公开(公告)号：US20170088755A1

公开(公告)日：2017-03-30

申请号：US15254701

申请日：2016-09-01

申请人： Samsung Electronics Co., Ltd. ,  FINE SEMITECH CORP.

发明人： Byungchul YOO ,  Sungyong CHO ,  Jaehyuck CHOI ,  Jeongsu Yang ,  Donghoon CHUNG ,  Han-Shin LEE ,  Myungjun KIM ,  Ikjun KIM ,  Jikang KIM ,  Jeonghwan MIN ,  Kyoungchae SEO

IPC分类号： C09J133/10 ,  G03F1/82 ,  B08B1/00 ,  C09J133/06 ,  B08B3/08 ,  B08B3/12 ,  G03F1/64 ,  C09J133/08

CPC分类号： C09J133/10 ,  C08F6/02 ,  C08F8/44 ,  C08F220/06 ,  C09J133/02 ,  C09J133/068 ,  C09J133/08 ,  C09J133/26 ,  G03F1/64 ,  G03F1/82

摘要： A pellicle including a water-soluble adhesive and a photomask assembly including the pellicle are provided. A pellicle may include a membrane, a pellicle frame, and a water-soluble adhesive disposed on the pellicle frame. The water-soluble adhesive may be prepared by a mixture including a water-soluble acrylic adhesive material in an amount of about 40% to about 55% by weight of the mixture, water or a solution of water and alcohol in an amount of about 40% to about 55% by weight of the mixture, and an additive in an amount of about 1% to about 5% by weight of the mixture.

公开(公告)号：US20160139500A1

公开(公告)日：2016-05-19

申请号：US14736706

申请日：2015-06-11

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： Munja KIM ,  Byunggook KIM ,  Jaehyuck CHOI

IPC分类号： G03F1/62

CPC分类号： G03F1/62 ,  G03F1/64

摘要： Provided is a method of manufacturing a pellicle. The method includes preparing a substrate, forming a membrane on the substrate by performing a chemical vapor deposition (CVD) process, separating the membrane from the substrate in a first solvent, rinsing the separated membrane in a second solvent, and transferring the separated membrane to a frame in a third solvent.

摘要翻译： 提供一种制造防护薄膜组件的方法。 该方法包括制备基材，通过进行化学气相沉积（CVD）工艺在基板上形成膜，在第一溶剂中将膜与基板分离，在第二溶剂中冲洗分离的膜，并将分离的膜转移到 在第三溶剂中的框架。

公开(公告)号：US20180203346A1

公开(公告)日：2018-07-19

申请号：US15919653

申请日：2018-03-13

申请人： Samsung Electronics Co., Ltd.

发明人： Hwanchul JEON ,  Munja KIM ,  Sungwon KWON ,  Byunggook KIM ,  Roman CHALYKH ,  Yongseok JUNG ,  Jaehyuck CHOI

IPC分类号： G03F1/64 ,  G03F1/62

CPC分类号： G03F1/64 ,  G03F1/62

摘要： A pellicle for lithography processes, including extreme ultraviolet (EUV) lithography may mitigate thermal accumulation in a membrane of the pellicle. The pellicle includes a membrane and at least one thermal buffer layer on at least one surface of the membrane. An emissivity of the thermal buffer layer may be greater than an emissivity of the membrane. A carbon content of the thermal buffer layer may be greater than a carbon content of the membrane. Multiple thermal buffer layers may be on separate surfaces of the membrane, and the thermal buffer layers may have different properties. A capping layer may be on at least one thermal buffer layer, and the capping layer may include a hydrogen resistant material. A thermal buffer layer may extend over some or all of a surface of the membrane. A thermal buffer layer may be between at least two membranes.