one of (i) a polyimide, a polyamic acid, or a poly(imide-amic acid) including at least one selected from a structural unit represented by Chemical Formula 1 and a structural unit represented by Chemical Formula 2; and (ii) a poly(imide-amide) copolymer, a poly(amic acid-amide) copolymer, or a poly(imide and amic acid-amide) copolymer including at least one selected from a structural unit represented by Chemical Formula 1 and a structural unit represented by Chemical Formula 2, and a structural unit represented by Chemical Formula 3, and (2) a compound having a maximum absorption wavelength at about 570 nm or more in a visible radiation region: wherein in Chemical Formulae 1 to 3, A, B, D, and E are the same as defined in the detailed description.

公开(公告)号：US10508175B2

公开(公告)日：2019-12-17

申请号：US15720992

申请日：2017-09-29

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Sungwon Choi ,  Chanjae Ahn ,  Hyunjeong Jeon ,  Sang Soo Jee ,  Byunghee Sohn ,  Won Suk Chang

IPC: C08G77/445 ,  C08G77/455 ,  C08G77/04 ,  C08L83/12 ,  C08G73/14 ,  C08G73/10 ,  C08L79/08 ,  C09D179/08 ,  C08G77/00 ,  C08G77/16 ,  C08G77/18

Abstract: A composition including a polyamideimide precursor modified with an alkoxysilane group and an oligosilica compound, wherein the oligosilica compound is a condensation reaction product of an organosilane diol and an alkoxysilane compound.