公开(公告)号：US07508493B2

公开(公告)日：2009-03-24

申请号：US11675204

申请日：2007-02-15

申请人： Seiji Takeuchi ,  Kenji Yamazoe ,  Yumiko Ohsaki ,  Minoru Yoshii

发明人： Seiji Takeuchi ,  Kenji Yamazoe ,  Yumiko Ohsaki ,  Minoru Yoshii

IPC分类号： G03B27/72

CPC分类号： G03F7/70108 ,  G03F7/70566

摘要： An exposure apparatus includes an illumination optical system configured to illuminate a reticle, a projection optical system configured to project a pattern of the reticle onto a substrate, a polarization adjuster configured to independently adjust each polarization state of plural areas in an effective light source distribution used to illuminate the reticle, a polarization measurement unit configured to measure a polarization state of light that has passed the polarization adjuster, and a controller configured to independently control each polarization state of the plural areas via the polarization adjuster based on a measurement result of the polarization measurement unit.

摘要翻译： 曝光装置包括：照明光学系统，其被配置为照射光罩;投影光学系统，被配置为将掩模版的图案投影到基板上;偏振调节器，被配置为独立地调节所使用的有效光源分布中的多个区域的各个偏振状态 照明所述掩模版;偏振测量单元，被配置为测量已经通过所述偏振调节器的光的偏振状态;以及控制器，被配置为基于所述偏振光的测量结果，经由所述偏振调节器独立地控制所述多个区域的偏振状态 测量单位。

公开(公告)号：US20070188730A1

公开(公告)日：2007-08-16

申请号：US11675204

申请日：2007-02-15

申请人： Seiji Takeuchi ,  Kenji Yamazoe ,  Yumiko Ohsaki ,  Minoru Yoshii

发明人： Seiji Takeuchi ,  Kenji Yamazoe ,  Yumiko Ohsaki ,  Minoru Yoshii

IPC分类号： G03B27/72

CPC分类号： G03F7/70108 ,  G03F7/70566

摘要： An exposure apparatus includes an illumination optical system configured to illuminate a reticle, a projection optical system configured to project a pattern of the reticle onto a substrate, a polarization adjuster configured to independently adjust each polarization state of plural areas in an effective light source distribution used to illuminate the reticle, a polarization measurement unit configured to measure a polarization state of light that has passed the polarization adjuster, and a controller configured to independently control each polarization state of the plural areas via the polarization adjuster based on a measurement result of the polarization measurement unit.

摘要翻译： 曝光装置包括：照明光学系统，其被配置为照射光罩;投影光学系统，被配置为将掩模版的图案投影到基板上;偏振调节器，被配置为独立地调节所使用的有效光源分布中的多个区域的各个偏振状态 照明所述掩模版;偏振测量单元，被配置为测量已经通过所述偏振调节器的光的偏振状态;以及控制器，被配置为基于所述偏振光的测量结果，经由所述偏振调节器独立地控制所述多个区域的偏振状态 测量单位。

公开(公告)号：US07675629B2

公开(公告)日：2010-03-09

申请号：US11851029

申请日：2007-09-06

申请人： Yumiko Ohsaki ,  Yasuhiro Sawada ,  Kenji Yamazoe ,  Seiji Takeuchi

发明人： Yumiko Ohsaki ,  Yasuhiro Sawada ,  Kenji Yamazoe ,  Seiji Takeuchi

IPC分类号： G01B9/02

CPC分类号： G03F7/70566 ,  G02B27/0025 ,  G03F7/706

摘要： An exposure apparatus including an illumination system which illuminates an original, and projection optics which project a pattern of the original illuminated by the illumination system onto a substrate. The apparatus includes an interferometer which forms an interference pattern including aberration information on the projection optics using a polarized light beam emitted from the illumination system, in which the interferometer is a common path interferometer in which two light beams forming interference pattern pass along a path in the projection optics, and a processor which calculates optical characteristics of the projection optics on the basis of the interference pattern formed by the interferometer. The illumination system including a polarization controller which sequentially generates at least three difference polarized light beams with respective polarization states different from each other. The processor separates first aberration and second aberration from wavefront aberration represented by the interference patterns sequentially formed by the interferometer using the at least three different polarized light beams, by calculating a data of the interference patterns, the first aberration being aberration which does not change dependent on a polarization state of polarized light beam entering the projection optics. The second aberration is aberration which changes dependent on the polarization state of the polarized light beam entering the projection optics.

摘要翻译： 一种曝光装置，包括照亮原稿的照明系统，以及投影光学元件，其将由照明系统照射的原稿的图案投影到基板上。 该装置包括干涉仪，其使用从照明系统发射的偏振光形成包括投影光学器件上的像差信息的干涉图案，其中干涉仪是公共路径干涉仪，其中形成干涉图案的两个光束沿着路径 投影光学器件和基于由干涉仪形成的干涉图案来计算投影光学元件的光学特性的处理器。 所述照明系统包括偏振控制器，其顺序地产生具有彼此不同的各自偏振状态的至少三个差分偏振光束。 处理器通过计算干涉图案的数据，使用至少三个不同的偏振光束分离由干涉仪顺序形成的干涉图案所表示的波前像差的第一像差和第二像差，第一像差是不依赖于变化的像差 在入射到投影光学器件的偏振光束的偏振状态下。 第二像差是根据进入投影光学器件的偏振光束的偏振状态而变化的像差。

公开(公告)号：US20080062427A1

公开(公告)日：2008-03-13

申请号：US11851029

申请日：2007-09-06

申请人： Yumiko Ohsaki ,  Yasuhiro Sawada ,  Kenji Yamazoe ,  Seiji Takeuchi

发明人： Yumiko Ohsaki ,  Yasuhiro Sawada ,  Kenji Yamazoe ,  Seiji Takeuchi

IPC分类号： G01B9/02

CPC分类号： G03F7/70566 ,  G02B27/0025 ,  G03F7/706

摘要： An exposure apparatus includes an interferometer which forms interference fringes including aberration information on projection optics using polarized light beams emitted from an illumination system, and a processor which calculates the optical characteristics of the projection optics on the basis of interference patterns sequentially formed by the interferometer using at least three different polarized light beams sequentially generated by a polarization controller. The optical characteristics include unpolarization aberration which does not depend on the polarization state of light entering the projection optics, and polarization aberration which depends on the polarization state of the light entering the projection optics.

摘要翻译： 曝光装置包括：干涉仪，其形成干涉条纹，其包括使用从照明系统发射的偏振光束的投影光学器件上的像差信息;以及处理器，其基于由干涉仪依次形成的干涉图案来计算投影光学元件的光学特性，所述干涉图案使用 由偏振控制器顺序产生的至少三个不同的偏振光束。 光学特性包括不依赖于进入投影光学器件的光的偏振状态的非偏振像差，以及取决于进入投影光学器件的光的偏振状态的偏振像差。

公开(公告)号：US20060210911A1

公开(公告)日：2006-09-21

申请号：US11366356

申请日：2006-03-01

申请人： Kenji Yamazoe ,  Seiji Takeuchi ,  Akiyoshi Suzuki

发明人： Kenji Yamazoe ,  Seiji Takeuchi ,  Akiyoshi Suzuki

IPC分类号： G03C5/00

CPC分类号： G03F7/7085 ,  G01J4/04 ,  G03F7/70058 ,  G03F7/70566 ,  G03F7/70591

摘要： An exposure apparatus includes an illumination optical system for illuminating the reticle using the ultraviolet light from the light source, and a polarization measuring unit measuring the polarization state of the ultraviolet light, the polarization measuring unit including an optical unit for providing at least three different phase differences to the ultraviolet light that has passed at least part of the illumination optical system, a polarization element for providing a different transmittance in accordance with a polarization state of the ultraviolet light that has passed the optical unit, and an image pickup device for detecting a light intensity of the ultraviolet light that has passed the polarization element, the polarization measuring unit measuring the polarization state of the ultraviolet light that has passed the at least part of the illumination optical system based on a detection result of the image pickup device.

摘要翻译： 曝光装置包括：照明光学系统，其使用来自光源的紫外光照射标线片;以及偏振光测量单元，测量紫外光的偏振状态，所述偏振光测量单元包括用于提供至少三个不同相位的光学单元 与通过照明光学系统的至少一部分的紫外线的差异，根据通过光学单元的紫外线的偏振状态提供不同透射率的偏振元件，以及用于检测 通过偏振元件的紫外线的光强度，所述偏振光测定单元，根据所述摄像元件的检测结果，测量已经通过所述照明光学系统的至少一部分的紫外线的偏振状态。

公开(公告)号：US07573563B2

公开(公告)日：2009-08-11

申请号：US11366356

申请日：2006-03-01

申请人： Kenji Yamazoe ,  Seiji Takeuchi ,  Akiyoshi Suzuki

发明人： Kenji Yamazoe ,  Seiji Takeuchi ,  Akiyoshi Suzuki

IPC分类号： G03B27/72 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/7085 ,  G01J4/04 ,  G03F7/70058 ,  G03F7/70566 ,  G03F7/70591

摘要： An exposure apparatus includes an illumination optical system for illuminating the reticle using the ultraviolet light from the light source, and a polarization measuring unit measuring the polarization state of the ultraviolet light, the polarization measuring unit including an optical unit for providing at least three different phase differences to the ultraviolet light that has passed at least part of the illumination optical system, a polarization element for providing a different transmittance in accordance with a polarization state of the ultraviolet light that has passed the optical unit, and an image pickup device for detecting a light intensity of the ultraviolet light that has passed the polarization element, the polarization measuring unit measuring the polarization state of the ultraviolet light that has passed the at least part of the illumination optical system based on a detection result of the image pickup device.

摘要翻译： 曝光装置包括：照明光学系统，其使用来自光源的紫外光照射标线片;以及偏振光测量单元，测量紫外光的偏振状态，所述偏振光测量单元包括用于提供至少三个不同相位的光学单元 与通过照明光学系统的至少一部分的紫外线的差异，根据通过光学单元的紫外线的偏振状态提供不同透射率的偏振元件，以及用于检测 通过偏振元件的紫外线的光强度，所述偏振光测定单元，根据所述摄像元件的检测结果，测量已经通过所述照明光学系统的至少一部分的紫外线的偏振状态。

公开(公告)号：US08163448B2

公开(公告)日：2012-04-24

申请号：US12685368

申请日：2010-01-11

申请人： Manabu Hakko ,  Kenji Yamazoe

发明人： Manabu Hakko ,  Kenji Yamazoe

IPC分类号： G03F9/00 ,  G03C5/00

CPC分类号： G03F7/70958 ,  G02B1/11 ,  G02B27/0012

摘要： The present invention provides a method of determining a structure of an antireflection coating formed on a substrate as an exposure target of an exposure apparatus, the method comprising steps of calculating, an intensity distribution of light diffracted by an original, based on information of an effective light source formed on a pupil plane of a projection optical system, and information of an original pattern, extracting diffracted light having an intensity of not less than a threshold from the intensity distribution calculated in the calculating step, and determining the structure of the antireflection coating, formed on the substrate, such that a reflectance of the antireflection coating falls within a target range when an incident angle of the diffracted light, which has the intensity of not less than the threshold and is extracted in the extracting step, on the antireflection coating formed on the substrate is an input.

摘要翻译： 本发明提供一种确定作为曝光装置的曝光对象的基板上形成的抗反射涂层的结构的方法，所述方法包括以下步骤：基于有效的信息计算由原稿衍射的光的强度分布 形成在投影光学系统的光瞳平面上的光源和原始图案的信息，从计算步骤计算的强度分布中提取具有不小于阈值的强度的衍射光，并确定抗反射涂层的结构 形成在基板上，使得当具有不小于阈值的强度并且在提取步骤中提取的衍射光的入射角在抗反射涂层上时，抗反射涂层的反射率落在目标范围内 形成在基板上的是输入。

公开(公告)号：US07821648B2

公开(公告)日：2010-10-26

申请号：US12342631

申请日：2008-12-23

申请人： Kenji Yamazoe ,  Yuki Oshima

发明人： Kenji Yamazoe ,  Yuki Oshima

IPC分类号： G01B11/02

CPC分类号： G01B11/255 ,  G01B11/2441 ,  G01M11/025 ,  G01M11/0271

摘要： A measurement method for measuring a shape of a target using an interference pattern includes the steps of converting a first interference pattern into a first shape of the target (S103 to S105), obtaining a second interference pattern at a position where the target moves in an optical axis direction of the reference surface (S107, S108), unwrapping the second interference pattern after aligning a phase of the first interference pattern with a phase of the second interference pattern (S109), converting the unwrapped second interference pattern into a second shape of the target (S110), determining whether or not the first shape of the target coincides with the second shape (S111), and calculating the shape of the target by adding the integral multiple of a wavelength of the light source to the unwrapped second interference pattern if the first shape does not coincide with the second shape (S112).

摘要翻译： 使用干涉图案测量目标的形状的测量方法包括以下步骤：将第一干涉图案转换成目标的第一形状（S103至S105），在目标移动的位置获得第二干涉图案 参考面的光轴方向（S107，S108），在将第一干涉图案的相位与第二干涉图案的相位对准后，将第二干涉图案解包（S109），将展开后的第二干涉图案转换为 目标（S110），确定目标的第一形状是否与第二形状一致（S111），并且通过将光源的波长的整数倍相加于展开的第二干涉图案来计算目标的形状 如果第一形状与第二形状不一致（S112）。

公开(公告)号：US07359033B2

公开(公告)日：2008-04-15

申请号：US11363038

申请日：2006-02-28

申请人： Kenji Yamazoe

发明人： Kenji Yamazoe

IPC分类号： G03B27/42

CPC分类号： G03F7/70125 ,  G03F1/00 ,  G03F7/70566

摘要： An exposure method for exposing an image of a mask pattern onto a plate via a projection optical system. The method includes a step of illuminating one of a binary mask and an attenuated phase shifting mask, which has a contact hole pattern and an auxiliary pattern, by utilizing light from a light source and an illumination optical system so that the contact hole pattern can be resolved, but a resolution of the auxiliary pattern is restrained. The illuminating step uses an off-axis illumination that is polarized in a tangential direction when a value that is calculated by normalizing half the length of an interval between centers of the auxiliary pattern and the contact hole pattern that are adjacent to each other by λ/NA is 0.25×√{square root over (2)} or smaller, where λ is a wavelength of the light, and NA is a numerical aperture of the projection optical system at an image side.

摘要翻译： 一种用于通过投影光学系统将掩模图案的图像曝光到印版上的曝光方法。 该方法包括通过利用来自光源和照明光学系统的光来照亮具有接触孔图案和辅助图案的二进制掩模和衰减相移掩模之一的步骤，使得接触孔图案可以 解决了，但辅助模式的分辨率受到限制。 照明步骤使用沿切线方向极化的离轴照明，当通过将辅助图案的中心与接触孔图案之间的间隔的长度的一半归一化为λ/ NA是0.25×{平方根超过（2或更小，其中λ是光的波长，NA是投影光学系统在像侧的数值孔径）。

公开(公告)号：US08365104B2

公开(公告)日：2013-01-29

申请号：US11775447

申请日：2007-07-10

申请人： Kenji Yamazoe

发明人： Kenji Yamazoe

IPC分类号： G06F17/50 ,  G06F17/14 ,  G06E1/04 ,  G03F7/20

CPC分类号： G06F17/50 ,  G03F1/36 ,  G03F7/70433 ,  G03F7/705 ,  G03F7/70666

摘要： A two-dimensional transmission cross coefficient is obtained based on a function representing a light intensity distribution formed by an illumination apparatus on a pupil plane of the projection optical system and a pupil function of the projection optical system. Based on the two-dimensional transmission cross coefficient and data of a pattern on an object plane of the projection optical system, an approximate aerial image is calculated by using at least one of plural components of an aerial image on an image plane of the projection optical system. Data of a pattern of an original is produced based on the approximate aerial image.

摘要翻译： 基于表示由投影光学系统的光瞳面上的照明装置形成的光强度分布的功能和投影光学系统的光瞳功能，获得二维透射交叉系数。 基于投影光学系统的物体平面上的二维透射交叉系数和图案的数据，通过使用投影光学系统的像面上的空间像的多个分量中的至少一个来计算近似空间图像 系统。 基于近似的空间图像产生原稿图案的数据。