摘要:
According to one embodiment, an electroforming master comprises a patterns of protrusions and recesses formed on one major surface of an Si substrate having two major surfaces, corresponding to information for positioning of a read/write head (a preamble, address, and burst), recording tracks or recording bits. Impurity ions are doped in the surface of this patterns of protrusions and recesses. The impurity ion concentration distribution in the film thickness direction of the Si substrate has a peak in a portion from the patterns of protrusions and recesses surface to a depth of 40 nm in the film thickness direction. The impurity concentration of this peak is 1×1020 to 2×1021 ions/cm3.
摘要:
According to one embodiment, patterns of protrusions and recesses includes a substrate including a conductive region on at least one major surface, and a projecting pattern layer formed on the conductive region on the major surface, and made of a microcrystalline material, a polycrystalline material, an amorphous material, or an oxide of the microcrystalline, polycrystalline, or amorphous material.
摘要:
According to one embodiment, a stamper manufacturing method includes forming a conductive material concentration gradient layer including the projections pattern, and a composition ratio of a buffering agent to a conductive material in the conductive material concentration gradient layer reducing in a thickness direction from a master side.
摘要:
According to one embodiment, a method of manufacturing a magnetic recording medium includes forming protruded magnetic patterns on a substrate, depositing a nonmagnetic material in recesses between the magnetic patterns and on the magnetic patterns, and etching back the nonmagnetic material using an oxygen-containing etching gas while reforming a surface of the nonmagnetic material.
摘要:
According to one embodiment, there is provided a magnetic recording media including a substrate, and a magnetic recording layer including magnetic film patterns formed in a protruded form on the substrate, sidewalls of the magnetic film patterns having at least two faces of different slope angles.
摘要:
According to one embodiment, a magnetic recording medium includes magnetic patterns made of a ferromagnetic recording layer containing Co, and a nonmagnetic layer which separates the magnetic patterns and has a lower Co concentration than the magnetic patterns.
摘要:
A magnetic recording medium has magnetic patterns formed of a patterned ferromagnetic layer, and a non-magnetic layer including a component of the ferromagnetic layer and separating the magnetic patterns, in which a thickness “a” of the non-magnetic layer and a thickness “b” of the magnetic patterns satisfy a relationship of: a
摘要:
According to one embodiment, a method of manufacturing a discrete track recording medium includes forming protruded magnetic patterns on a substrate, and repeating processes of depositing a nonmagnetic material so as to be filled in recesses between the magnetic patterns and etching back the nonmagnetic material two or more times with rotating the substrate in a plane thereof by an angle less than one revolution.
摘要:
A magnetic recording media includes a toroidal substrate, a surface thereof is divided into a recording area located in a central part between an outer peripheral edge and an inner peripheral edge, edge areas located within 100 μm or more and 2,000 μm or less from the outer and inner peripheral edges, respectively, and adjacent areas located between the edge areas and the recording area, respectively, a magnetic film on the substrate, and a protective film on the magnetic film, in which the magnetic film is thinner in the edge areas than that in the adjacent areas, and at least a part of the protective film in the edge areas is thicker than that in the adjacent areas.
摘要:
A method of manufacturing a patterned magnetic recording medium includes coating a magnetic film with a resist which is decomposed by exposure to electromagnetic radiation or an electron beam to have a low molecular weight, forming a pattern on the resist by an imprinting method, transferring the pattern to the magnetic film by using the resist having the pattern formed thereon as a mask, and removing the resist by exposing the resist to the electromagnetic radiation or the electron beam.