-
公开(公告)号:US20200321444A1
公开(公告)日:2020-10-08
申请号:US16374330
申请日:2019-04-03
Applicant: SANDISK TECHNOLOGIES LLC
Inventor: Yu-Chung LIEN , Jiahui YUAN , Deepanshu DUTTA
IPC: H01L29/51 , H01L27/11524 , H01L27/11556 , H01L29/423 , H01L27/1157 , H01L27/11582 , H01L21/28
Abstract: A memory device includes a channel, a control gate electrode, and at least one charge storage element located between the channel and the control gate electrode. The control gate electrode includes a first electrically conductive layer, a second electrically conductive layer and a ferroelectric material layer located between the first electrically conductive layer and the second electrically conductive layer.
-
公开(公告)号:US20210159169A1
公开(公告)日:2021-05-27
申请号:US16697560
申请日:2019-11-27
Applicant: SANDISK TECHNOLOGIES LLC
Inventor: Dengtao ZHAO , Zhiping ZHANG , Peng ZHANG , Deepanshu DUTTA
IPC: H01L23/522 , H01L23/528 , G11C5/06 , G11C16/16 , H01L27/11519 , H01L27/11524 , H01L27/11556 , H01L27/11565 , H01L27/1157 , H01L27/11582
Abstract: A three-dimensional memory device includes an alternating stack of insulating layers and electrically conductive layers located over a substrate, where the electrically conductive layers comprise word lines located between a source select gate electrode and a drain select gate electrode, a memory opening vertically extending through each layer of the alternating stack to a top surface of the substrate, a memory film and vertical semiconductor channel having a doping of a first conductivity type located in the memory opening, and an active region having a doping of a second conductivity type that is an opposite of the first conductivity type and adjoined to an end portion of the vertical semiconductor channel to provide a p-n junction. The end portion of the vertical semiconductor channel has a first thickness, and a middle portion of the vertical semiconductor channel has a second thickness which is less than the first thickness.
-
公开(公告)号:US20190304549A1
公开(公告)日:2019-10-03
申请号:US15937420
申请日:2018-03-27
Applicant: SanDisk Technologies LLC
Inventor: Xiang YANG , Huai-yuan TSENG , Deepanshu DUTTA
IPC: G11C16/30 , G11C16/08 , G11C16/24 , G11C16/04 , H01L23/528 , H01L27/11524 , H01L27/1157
Abstract: An apparatus includes a plurality of solid-state storage elements, a plurality of control lines coupled to the plurality of solid-state storage elements, and control circuitry in communication with the plurality of control lines. The control circuitry is configured to during a first phase of a control line pre-charging stage, charge one or more unselected control lines of the plurality of control lines using a regulated charging current for a period of time based at least in part on a bias variance state associated with the plurality of control lines, and during a second phase of the control line pre-charging stage, charge the one or more unselected bit lines to an inhibit voltage level using an unregulated charging current.
-
-