公开(公告)号：US08506063B2

公开(公告)日：2013-08-13

申请号：US13022278

申请日：2011-02-07

申请人： Scott Limb ,  John S. Paschkewitz ,  Eric J. Shrader

发明人： Scott Limb ,  John S. Paschkewitz ,  Eric J. Shrader

IPC分类号： B41J2/175

CPC分类号： B41J2/17593 ,  B41J2/17503

摘要： A print head assembly for an ink jet printer includes an ink flow path configured to allow passage of a phase-change ink. A pressure unit is fluidically coupled to the ink flow path to apply a pressure to the ink. The applied pressure is controlled by a control unit during a time that the ink in the ink flow path is undergoing a phase change. During the phase change, a portion of the ink in a first region of the ink flow path is in liquid phase and another portion of the ink in another region of the ink flow path is in solid phase. A constant or variable pressure can be applied at least to the liquid phase portion of the ink during a phase transition from a liquid phase to a solid phase or from a solid phase to a liquid phase.

摘要翻译： 用于喷墨打印机的打印头组件包括配置为允许相变墨水通过的墨流路。 压力单元流体耦合到油墨流动路径以向油墨施加压力。 所施加的压力由油墨流路中的油墨经历相变的时间由控制单元控制。 在相变期间，油墨流路的第一区域中的油墨的一部分处于液相，油墨流路的另一区域中的油墨的另一部分是固相的。 在从液相到固相或从固相到液相的相转变期间，至少可以将油压的恒定或可变压力施加到油墨的液相部分。

公开(公告)号：US06878626B1

公开(公告)日：2005-04-12

申请号：US10325091

申请日：2002-12-20

申请人： Susan A. Alie ,  Bruce K. Wachtmann ,  David S. Kneedler ,  Scott Limb ,  Kieran Nunan

发明人： Susan A. Alie ,  Bruce K. Wachtmann ,  David S. Kneedler ,  Scott Limb ,  Kieran Nunan

IPC分类号： B81B7/00 ,  H01L21/44

CPC分类号： B81B7/0006

摘要： A metallization stack is provided for use as a contact structure in an integrated MEMS device. The metallization stack includes a titanium-tungsten adhesion and barrier layer formed with a platinum layer formed on top. The platinum feature is formed by sputter etching the platinum in argon, followed by a wet etch in aqua regia using an oxide hardmask. Alternatively, the titanium-tungsten and platinum layers are deposited sequentially and patterned by a single plasma etch process with a photoresist mask.

摘要翻译： 提供金属化堆叠用作集成MEMS器件中的接触结构。 金属化堆叠包括形成在顶部形成有铂层的钛 - 钨粘合和阻挡层。 铂特征是通过在氩气中溅射蚀刻铂，然后使用氧化物硬掩模在王水中进行湿式蚀刻而形成的。 或者，通过用光致抗蚀剂掩模的单等离子体蚀刻工艺顺序地沉积钛 - 钨和铂层并图案化。

公开(公告)号：US08562117B2

公开(公告)日：2013-10-22

申请号：US13022264

申请日：2011-02-07

申请人： Scott Limb

发明人： Scott Limb

IPC分类号： B41J2/175

CPC分类号： B41J2/17593

摘要： A phase change ink printer may be operated so that multiple pressure pulses are applied to the ink in an ink flow path of the printer during a time that the ink is changing phase. During the phase change, a portion of the ink in the ink flow path is in liquid phase and another portion of the ink is in solid phase. The pressure pulses are applied at least to the liquid phase ink in the ink flow path. The phase change may involve a transition from solid to liquid phase, such as during a start-up operation, or may involve a transition from a liquid phase to a solid phase, such as during a power down operation. Application of pressure during either of these operations serves to reduce bubbles and voids in the phase change ink.

摘要翻译： 可以操作相变油墨打印机，使得在油墨正在改变相位的时间期间，多个压力脉冲被施加到打印机的油墨流动路径中的油墨。 在相变期间，油墨流路中的一部分油墨是液相，另一部分油墨是固相的。 压力脉冲至少施加到油墨流路中的液相油墨。 相变可能涉及从固相到液相的过渡，例如在启动操作期间，或者可能涉及从液相向固相的转变，例如在断电操作期间。 在这些操作期间施加压力用于减少相变油墨中的气泡和空隙。

公开(公告)号：US07749916B2

公开(公告)日：2010-07-06

申请号：US12046242

申请日：2008-03-11

申请人： William Wong ,  Scott Limb ,  Michael Chabinyc ,  Beverly Russo ,  Rene Lujan

发明人： William Wong ,  Scott Limb ,  Michael Chabinyc ,  Beverly Russo ,  Rene Lujan

IPC分类号： H01L21/31

CPC分类号： G02F1/133512 ,  B41M3/003 ,  B41M3/006 ,  G02F1/133516 ,  G03F7/2018 ,  Y10S438/942

摘要： A digital lithographic process first deposits a mask layer comprised of print patterned mask features. The print patterned mask features define gaps into which a target material may be deposited, preferably through a digital lithographic process. The target material is cured or hardened, if necessary, into target features. The mask layer is then selectively removed. The remaining target features may then be used as exposure or etch masks, physical structures such as fluid containment elements, etc. Fine feature widths, narrower the minimum width of the print patterned mask features, may be obtained while realizing the benefits of digital lithography in the manufacturing process.

摘要翻译： 数字光刻工艺首先沉积由印刷图案掩模特征组成的掩模层。 印刷图案掩模特征限定了可以沉积目标材料的间隙，优选通过数字光刻工艺。 如果需要，目标材料被固化或硬化成目标特征。 然后选择性地去除掩模层。 剩余的目标特征然后可以用作曝光或蚀刻掩模，诸如流体容纳元件的物理结构等。可以在实现数字光刻的优点的同时获得精细特征宽度，更小的打印图案化掩模特征的最小宽度 制造过程。

公开(公告)号：US20070172969A1

公开(公告)日：2007-07-26

申请号：US10536102

申请日：2006-01-20

申请人： William Wong ,  Scott Limb ,  Michael Chabinyc ,  Beverly Russo ,  Rene Lujan

发明人： William Wong ,  Scott Limb ,  Michael Chabinyc ,  Beverly Russo ,  Rene Lujan

IPC分类号： H01L21/00

CPC分类号： G02F1/133512 ,  B41M3/003 ,  B41M3/006 ,  G02F1/133516 ,  G03F7/2018 ,  Y10S438/942

摘要： A digital lithographic process first deposits a mask layer comprised of print patterned mask features. The print patterned mask features define gaps into which a target material may be deposited, preferably through a digital lithographic process. The target material is cured or hardened, if necessary, into target features. The mask layer is then selectively removed. The remaining target features may then be used as exposure or etch masks, physical structures such as fluid containment elements, etc. Fine feature widths, narrower the minimum width of the print patterned mask features, may be obtained while realizing the benefits of digital lithography in the manufacturing process.

摘要翻译： 数字光刻工艺首先沉积由印刷图案掩模特征组成的掩模层。 印刷图案掩模特征限定了可以沉积目标材料的间隙，优选通过数字光刻工艺。 如果需要，目标材料被固化或硬化成目标特征。 然后选择性地去除掩模层。 剩余的目标特征可以用作曝光或蚀刻掩模，诸如流体容纳元件的物理结构等。可以在实现数字光刻的优点的同时获得精细特征宽度，打印图案化掩模特征的最小宽度更窄 制造过程。

公开(公告)号：US20070172774A1

公开(公告)日：2007-07-26

申请号：US11336365

申请日：2006-01-20

申请人： Scott Limb ,  William Wong ,  Steven Ready ,  Michael Chabinyc

发明人： Scott Limb ,  William Wong ,  Steven Ready ,  Michael Chabinyc

IPC分类号： G03F7/26

CPC分类号： G03F7/0007 ,  G02F1/133516 ,  G03F7/2018

摘要： A print patterned mask is formed a digital lithographic process on the surface of a photoresist or similar material layer. The print patterned mask is then used as a development or etching mask, and the underlying layer overdeveloped or overetched to undercut the print patterned mask. The mask may be removed and the underlying structure used an etch mask or as a final structure. Fine feature widths, narrower the minimum width of the print patterned mask features, may be obtained while realizing the benefits of digital lithography in the manufacturing process.

摘要翻译： 打印图案化掩模在光致抗蚀剂或类似材料层的表面上形成数字平版印刷工艺。 然后将印刷图案化掩模用作显影或蚀刻掩模，并且底层被发展或过蚀刻以削去印刷图案掩模。 可以去除掩模，并且底层结构使用蚀刻掩模或作为最终结构。 可以在实现数字光刻在制造过程中的益处的同时获得细微的特征宽度，使印刷图案化掩模特征的最小宽度更窄。

公开(公告)号：US20070057748A1

公开(公告)日：2007-03-15

申请号：US11224347

申请日：2005-09-12

申请人： Meng Lean ,  Jeng Lu ,  Scott Limb ,  Jurgen Daniel ,  Armin Volkel ,  Huangpin Hsieh ,  Scott Solberg ,  Bryan Preas

发明人： Meng Lean ,  Jeng Lu ,  Scott Limb ,  Jurgen Daniel ,  Armin Volkel ,  Huangpin Hsieh ,  Scott Solberg ,  Bryan Preas

IPC分类号： H01P1/18

CPC分类号： B03C5/028

摘要： Various traveling wave grid configurations are disclosed. The grids and systems are well suited for transporting, separating, and classifying small particles dispersed in liquid or gaseous media. Also disclosed are various separation strategies and purification cells utilizing such traveling wave arrays and strategies.

摘要翻译： 公开了各种行波网格结构。 网格和系统非常适用于分散在液体或气体介质中的小粒子的运输，分离和分类。 还公开了利用这种行波阵列和策略的各种分离策略和纯化单元。

公开(公告)号：US20090185018A9

公开(公告)日：2009-07-23

申请号：US11204648

申请日：2005-08-15

申请人： Steven Ready ,  William Wong ,  Scott Limb

发明人： Steven Ready ,  William Wong ,  Scott Limb

IPC分类号： G01D11/00

CPC分类号： B41J2/2139 ,  B81C99/0065 ,  B81C2201/0184 ,  B81C2201/0198

摘要： A digital lithography system including a droplet source (printhead) for selectively ejecting liquid droplets of a phase-change masking material, and an imaging system for capturing (generating) image data representing printed features formed by the ejected liquid droplets. The system also includes a digital control system that detects defects in the printed features, for example, by comparing the image data with stored image data. The digital control system then modifies the printed feature to correct the defect, for example, by moving the printhead over the defect and causing the printhead to eject droplets onto the defect's location. In one embodiment, a single-printhead secondary printer operates in conjunction with a multi-printhead main printer to correct defects.

摘要翻译： 一种数字光刻系统，包括用于选择性地喷射相变掩模材料的液滴的液滴源（打印头）和用于捕获（产生）表示喷射液滴形成的打印特征的图像数据的成像系统。 该系统还包括数字控制系统，其检测打印特征中的缺陷，例如通过将图像数据与存储的图像数据进行比较。 然后，数字控制系统修改打印的特征以校正缺陷，例如通过将打印头移动到缺陷上并使打印头将液滴喷射到缺陷的位置上。 在一个实施例中，单打印头二次打印机与多打印头主打印机一起操作以校正缺陷。

公开(公告)号：US20090139868A1

公开(公告)日：2009-06-04

申请号：US11949280

申请日：2007-12-03

申请人： Eric Shrader ,  Scott Limb

发明人： Eric Shrader ,  Scott Limb

IPC分类号： C25D5/02

CPC分类号： C25D5/022 ,  C25D1/04 ,  H01L24/02 ,  H01L31/022425 ,  H01L31/18 ,  H01L2224/0401 ,  H01L2224/1147 ,  H01L2924/01004 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01015 ,  H01L2924/01028 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01072 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/014 ,  H01L2924/05042 ,  H01L2924/14 ,  H05K3/0076 ,  H05K3/061 ,  H05K2203/1105 ,  Y02E10/50

摘要： A print-patterned structure may be used as a self-aligned etch and deposition mask. A method of forming conductive lines and other similar features over a plurality of layers comprises forming a print-patterned structure over a first layer. The print-patterned structure is used as an etch mask to expose a portion of a second layer. A seed layer is formed over the exposed portion of the second layer, using the print-patterned structure as a deposition mask. Conductive lines or other features may be formed, for example, by electroplating using the seed layer as a contact pad and the print-patterned structure as deposition mask. The present invention is particularly useful in the formation of features for solar cells and the like where the print-patterned structure may be used to form high aspect ratio features.

摘要翻译： 印刷图案化结构可以用作自对准蚀刻和沉积掩模。 在多个层上形成导电线和其它类似特征的方法包括在第一层上形成印刷图案化结构。 印刷图案化结构用作蚀刻掩模以暴露第二层的一部分。 使用印刷图案化结构作为沉积掩模，在第二层的暴露部分上形成晶种层。 导电线或其他特征可以例如通过使用种子层作为接触焊盘进行电镀，并且印刷图案化结构作为沉积掩模来形成。 本发明特别可用于形成太阳能电池等的特征，其中印刷图案结构可用于形成高纵横比特征。

公开(公告)号：US07498119B2

公开(公告)日：2009-03-03

申请号：US11336365

申请日：2006-01-20

申请人： Scott Limb ,  William Wong ,  Steven Ready ,  Michael Chabinyc

发明人： Scott Limb ,  William Wong ,  Steven Ready ,  Michael Chabinyc

IPC分类号： G03F7/20 ,  G03F7/26 ,  G03F7/38

CPC分类号： G03F7/0007 ,  G02F1/133516 ,  G03F7/2018

摘要： A print patterned mask is formed a digital lithographic process on the surface of a photoresist or similar material layer. The print patterned mask is then used as a development or etching mask, and the underlying layer overdeveloped or overetched to undercut the print patterned mask. The mask may be removed and the underlying structure used an etch mask or as a final structure. Fine feature widths, narrower the minimum width of the print patterned mask features, may be obtained while realizing the benefits of digital lithography in the manufacturing process.

摘要翻译： 打印图案化掩模在光致抗蚀剂或类似材料层的表面上形成数字平版印刷工艺。 然后将印刷图案化掩模用作显影或蚀刻掩模，并且底层被发展或过蚀刻以削去印刷图案掩模。 可以去除掩模，并且底层结构使用蚀刻掩模或作为最终结构。 可以在实现数字光刻在制造过程中的益处的同时获得细微的特征宽度，使印刷图案化掩模特征的最小宽度更窄。