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    Secondary battery using system and material for negative electrode of secondary battery
    6.
    发明授权
    Secondary battery using system and material for negative electrode of secondary battery 有权
    二次电池使用系统和二次电池负极材料

    公开(公告)号：US6083645A

    公开(公告)日：2000-07-04

    申请号：US156387

    申请日：1998-09-18

    申请人： Seiji Takeuchi ,  Hidetoshi Honbo ,  Takeo Yamagata ,  Tatsuo Horiba ,  Yasushi Muranaka

    发明人： Seiji Takeuchi ,  Hidetoshi Honbo ,  Takeo Yamagata ,  Tatsuo Horiba ,  Yasushi Muranaka

    IPC分类号： H01M4/02 ,  H01M4/36 ,  H01M4/58 ,  H01M4/583 ,  H01M4/62 ,  H01M6/10 ,  H01M10/05 ,  H01M10/0525 ,  H01M10/36

    CPC分类号： H01M4/587 ,  H01M4/133 ,  H01M4/36 ,  H01M4/623 ,  H01M10/05 ,  H01M10/0525 ,  H01M2004/027 ,  H01M4/405 ,  H01M6/10

    摘要： A lithium secondary battery suitable for use as a power source for a secondary battery using system such as an electric automobile, motor bicycle or portable equipment includes a negative electrode (17) composed of a carbon material including carbon particles carrying fine particles of a metal which forms an alloy with lithium. The carbon particles have a face-to-face dimension which is 3.354 to 3.369 .ANG. and a crystal grain size in a C-axis direction which is equal to or greater than 300 .ANG.. The metal forming an alloy with lithium has a particle size which is equal to or smaller than 1000 .ANG.. With the use of the charge/discharge capacity of an alloy of the metal and lithium, a value exceeding the theoretical capacity 372 mAh/g of graphite can be obtained. The lithium secondary battery is capable of discharge with an output energy density equal to or higher than 350 W/kg.

    摘要翻译： 适合用作电动汽车，电动自行车或便携式设备等二次电池使用系统的电源的锂二次电池包括由包含载有金属微粒的碳粒子的碳材料构成的负极（17） 与锂形成合金。 碳粒子的面对面尺寸为3.354〜3.369，C轴方向的晶粒尺寸等于或大于300。 与锂形成合金的金属具有等于或小于1000的粒度。 通过使用金属和锂的合金的充放电容量，可以获得超过理论容量为372mAh / g的石墨的值。 锂二次电池能够以等于或高于350W / kg的输出能量密度进行放电。

    Exposure apparatus and device manufacturing method using original with phase-modulation diffraction grating to form interference pattern
    10.
    发明授权
    Exposure apparatus and device manufacturing method using original with phase-modulation diffraction grating to form interference pattern 有权
    使用原始的相位调制衍射光栅的曝光装置和器件制造方法形成干涉图案

    公开(公告)号：US09164370B2

    公开(公告)日：2015-10-20

    申请号：US12418420

    申请日：2009-04-03

    申请人： Yasuhiro Kishikawa ,  Tokuyuki Honda ,  Seiji Takeuchi

    发明人： Yasuhiro Kishikawa ,  Tokuyuki Honda ,  Seiji Takeuchi

    IPC分类号： G03B27/72 ,  G03B27/32 ,  G03F7/20

    CPC分类号： G03B27/72 ,  G03B27/32 ,  G03F7/70583

    摘要： An exposure apparatus which exposes a substrate coated with a photoresist to form a latent image to the photoresist, comprises an original holding unit configured to hold an original including a phase-modulation diffraction grating so that an interference pattern is formed on a surface of the substrate by a light beam diffracted by the original, a substrate holding unit configured to hold the substrate, and a light beam dividing optical system configured to divide a light beam to form a plurality of light beams which enter the original, wherein a latent image is formed on the substrate by superposition of a plurality of interference patterns formed on the surface of the substrate, the plurality of interference patterns respectively corresponding to the plurality of light beams which enter the original.

    摘要翻译： 曝光用光致抗蚀剂涂覆的基板以形成光致抗蚀剂的潜像的曝光装置包括原始保持单元，其被配置为保持包括相位调制衍射光栅的原稿，使得在基板的表面上形成干涉图案 通过由原稿衍射的光束，被配置为保持基板的基板保持单元和被配置为分割光束以形成进入原稿的多个光束的光束分割光学系统，其中形成潜像 通过在基板的表面上形成的多个干涉图案叠加在基板上，分别对应于进入原稿的多个光束的多个干涉图案。