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公开(公告)号：US07553467B2
公开(公告)日：2009-06-30
申请号：US10567943
申请日：2004-08-11
CPC分类号： B01F3/02 , B01F5/0618 , B01F5/0646 , B01F5/0647 , B01F5/065 , B01F5/0655 , B01F2005/0625 , B01F2005/0636 , B01F2005/0637 , B01J19/0053 , B01J19/2415 , B01J19/2425 , B01J19/244 , B01J2219/00015 , C01B33/02 , C01B33/03 , Y10T117/10 , Y10T117/1028
摘要： There is provided a reaction vessel whereby silicon produced can be smoothly recovered dropwise without excessive thermal load on constitutional parts of the reaction vessel, a silicon deposition feedstock gas can be reacted efficiently even when the reaction vessel is scaled up to industrial large-scale equipment, generation of silicon fine powder and silane oligomers can be suppressed, and industrial silicon production can be performed over extended periods. The tubular reaction vessel comprises a longitudinally-extending wall with a space thereinside, wherein a silicon deposition feedstock gas inflow opening and a deposited silicon discharge opening are provided at an upper portion and a lower end portion respectively, and a flow resistance-increasing region is created on a wall surface of the tubular reaction vessel that is contacted with a feedstock gas. The flow resistance-increasing region is at least one of protrudent, concave and sloped regions.
摘要翻译： 提供了一种反应容器，由此可以在反应容器的结构部件上平滑地顺利地回收产生的硅烷，而不会有过多的热负荷，即使反应容器放大到工业大型设备，也可以有效地反应硅沉积原料气体， 可以抑制硅微粉末和硅烷低聚物的产生，并且可以在长时间内进行工业硅生产。 管状反应容器包括在其上具有空间的纵向延伸的壁，其中硅沉积原料气体流入开口和淀积的硅排放口分别设置在上部和下端部，流阻增加区域 在与原料气体接触的管状反应容器的壁表面上产生。 流动阻力增加区域是突出，凹入和倾斜区域中的至少一个。
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公开(公告)号：US20060219161A1
公开(公告)日：2006-10-05
申请号：US10567943
申请日：2004-08-11
CPC分类号： B01F3/02 , B01F5/0618 , B01F5/0646 , B01F5/0647 , B01F5/065 , B01F5/0655 , B01F2005/0625 , B01F2005/0636 , B01F2005/0637 , B01J19/0053 , B01J19/2415 , B01J19/2425 , B01J19/244 , B01J2219/00015 , C01B33/02 , C01B33/03 , Y10T117/10 , Y10T117/1028
摘要： There is provided a reaction vessel whereby silicon produced can be smoothly recovered dropwise without excessive thermal load on constitutional parts of the reaction vessel, a silicon deposition feedstock gas can be reacted efficiently even when the reaction vessel is scaled up to industrial large-scale equipment, generation of silicon fine powder and silane oligomers can be suppressed, and industrial silicon production can be performed over extended periods. The tubular reaction vessel comprises a longitudinally-extending wall with a space thereinside, wherein a silicon deposition feedstock gas inflow opening and a deposited silicon discharge opening are provided at an upper portion and a lower end portion respectively, and a flow resistance-increasing region is created on a wall surface of the tubular reaction vessel that is contacted with a feedstock gas. The flow resistance-increasing region is at least one of protrudent, concave and sloped regions.
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