公开(公告)号：US08790859B2

公开(公告)日：2014-07-29

申请号：US12620988

申请日：2009-11-18

申请人： Sang-Hyun Yun ,  Woo-Seok Jeon ,  Jung-In Park ,  Hi-Kuk Lee ,  Byung-Uk Kim ,  Dong-Min Kim ,  Seung-Ki Kim ,  Ja-Hun Byeon

发明人： Sang-Hyun Yun ,  Woo-Seok Jeon ,  Jung-In Park ,  Hi-Kuk Lee ,  Byung-Uk Kim ,  Dong-Min Kim ,  Seung-Ki Kim ,  Ja-Hun Byeon

IPC分类号： G03F7/004 ,  G03F7/022 ,  G03F7/023 ,  H01L29/66 ,  H01L21/336

CPC分类号： G03F7/0236 ,  G03F7/022 ,  H01L27/1288 ,  H01L29/66765

摘要： The present invention relates to a photoresist composition for digital exposure and a method of fabricating a thin film transistor substrate. The photoresist composition for digital exposure includes a binder resin including a novolak resin and a compound represented by the chemical formula (1), a photosensitizer including a diazide-based compound, and a solvent: wherein R1-R9 each include a hydrogen atom, an alkyl group, or a benzyl group, a is an integer from 0 to 10, b is an integer from 0 to 100, and c is an integer from 0 to 10.

摘要翻译： 本发明涉及用于数字曝光的光致抗蚀剂组合物和制造薄膜晶体管衬底的方法。 用于数字曝光的光致抗蚀剂组合物包括包含酚醛清漆树脂和由化学式（1）表示的化合物的粘合剂树脂，包含二叠氮基化合物的光敏剂和溶剂：其中R1-R9各自包含氢原子， 烷基或苄基，a为0〜10的整数，b为0〜100的整数，c为0〜10的整数。

公开(公告)号：US20100167476A1

公开(公告)日：2010-07-01

申请号：US12620988

申请日：2009-11-18

申请人： Sang-Hyun Yun ,  Wook-Seok Jeon ,  Jung-In Park ,  Hi-Kuk Lee ,  Byung-Uk Kim ,  Dong-Min Kim ,  Seung-Ki Kim ,  Ja-Hun Byeon

发明人： Sang-Hyun Yun ,  Wook-Seok Jeon ,  Jung-In Park ,  Hi-Kuk Lee ,  Byung-Uk Kim ,  Dong-Min Kim ,  Seung-Ki Kim ,  Ja-Hun Byeon

IPC分类号： H01L21/336 ,  G03F7/004

CPC分类号： G03F7/0236 ,  G03F7/022 ,  H01L27/1288 ,  H01L29/66765

摘要： The present invention relates to a photoresist composition for digital exposure and a method of fabricating a thin film transistor substrate. The photoresist composition for digital exposure includes a binder resin including a novolak resin and a compound represented by the chemical formula (1), a photosensitizer including a diazide-based compound, and a solvent: wherein R1-R9 each include a hydrogen atom, an alkyl group, or a benzyl group, a is an integer from 0 to 10, b is an integer from 0 to 100, and c is an integer from 0 to 10.

摘要翻译： 本发明涉及用于数字曝光的光致抗蚀剂组合物和制造薄膜晶体管衬底的方法。 用于数字曝光的光致抗蚀剂组合物包括包含酚醛清漆树脂和由化学式（1）表示的化合物的粘合剂树脂，包含二叠氮基化合物的光敏剂和溶剂：其中R1-R9各自包含氢原子， 烷基或苄基，a为0〜10的整数，b为0〜100的整数，c为0〜10的整数。